FR1516083A - Couche de reproduction photosensible - Google Patents
Couche de reproduction photosensibleInfo
- Publication number
- FR1516083A FR1516083A FR90251A FR90251A FR1516083A FR 1516083 A FR1516083 A FR 1516083A FR 90251 A FR90251 A FR 90251A FR 90251 A FR90251 A FR 90251A FR 1516083 A FR1516083 A FR 1516083A
- Authority
- FR
- France
- Prior art keywords
- reproduction layer
- photosensitive reproduction
- photosensitive
- layer
- reproduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/14—Unsaturated oxiranes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK0058084 | 1966-01-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1516083A true FR1516083A (fr) | 1968-03-08 |
Family
ID=7228537
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR90251A Expired FR1516083A (fr) | 1966-01-07 | 1967-01-06 | Couche de reproduction photosensible |
Country Status (5)
Country | Link |
---|---|
US (1) | US3497354A (fr) |
AT (1) | AT276934B (fr) |
DE (1) | DE1572062C3 (fr) |
FR (1) | FR1516083A (fr) |
GB (1) | GB1164025A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0005551A2 (fr) * | 1978-05-23 | 1979-11-28 | Western Electric Company, Incorporated | Article comportant un substrat et une couche de matériau sensitif à faisceau électronique et procédé de son préparation |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3647446A (en) * | 1970-03-05 | 1972-03-07 | Eastman Kodak Co | Process for preparing high-relief printing plates |
CH576739A5 (fr) * | 1972-08-25 | 1976-06-15 | Ciba Geigy Ag | |
JPS505032A (fr) * | 1972-12-29 | 1975-01-20 | ||
US3867142A (en) * | 1973-04-16 | 1975-02-18 | Krause Offset System Kg | Photosensitive materials for producing printing plates |
US4546067A (en) * | 1983-01-26 | 1985-10-08 | Ciba Geigy Corporation | Image production utilizing multifunctional light sensitive compounds |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2831768A (en) * | 1956-01-19 | 1958-04-22 | Eastman Kodak Co | Polymeric light-sensitive photographic elements |
US3200086A (en) * | 1961-08-21 | 1965-08-10 | American Cyanamid Co | Ultraviolet light stabilized polymeric materials having a benzophenone chemically incorporated therein |
US3410824A (en) * | 1965-03-19 | 1968-11-12 | Ralph B. Atkinson | Light sensitive resin from a dihydroxy chalcone and an epoxy prepolymer |
-
1966
- 1966-01-07 DE DE1572062A patent/DE1572062C3/de not_active Expired
-
1967
- 1967-01-04 AT AT9467A patent/AT276934B/de not_active IP Right Cessation
- 1967-01-04 US US607156A patent/US3497354A/en not_active Expired - Lifetime
- 1967-01-06 GB GB966/67A patent/GB1164025A/en not_active Expired
- 1967-01-06 FR FR90251A patent/FR1516083A/fr not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0005551A2 (fr) * | 1978-05-23 | 1979-11-28 | Western Electric Company, Incorporated | Article comportant un substrat et une couche de matériau sensitif à faisceau électronique et procédé de son préparation |
EP0005551A3 (en) * | 1978-05-23 | 1979-12-12 | Western Electric Company, Incorporated | Fabrication based on radiation sensitive resists and related products |
Also Published As
Publication number | Publication date |
---|---|
US3497354A (en) | 1970-02-24 |
GB1164025A (en) | 1969-09-10 |
DE1572062B2 (de) | 1974-04-11 |
DE1572062C3 (de) | 1974-11-07 |
DE1572062A1 (de) | 1970-01-02 |
AT276934B (de) | 1969-12-10 |
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