FR1511518A - Matériel de couche pour gravure sensible à la lumière - Google Patents

Matériel de couche pour gravure sensible à la lumière

Info

Publication number
FR1511518A
FR1511518A FR95175A FR95175A FR1511518A FR 1511518 A FR1511518 A FR 1511518A FR 95175 A FR95175 A FR 95175A FR 95175 A FR95175 A FR 95175A FR 1511518 A FR1511518 A FR 1511518A
Authority
FR
France
Prior art keywords
layer material
light sensitive
engraving
sensitive engraving
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR95175A
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Keuffel and Esser Co
Original Assignee
Keuffel and Esser Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Keuffel and Esser Co filed Critical Keuffel and Esser Co
Application granted granted Critical
Publication of FR1511518A publication Critical patent/FR1511518A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR95175A 1966-02-18 1967-02-16 Matériel de couche pour gravure sensible à la lumière Expired FR1511518A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52837166A 1966-02-18 1966-02-18

Publications (1)

Publication Number Publication Date
FR1511518A true FR1511518A (fr) 1968-01-26

Family

ID=24105415

Family Applications (1)

Application Number Title Priority Date Filing Date
FR95175A Expired FR1511518A (fr) 1966-02-18 1967-02-16 Matériel de couche pour gravure sensible à la lumière

Country Status (7)

Country Link
AT (1) AT279348B (zh)
BE (1) BE694123A (zh)
CH (1) CH479897A (zh)
DE (1) DE1572097A1 (zh)
FR (1) FR1511518A (zh)
GB (1) GB1166724A (zh)
NL (1) NL6702429A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2390755A1 (fr) * 1977-05-13 1978-12-08 Hoechst Ag Procede de masquage de documents originaux a reproduire a l'aide de caches

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4419432A (en) * 1982-09-22 1983-12-06 Keuffel & Esser Company Diazotype composition stabilization
NZ231328A (en) * 1988-11-10 1991-10-25 Somar Corp Masking film for photosensitive material: transmissivity
US5368962A (en) * 1988-11-10 1994-11-29 Somar Corporation Masking film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2390755A1 (fr) * 1977-05-13 1978-12-08 Hoechst Ag Procede de masquage de documents originaux a reproduire a l'aide de caches

Also Published As

Publication number Publication date
AT279348B (de) 1970-03-10
NL6702429A (zh) 1967-08-21
BE694123A (zh) 1967-08-16
CH479897A (de) 1969-10-15
GB1166724A (en) 1969-10-08
DE1572097A1 (de) 1970-02-19

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