CH482224A - Lichtempfindliche Schicht - Google Patents

Lichtempfindliche Schicht

Info

Publication number
CH482224A
CH482224A CH165267A CH165267A CH482224A CH 482224 A CH482224 A CH 482224A CH 165267 A CH165267 A CH 165267A CH 165267 A CH165267 A CH 165267A CH 482224 A CH482224 A CH 482224A
Authority
CH
Switzerland
Prior art keywords
photosensitive layer
photosensitive
layer
Prior art date
Application number
CH165267A
Other languages
English (en)
Inventor
Danhaeuser Justus
Oehlschlaeger Hans
Pelz Willibald
Riester Oskar
Original Assignee
Agfa Gevaert Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Ag filed Critical Agfa Gevaert Ag
Publication of CH482224A publication Critical patent/CH482224A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CH165267A 1966-02-18 1967-02-03 Lichtempfindliche Schicht CH482224A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEA0051615 1966-02-18

Publications (1)

Publication Number Publication Date
CH482224A true CH482224A (de) 1969-11-30

Family

ID=6938046

Family Applications (1)

Application Number Title Priority Date Filing Date
CH165267A CH482224A (de) 1966-02-18 1967-02-03 Lichtempfindliche Schicht

Country Status (7)

Country Link
US (1) US3528812A (de)
BE (1) BE694283A (de)
CH (1) CH482224A (de)
DE (1) DE1522358A1 (de)
FR (1) FR1511514A (de)
GB (1) GB1148636A (de)
NL (1) NL6702407A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3957288A (en) 1972-12-28 1976-05-18 Agfa-Gevaert N.V. Thermographic recording material
US3958815A (en) 1972-12-28 1976-05-25 Agfa-Gevaert N.V. Pressure-sensitive recording materials

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105450A (en) * 1973-07-27 1978-08-08 Fuji Photo Film Co., Ltd. Spectrally sensitized positive light-sensitive o-quinone diazide containing composition
DE68921146T2 (de) * 1988-11-11 1995-06-14 Fuji Photo Film Co Ltd Lichtempfindliche Zusammensetzung.
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
US5866296A (en) * 1996-01-25 1999-02-02 Toyo Gosei Co., Ltd. Photosensitive resin composition
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3957288A (en) 1972-12-28 1976-05-18 Agfa-Gevaert N.V. Thermographic recording material
US3958815A (en) 1972-12-28 1976-05-25 Agfa-Gevaert N.V. Pressure-sensitive recording materials

Also Published As

Publication number Publication date
DE1522358A1 (de) 1969-07-24
BE694283A (de) 1967-08-21
NL6702407A (de) 1967-07-25
GB1148636A (en) 1969-04-16
FR1511514A (fr) 1968-01-26
US3528812A (en) 1970-09-15

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Legal Events

Date Code Title Description
PL Patent ceased