CH479897A - Lichtempfindliches Gravierschichtmaterial - Google Patents

Lichtempfindliches Gravierschichtmaterial

Info

Publication number
CH479897A
CH479897A CH237767A CH237767A CH479897A CH 479897 A CH479897 A CH 479897A CH 237767 A CH237767 A CH 237767A CH 237767 A CH237767 A CH 237767A CH 479897 A CH479897 A CH 479897A
Authority
CH
Switzerland
Prior art keywords
photosensitive
layer material
engraving layer
engraving
photosensitive engraving
Prior art date
Application number
CH237767A
Other languages
German (de)
English (en)
Inventor
J Whitbourne Richard
Original Assignee
Keuffel & Esser Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Keuffel & Esser Co filed Critical Keuffel & Esser Co
Publication of CH479897A publication Critical patent/CH479897A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CH237767A 1966-02-18 1967-02-17 Lichtempfindliches Gravierschichtmaterial CH479897A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52837166A 1966-02-18 1966-02-18

Publications (1)

Publication Number Publication Date
CH479897A true CH479897A (de) 1969-10-15

Family

ID=24105415

Family Applications (1)

Application Number Title Priority Date Filing Date
CH237767A CH479897A (de) 1966-02-18 1967-02-17 Lichtempfindliches Gravierschichtmaterial

Country Status (7)

Country Link
AT (1) AT279348B (zh)
BE (1) BE694123A (zh)
CH (1) CH479897A (zh)
DE (1) DE1572097A1 (zh)
FR (1) FR1511518A (zh)
GB (1) GB1166724A (zh)
NL (1) NL6702429A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2721687C2 (de) * 1977-05-13 1986-11-20 Hoechst Ag, 6230 Frankfurt Verfahren zum Abdecken von Kopiervorlagen mit Masken
US4419432A (en) * 1982-09-22 1983-12-06 Keuffel & Esser Company Diazotype composition stabilization
NO894458L (no) * 1988-11-10 1990-05-11 Somar Corp Lyssikker maskeringsfilm og anvendelse av denne.
US5368962A (en) * 1988-11-10 1994-11-29 Somar Corporation Masking film

Also Published As

Publication number Publication date
FR1511518A (fr) 1968-01-26
AT279348B (de) 1970-03-10
BE694123A (zh) 1967-08-16
GB1166724A (en) 1969-10-08
NL6702429A (zh) 1967-08-21
DE1572097A1 (de) 1970-02-19

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Legal Events

Date Code Title Description
PL Patent ceased