CH473400A - Composition photosensible - Google Patents
Composition photosensibleInfo
- Publication number
- CH473400A CH473400A CH911367A CH911367A CH473400A CH 473400 A CH473400 A CH 473400A CH 911367 A CH911367 A CH 911367A CH 911367 A CH911367 A CH 911367A CH 473400 A CH473400 A CH 473400A
- Authority
- CH
- Switzerland
- Prior art keywords
- photosensitive composition
- photosensitive
- composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/013—Preparation of halogenated hydrocarbons by addition of halogens
- C07C17/02—Preparation of halogenated hydrocarbons by addition of halogens to unsaturated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/347—Preparation of carboxylic acids or their salts, halides or anhydrides by reactions not involving formation of carboxyl groups
- C07C51/353—Preparation of carboxylic acids or their salts, halides or anhydrides by reactions not involving formation of carboxyl groups by isomerisation; by change of size of the carbon skeleton
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cosmetics (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56212566A | 1966-07-01 | 1966-07-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH473400A true CH473400A (fr) | 1969-05-31 |
Family
ID=24244901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH911367A CH473400A (fr) | 1966-07-01 | 1967-06-27 | Composition photosensible |
Country Status (6)
Country | Link |
---|---|
US (1) | US3501308A (fr) |
CH (1) | CH473400A (fr) |
DE (1) | DE1547652B2 (fr) |
GB (1) | GB1161624A (fr) |
NL (1) | NL6707977A (fr) |
SE (1) | SE354729B (fr) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3844791A (en) * | 1971-06-14 | 1974-10-29 | Eastman Kodak Co | Photosensitive material comprising polyacetylenic amine salts |
BE789476A (fr) * | 1971-10-01 | 1973-03-29 | Basf Ag | Procede de preparation de cliches |
US3772028A (en) * | 1972-02-02 | 1973-11-13 | Eastman Kodak Co | Sensitized photosensitive compounds and elements |
US3772027A (en) * | 1972-02-04 | 1973-11-13 | Eastman Kodak Co | Photosensitive element containing a photosensitive crystalline polyacetylenic compound and a photoconductive inorganic metal salt |
US3954816A (en) * | 1972-12-14 | 1976-05-04 | Eastman Kodak Company | Photosensitive material comprising polyacetylenic amine salts |
US4066676A (en) * | 1974-02-06 | 1978-01-03 | Eastman Kodak Company | Photosensitive material comprising polyacetylenic amine salts |
US4247613A (en) * | 1976-07-23 | 1981-01-27 | Eastman Kodak Company | Electric field sensitization of polyacetylenic materials |
US4384980A (en) * | 1977-07-19 | 1983-05-24 | Allied Corporation | Co-crystallized acetylenic compounds |
US4189399A (en) * | 1977-07-19 | 1980-02-19 | Allied Chemical Corporation | Co-crystallized acetylenic compounds |
US4238352A (en) * | 1978-11-13 | 1980-12-09 | Allied Chemical Corporation | Co-polymerized acetylenic compositions |
US4235108A (en) * | 1978-11-13 | 1980-11-25 | Allied Chemical Corporation | Device for measuring temperature using co-crystallized acetylenic compositions |
US4615962A (en) * | 1979-06-25 | 1986-10-07 | University Patents, Inc. | Diacetylenes having liquid crystal phases |
US4262074A (en) * | 1979-11-19 | 1981-04-14 | A. B. Dick Company | Photographic copy method and materials |
US4933114A (en) * | 1980-08-11 | 1990-06-12 | Eastman Kodak Company | Polyacetylenic lipids, radiation-sensitive compositions, photographic elements and processes relating to same |
US4698296A (en) * | 1986-03-14 | 1987-10-06 | Gaf Corporation | Processless color imaging and film therefor |
US4705741A (en) * | 1986-03-14 | 1987-11-10 | Gaf Corporation | Processless color imaging and film therefor |
US4985290A (en) * | 1988-10-17 | 1991-01-15 | Gaf Chemicals Corporation | Protective coatings for polyacetylenic recording media |
US4952244A (en) * | 1988-10-17 | 1990-08-28 | Gaf Chemicals Corporation | Protective coatings for polyacetylenic recording media |
US5420000A (en) * | 1990-04-09 | 1995-05-30 | Jp Laboratories, Inc. | Heat fixable high energy radiation imaging film |
US5672465A (en) * | 1990-04-09 | 1997-09-30 | Jp Laboratories, Inc. | Polyethyleneimine binder complex films |
US5731112A (en) | 1996-05-23 | 1998-03-24 | Isp Investments Inc. | Processless diacetylenic salt films capable of developing a black image |
CA2282084C (fr) | 1999-09-10 | 2005-01-11 | Stuart A. Jackson | Dispositif indicateur de rayonnement |
US20030129080A1 (en) * | 2001-11-19 | 2003-07-10 | Isp Investments Inc. | Stable, non-hazardous indicia for biocidal irradiation of a package |
US20040197700A1 (en) | 2003-04-01 | 2004-10-07 | Isp Investments Inc. | Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
KR100963473B1 (ko) * | 2007-01-25 | 2010-06-17 | 아주대학교산학협력단 | 전도성 고분자-함유 방사선 영상용 조성물 |
-
1966
- 1966-07-01 US US562125A patent/US3501308A/en not_active Expired - Lifetime
-
1967
- 1967-05-16 GB GB22569/67A patent/GB1161624A/en not_active Expired
- 1967-06-08 NL NL6707977A patent/NL6707977A/xx unknown
- 1967-06-19 DE DE1967B0093079 patent/DE1547652B2/de active Granted
- 1967-06-27 CH CH911367A patent/CH473400A/fr not_active IP Right Cessation
- 1967-06-28 SE SE09387/67*A patent/SE354729B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
US3501308A (en) | 1970-03-17 |
GB1161624A (en) | 1969-08-13 |
SE354729B (fr) | 1973-03-19 |
DE1547652A1 (de) | 1969-11-27 |
NL6707977A (fr) | 1968-01-02 |
DE1547652B2 (de) | 1976-11-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |