US3837731A
(en)
*
|
1973-06-22 |
1974-09-24 |
Corning Glass Works |
Oil dispenser for microscope objective
|
US3936176A
(en)
*
|
1973-07-19 |
1976-02-03 |
Xerox Corporation |
Device for maintaining a developability regulating apparatus contaminant free
|
US4509852A
(en)
*
|
1980-10-06 |
1985-04-09 |
Werner Tabarelli |
Apparatus for the photolithographic manufacture of integrated circuit elements
|
JPS57153433A
(en)
*
|
1981-03-18 |
1982-09-22 |
Hitachi Ltd |
Manufacturing device for semiconductor
|
US4778995A
(en)
*
|
1987-05-12 |
1988-10-18 |
Eastman Kodak Company |
Stimulable phosphor imaging apparatus
|
US5123743A
(en)
*
|
1990-02-28 |
1992-06-23 |
Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College |
Lithography mask inspection
|
US5870223A
(en)
*
|
1996-07-22 |
1999-02-09 |
Nikon Corporation |
Microscope system for liquid immersion observation
|
US6330106B1
(en)
*
|
1999-02-17 |
2001-12-11 |
Lucid, Inc. |
Tissue specimen holder
|
US20020163629A1
(en)
*
|
2001-05-07 |
2002-11-07 |
Michael Switkes |
Methods and apparatus employing an index matching medium
|
DE10123027B4
(de)
*
|
2001-05-11 |
2005-07-21 |
Evotec Oai Ag |
Vorrichtung zur Untersuchung chemischer und/oder biologischer Proben
|
US7294446B2
(en)
*
|
2001-10-29 |
2007-11-13 |
Eastman Kodak Company |
Digital analog recording using near field optical imaging
|
US7252097B2
(en)
*
|
2002-09-30 |
2007-08-07 |
Lam Research Corporation |
System and method for integrating in-situ metrology within a wafer process
|
US6788477B2
(en)
*
|
2002-10-22 |
2004-09-07 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Apparatus for method for immersion lithography
|
SG135052A1
(en)
|
2002-11-12 |
2007-09-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US9482966B2
(en)
|
2002-11-12 |
2016-11-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
CN101382738B
(zh)
|
2002-11-12 |
2011-01-12 |
Asml荷兰有限公司 |
光刻投射装置
|
US7110081B2
(en)
*
|
2002-11-12 |
2006-09-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
DE60335595D1
(de)
*
|
2002-11-12 |
2011-02-17 |
Asml Netherlands Bv |
Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
|
CN100568101C
(zh)
|
2002-11-12 |
2009-12-09 |
Asml荷兰有限公司 |
光刻装置和器件制造方法
|
US10503084B2
(en)
|
2002-11-12 |
2019-12-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7372541B2
(en)
*
|
2002-11-12 |
2008-05-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG121822A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP1420298B1
(fr)
*
|
2002-11-12 |
2013-02-20 |
ASML Netherlands B.V. |
Appareil lithographique
|
SG131766A1
(en)
*
|
2002-11-18 |
2007-05-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
TWI255971B
(en)
*
|
2002-11-29 |
2006-06-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP1429190B1
(fr)
*
|
2002-12-10 |
2012-05-09 |
Canon Kabushiki Kaisha |
Appareil et méthode d'exposition
|
US7242455B2
(en)
*
|
2002-12-10 |
2007-07-10 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
WO2004053955A1
(fr)
*
|
2002-12-10 |
2004-06-24 |
Nikon Corporation |
Systeme d'exposition et procede de production de dispositif
|
USRE48515E1
(en)
*
|
2002-12-19 |
2021-04-13 |
Asml Netherlands B.V. |
Method and device for irradiating spots on a layer
|
KR101288767B1
(ko)
|
2003-02-26 |
2013-07-23 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
DE10309138A1
(de)
*
|
2003-02-28 |
2004-09-16 |
Till I.D. Gmbh |
Mikroskopvorrichtung
|
EP1612850B1
(fr)
*
|
2003-04-07 |
2009-03-25 |
Nikon Corporation |
Appareil d'exposition et procede pour fabrication d'un dispositif
|
KR20110104084A
(ko)
*
|
2003-04-09 |
2011-09-21 |
가부시키가이샤 니콘 |
액침 리소그래피 유체 제어 시스템
|
EP1611482B1
(fr)
*
|
2003-04-10 |
2015-06-03 |
Nikon Corporation |
Trajet de ruissellement permettant de recueillir un liquide dans un appareil de lithographie a immersion
|
KR101238142B1
(ko)
|
2003-04-10 |
2013-02-28 |
가부시키가이샤 니콘 |
액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
|
KR101121655B1
(ko)
|
2003-04-10 |
2012-03-09 |
가부시키가이샤 니콘 |
액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
|
SG10201504396VA
(en)
|
2003-04-11 |
2015-07-30 |
Nikon Corp |
Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
|
SG2014015135A
(en)
*
|
2003-04-11 |
2015-06-29 |
Nippon Kogaku Kk |
Cleanup method for optics in immersion lithography
|
JP4025683B2
(ja)
*
|
2003-05-09 |
2007-12-26 |
松下電器産業株式会社 |
パターン形成方法及び露光装置
|
TWI295414B
(en)
|
2003-05-13 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
TWI503865B
(zh)
|
2003-05-23 |
2015-10-11 |
尼康股份有限公司 |
A method of manufacturing an exposure apparatus and an element
|
TWI442694B
(zh)
*
|
2003-05-30 |
2014-06-21 |
Asml Netherlands Bv |
微影裝置及元件製造方法
|
US7213963B2
(en)
*
|
2003-06-09 |
2007-05-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7317504B2
(en)
*
|
2004-04-08 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1486827B1
(fr)
|
2003-06-11 |
2011-11-02 |
ASML Netherlands B.V. |
Appareil lithographique et méthode de fabrication d'un dispositif
|
KR101265450B1
(ko)
|
2003-06-19 |
2013-05-16 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조방법
|
US6867844B2
(en)
*
|
2003-06-19 |
2005-03-15 |
Asml Holding N.V. |
Immersion photolithography system and method using microchannel nozzles
|
EP1498778A1
(fr)
*
|
2003-06-27 |
2005-01-19 |
ASML Netherlands B.V. |
Appareil lithographique et méthode de fabrication d'un dispositif
|
DE60308161T2
(de)
*
|
2003-06-27 |
2007-08-09 |
Asml Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
US6809794B1
(en)
*
|
2003-06-27 |
2004-10-26 |
Asml Holding N.V. |
Immersion photolithography system and method using inverted wafer-projection optics interface
|
DE60321779D1
(de)
*
|
2003-06-30 |
2008-08-07 |
Asml Netherlands Bv |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
EP1494074A1
(fr)
*
|
2003-06-30 |
2005-01-05 |
ASML Netherlands B.V. |
Appareil lithographique et méthode de fabrication d'un dispositif
|
WO2005006415A1
(fr)
*
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
Appareil d'exposition et procede de fabrication
|
KR101296501B1
(ko)
*
|
2003-07-09 |
2013-08-13 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US7738074B2
(en)
|
2003-07-16 |
2010-06-15 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1500982A1
(fr)
|
2003-07-24 |
2005-01-26 |
ASML Netherlands B.V. |
Appareil lithographique et méthode de fabrication d'un dispositif
|
US7175968B2
(en)
*
|
2003-07-28 |
2007-02-13 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a substrate
|
EP1503244A1
(fr)
*
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Appareil de projection lithographique et méthode de fabrication d'un dispositif
|
US7326522B2
(en)
*
|
2004-02-11 |
2008-02-05 |
Asml Netherlands B.V. |
Device manufacturing method and a substrate
|
US7779781B2
(en)
|
2003-07-31 |
2010-08-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG133589A1
(en)
*
|
2003-08-26 |
2007-07-30 |
Nikon Corp |
Optical element and exposure device
|
US8149381B2
(en)
*
|
2003-08-26 |
2012-04-03 |
Nikon Corporation |
Optical element and exposure apparatus
|
TWI245163B
(en)
|
2003-08-29 |
2005-12-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP2261740B1
(fr)
|
2003-08-29 |
2014-07-09 |
ASML Netherlands BV |
Appareil lithographique
|
TWI263859B
(en)
|
2003-08-29 |
2006-10-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US6954256B2
(en)
*
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
Gradient immersion lithography
|
EP1660925B1
(fr)
|
2003-09-03 |
2015-04-29 |
Nikon Corporation |
Appareil et procede de fourniture de liquide pour la lithographie par immersion
|
EP1519231B1
(fr)
*
|
2003-09-29 |
2005-12-21 |
ASML Netherlands B.V. |
Appareil lithographique et procédé pour la production d'un dispositif
|
EP1519230A1
(fr)
*
|
2003-09-29 |
2005-03-30 |
ASML Netherlands B.V. |
Appareil lithographique et méthode de fabrication d'un dispositif
|
US7158211B2
(en)
*
|
2003-09-29 |
2007-01-02 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1524558A1
(fr)
|
2003-10-15 |
2005-04-20 |
ASML Netherlands B.V. |
Appareil lithographique et procédé pour la production d'un dispositif
|
EP1524557A1
(fr)
*
|
2003-10-15 |
2005-04-20 |
ASML Netherlands B.V. |
Appareil lithographique et méthode de fabrication d'un dispositif
|
US7352433B2
(en)
|
2003-10-28 |
2008-04-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7411653B2
(en)
*
|
2003-10-28 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7113259B2
(en)
*
|
2003-10-31 |
2006-09-26 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7528929B2
(en)
*
|
2003-11-14 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7545481B2
(en)
*
|
2003-11-24 |
2009-06-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7460206B2
(en)
*
|
2003-12-19 |
2008-12-02 |
Carl Zeiss Smt Ag |
Projection objective for immersion lithography
|
US7394521B2
(en)
*
|
2003-12-23 |
2008-07-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7589818B2
(en)
*
|
2003-12-23 |
2009-09-15 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
|
WO2005071491A2
(fr)
*
|
2004-01-20 |
2005-08-04 |
Carl Zeiss Smt Ag |
Appareil microlithographique d'insolation par projection et dispositif de mesure pour objectif de projection
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
US7050146B2
(en)
|
2004-02-09 |
2006-05-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
KR101707294B1
(ko)
|
2004-03-25 |
2017-02-15 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US7227619B2
(en)
*
|
2004-04-01 |
2007-06-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7034917B2
(en)
*
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
US7295283B2
(en)
*
|
2004-04-02 |
2007-11-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7898642B2
(en)
|
2004-04-14 |
2011-03-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1753016B1
(fr)
*
|
2004-04-19 |
2012-06-20 |
Nikon Corporation |
Appareil d'exposition et procédé de fabrication du dispositif
|
US7379159B2
(en)
*
|
2004-05-03 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1747499A2
(fr)
|
2004-05-04 |
2007-01-31 |
Nikon Corporation |
Appareil et procede d'approvisionnement en fluide pour la lithographie par immersion
|
US7091502B2
(en)
*
|
2004-05-12 |
2006-08-15 |
Taiwan Semiconductor Manufacturing, Co., Ltd. |
Apparatus and method for immersion lithography
|
US7616383B2
(en)
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7486381B2
(en)
*
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20070103661A1
(en)
*
|
2004-06-04 |
2007-05-10 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US20070216889A1
(en)
*
|
2004-06-04 |
2007-09-20 |
Yasufumi Nishii |
Exposure Apparatus, Exposure Method, and Method for Producing Device
|
KR101422964B1
(ko)
*
|
2004-06-09 |
2014-07-24 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
EP3067750B1
(fr)
*
|
2004-06-10 |
2019-01-30 |
Nikon Corporation |
Appareil d'exposition, procédé d'exposition et procédé de production de dispositif
|
US20070222959A1
(en)
*
|
2004-06-10 |
2007-09-27 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US7481867B2
(en)
|
2004-06-16 |
2009-01-27 |
Edwards Limited |
Vacuum system for immersion photolithography
|
US7463330B2
(en)
*
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7161663B2
(en)
*
|
2004-07-22 |
2007-01-09 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7304715B2
(en)
*
|
2004-08-13 |
2007-12-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1801853A4
(fr)
*
|
2004-08-18 |
2008-06-04 |
Nikon Corp |
Appareil d'exposition et procede pour la fabrication du dispositif
|
US7701550B2
(en)
|
2004-08-19 |
2010-04-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060044533A1
(en)
*
|
2004-08-27 |
2006-03-02 |
Asmlholding N.V. |
System and method for reducing disturbances caused by movement in an immersion lithography system
|
US7133114B2
(en)
*
|
2004-09-20 |
2006-11-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060060653A1
(en)
*
|
2004-09-23 |
2006-03-23 |
Carl Wittenberg |
Scanner system and method for simultaneously acquiring data images from multiple object planes
|
US7522261B2
(en)
*
|
2004-09-24 |
2009-04-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7355674B2
(en)
*
|
2004-09-28 |
2008-04-08 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and computer program product
|
US7894040B2
(en)
*
|
2004-10-05 |
2011-02-22 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7209213B2
(en)
*
|
2004-10-07 |
2007-04-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7379155B2
(en)
|
2004-10-18 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7119876B2
(en)
*
|
2004-10-18 |
2006-10-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7414699B2
(en)
*
|
2004-11-12 |
2008-08-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7251013B2
(en)
|
2004-11-12 |
2007-07-31 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7423720B2
(en)
|
2004-11-12 |
2008-09-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7583357B2
(en)
*
|
2004-11-12 |
2009-09-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7411657B2
(en)
|
2004-11-17 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7145630B2
(en)
*
|
2004-11-23 |
2006-12-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7256121B2
(en)
*
|
2004-12-02 |
2007-08-14 |
Texas Instruments Incorporated |
Contact resistance reduction by new barrier stack process
|
US7161654B2
(en)
*
|
2004-12-02 |
2007-01-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7446850B2
(en)
*
|
2004-12-03 |
2008-11-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7248334B2
(en)
*
|
2004-12-07 |
2007-07-24 |
Asml Netherlands B.V. |
Sensor shield
|
US7397533B2
(en)
|
2004-12-07 |
2008-07-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7196770B2
(en)
*
|
2004-12-07 |
2007-03-27 |
Asml Netherlands B.V. |
Prewetting of substrate before immersion exposure
|
US7365827B2
(en)
|
2004-12-08 |
2008-04-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7352440B2
(en)
|
2004-12-10 |
2008-04-01 |
Asml Netherlands B.V. |
Substrate placement in immersion lithography
|
US7403261B2
(en)
*
|
2004-12-15 |
2008-07-22 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7880860B2
(en)
*
|
2004-12-20 |
2011-02-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7528931B2
(en)
|
2004-12-20 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7491661B2
(en)
*
|
2004-12-28 |
2009-02-17 |
Asml Netherlands B.V. |
Device manufacturing method, top coat material and substrate
|
US7405805B2
(en)
|
2004-12-28 |
2008-07-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060147821A1
(en)
|
2004-12-30 |
2006-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG124351A1
(en)
*
|
2005-01-14 |
2006-08-30 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG124359A1
(en)
|
2005-01-14 |
2006-08-30 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
KR20180125636A
(ko)
*
|
2005-01-31 |
2018-11-23 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US8692973B2
(en)
*
|
2005-01-31 |
2014-04-08 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
EP1849040A2
(fr)
*
|
2005-02-10 |
2007-10-31 |
ASML Netherlands B.V. |
Liquide d'immersion, dispositif d'exposition et technique d'exposition
|
US7224431B2
(en)
*
|
2005-02-22 |
2007-05-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8018573B2
(en)
*
|
2005-02-22 |
2011-09-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7378025B2
(en)
*
|
2005-02-22 |
2008-05-27 |
Asml Netherlands B.V. |
Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
|
US7428038B2
(en)
|
2005-02-28 |
2008-09-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
|
US7324185B2
(en)
*
|
2005-03-04 |
2008-01-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7684010B2
(en)
*
|
2005-03-09 |
2010-03-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
|
US7330238B2
(en)
*
|
2005-03-28 |
2008-02-12 |
Asml Netherlands, B.V. |
Lithographic apparatus, immersion projection apparatus and device manufacturing method
|
US7411654B2
(en)
*
|
2005-04-05 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7291850B2
(en)
*
|
2005-04-08 |
2007-11-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060232753A1
(en)
*
|
2005-04-19 |
2006-10-19 |
Asml Holding N.V. |
Liquid immersion lithography system with tilted liquid flow
|
US7317507B2
(en)
*
|
2005-05-03 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7433016B2
(en)
|
2005-05-03 |
2008-10-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8248577B2
(en)
*
|
2005-05-03 |
2012-08-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7652746B2
(en)
*
|
2005-06-21 |
2010-01-26 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7751027B2
(en)
|
2005-06-21 |
2010-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7474379B2
(en)
*
|
2005-06-28 |
2009-01-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7468779B2
(en)
*
|
2005-06-28 |
2008-12-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7834974B2
(en)
|
2005-06-28 |
2010-11-16 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7535644B2
(en)
*
|
2005-08-12 |
2009-05-19 |
Asml Netherlands B.V. |
Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
|
US8054445B2
(en)
*
|
2005-08-16 |
2011-11-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7580112B2
(en)
*
|
2005-08-25 |
2009-08-25 |
Nikon Corporation |
Containment system for immersion fluid in an immersion lithography apparatus
|
US7411658B2
(en)
|
2005-10-06 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7804577B2
(en)
|
2005-11-16 |
2010-09-28 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7656501B2
(en)
*
|
2005-11-16 |
2010-02-02 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7864292B2
(en)
|
2005-11-16 |
2011-01-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7633073B2
(en)
*
|
2005-11-23 |
2009-12-15 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7773195B2
(en)
*
|
2005-11-29 |
2010-08-10 |
Asml Holding N.V. |
System and method to increase surface tension and contact angle in immersion lithography
|
KR100768849B1
(ko)
*
|
2005-12-06 |
2007-10-22 |
엘지전자 주식회사 |
계통 연계형 연료전지 시스템의 전원공급장치 및 방법
|
US7420194B2
(en)
*
|
2005-12-27 |
2008-09-02 |
Asml Netherlands B.V. |
Lithographic apparatus and substrate edge seal
|
US7839483B2
(en)
*
|
2005-12-28 |
2010-11-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a control system
|
US7649611B2
(en)
|
2005-12-30 |
2010-01-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8045134B2
(en)
|
2006-03-13 |
2011-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus, control system and device manufacturing method
|
US9477158B2
(en)
|
2006-04-14 |
2016-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7969548B2
(en)
*
|
2006-05-22 |
2011-06-28 |
Asml Netherlands B.V. |
Lithographic apparatus and lithographic apparatus cleaning method
|
US7656502B2
(en)
*
|
2006-06-22 |
2010-02-02 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP2087392B1
(fr)
*
|
2006-09-07 |
2018-01-10 |
Leica Microsystems CMS GmbH |
Procédé d'utilisation d'un objectif à immersion
|
US8045135B2
(en)
|
2006-11-22 |
2011-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus with a fluid combining unit and related device manufacturing method
|
US9632425B2
(en)
|
2006-12-07 |
2017-04-25 |
Asml Holding N.V. |
Lithographic apparatus, a dryer and a method of removing liquid from a surface
|
US8634053B2
(en)
|
2006-12-07 |
2014-01-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7791709B2
(en)
*
|
2006-12-08 |
2010-09-07 |
Asml Netherlands B.V. |
Substrate support and lithographic process
|
US8817226B2
(en)
|
2007-02-15 |
2014-08-26 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning using ozone in immersion lithography
|
US8654305B2
(en)
*
|
2007-02-15 |
2014-02-18 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning in immersion lithography
|
US7866330B2
(en)
*
|
2007-05-04 |
2011-01-11 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
US8947629B2
(en)
*
|
2007-05-04 |
2015-02-03 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
US8011377B2
(en)
*
|
2007-05-04 |
2011-09-06 |
Asml Netherlands B.V. |
Cleaning device and a lithographic apparatus cleaning method
|
US9013672B2
(en)
*
|
2007-05-04 |
2015-04-21 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
US20110051113A1
(en)
*
|
2009-09-01 |
2011-03-03 |
Wei-Cheng Shiu |
Lithography system and optical module thereof
|
NL2005207A
(en)
*
|
2009-09-28 |
2011-03-29 |
Asml Netherlands Bv |
Heat pipe, lithographic apparatus and device manufacturing method.
|
WO2011090690A1
(fr)
*
|
2009-12-28 |
2011-07-28 |
Pioneer Hi-Bred International, Inc. |
Génotypes restaurateurs de fertilité du sorgo, et procédés de sélection assistée par marqueur
|
EP2381310B1
(fr)
|
2010-04-22 |
2015-05-06 |
ASML Netherlands BV |
Structure de manipulation de fluide et appareil lithographique
|
ES2878548T3
(es)
|
2012-02-26 |
2021-11-19 |
Caliber Imaging & Diagnostics Inc |
Platina para muestras de tejido para un microscopio de seccionamiento óptico
|
US11106140B2
(en)
|
2019-07-16 |
2021-08-31 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Semiconductor apparatus and method of operating the same
|