CH477373A - Verfahren zur Herstellung eines durchsichtigen Gegenstandes aus glasigem Siliciumdioxyd - Google Patents

Verfahren zur Herstellung eines durchsichtigen Gegenstandes aus glasigem Siliciumdioxyd

Info

Publication number
CH477373A
CH477373A CH105064A CH105064A CH477373A CH 477373 A CH477373 A CH 477373A CH 105064 A CH105064 A CH 105064A CH 105064 A CH105064 A CH 105064A CH 477373 A CH477373 A CH 477373A
Authority
CH
Switzerland
Prior art keywords
manufacture
transparent object
vitreous silica
vitreous
silica
Prior art date
Application number
CH105064A
Other languages
English (en)
Inventor
Alexander Winterburn John
Original Assignee
Thermal Syndicate Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermal Syndicate Ltd filed Critical Thermal Syndicate Ltd
Publication of CH477373A publication Critical patent/CH477373A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C03B37/01426—Plasma deposition burners or torches
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
    • C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
    • C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
CH105064A 1963-01-29 1964-01-29 Verfahren zur Herstellung eines durchsichtigen Gegenstandes aus glasigem Siliciumdioxyd CH477373A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3543/63A GB1061042A (en) 1963-01-29 1963-01-29 Improvements in the methods for the production of vitreous silica

Publications (1)

Publication Number Publication Date
CH477373A true CH477373A (de) 1969-08-31

Family

ID=9760313

Family Applications (1)

Application Number Title Priority Date Filing Date
CH105064A CH477373A (de) 1963-01-29 1964-01-29 Verfahren zur Herstellung eines durchsichtigen Gegenstandes aus glasigem Siliciumdioxyd

Country Status (6)

Country Link
US (1) US3275408A (de)
JP (1) JPS4816330B1 (de)
CH (1) CH477373A (de)
DE (1) DE1208740B (de)
GB (1) GB1061042A (de)
NL (2) NL6400714A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2122895A1 (de) * 1970-05-11 1971-11-25 Corning Glass Works Verfahren zur Herstellung optischer Fasern
WO2002008132A1 (de) * 2000-07-21 2002-01-31 Heraeus Tenevo Ag Verfahren zur herstellung einer vorform für optische fasern, sowie die vorform und die optische faser

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1104935A (en) * 1964-05-08 1968-03-06 Standard Telephones Cables Ltd Improvements in or relating to a method of forming a layer of an inorganic compound
US3440092A (en) * 1964-11-20 1969-04-22 Owens Illinois Glass Co Art of producing metal salt impregnated silica-coated substrates
NL132104C (de) * 1965-02-15
GB1182242A (en) * 1966-02-11 1970-02-25 United States Borax Chem Improvements in or relating to Nitrides.
US3533756A (en) * 1966-11-15 1970-10-13 Hercules Inc Solids arc reactor method
US3658572A (en) * 1968-11-05 1972-04-25 Westinghouse Electric Corp Pyrolytic coatings of molybdenum sulfide by plasma jet technique
US3655438A (en) * 1969-10-20 1972-04-11 Int Standard Electric Corp Method of forming silicon oxide coatings in an electric discharge
GB1391177A (en) * 1971-08-09 1975-04-16 Thermal Syndicate Ltd Vitreous siliceous material
US3775075A (en) * 1972-01-03 1973-11-27 Corning Glass Works Method of forming optical waveguide fibers
DE2203140C3 (de) * 1972-01-24 1974-06-12 Jenaer Glaswerk Schott & Gen., 6500 Mainz Lichtleitfaser aus Quarzglas
GB1427327A (en) * 1972-06-08 1976-03-10 Standard Telephones Cables Ltd Glass optical fibres
JPS5025240A (de) * 1973-06-07 1975-03-17
US3954431A (en) * 1974-09-26 1976-05-04 Bell Telephone Laboratories, Incorporated Optical glass and its production
US4162908A (en) * 1975-08-16 1979-07-31 Heraeus Quarzschmelze Gmbh Method of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glass
CH620181A5 (en) * 1975-08-16 1980-11-14 Heraeus Schott Quarzschmelze Process for the preparation of synthetic quartz glass, apparatus to carry out the process, and the use of the synthetic quartz glass
JPS5263213A (en) * 1975-11-20 1977-05-25 Komatsu Denshi Kinzoku Kk Process for preparing highhpurity transparent silica glass products
US4054641A (en) * 1976-05-07 1977-10-18 John S. Pennish Method for making vitreous silica
US4178165A (en) * 1976-07-09 1979-12-11 Lothar Jung Apparatus for manufacturing hollow and solid ingots
US4102663A (en) * 1976-07-09 1978-07-25 Lothar Jung Method for manufacturing hollow and solid ingots
US4083708A (en) * 1976-09-15 1978-04-11 Exxon Research & Engineering Co. Forming a glass on a substrate
JPS53101661A (en) * 1977-02-16 1978-09-05 Toyo Denso Kk Method of manufacturing laminated print coil plate
FR2432478B1 (de) * 1978-07-31 1982-03-12 Quartz & Silice
FR2447890B1 (fr) * 1979-02-05 1985-06-28 Lyonnaise Transmiss Optiques Procede de fabrication de preformes de fibres optiques a gradient d'indice, et dispositif de mise en oeuvre de ce procede
US4310341A (en) * 1980-09-12 1982-01-12 Bell Telephone Laboratories, Incorporated Removal of --OH impurities from fiber optic precursor materials
US4462974A (en) * 1981-08-19 1984-07-31 Hughes Aircraft Company Process for preparation of water-free oxide material
US4465656A (en) * 1981-08-19 1984-08-14 Hughes Aircraft Company Process for preparation of water-free oxide material
EP0127956A1 (de) * 1983-05-10 1984-12-12 Aetna Telecommunications Laboratories Verfahren zur Herstellung von sinterfähigen Glaskörpern
DE3330910A1 (de) * 1983-08-27 1985-03-07 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zum herstellen eines reaktionsgefaesses fuer kristallzuchtzwecke
US4733939A (en) * 1984-08-18 1988-03-29 Mitsubishi Metal Co., Radiation-resistant optical conductor
CH665202A5 (de) * 1985-01-03 1988-04-29 Troitsky Vladimir N Verfahren zur herstellung von feindispersem siliziumdioxid.
US5032193A (en) * 1986-01-21 1991-07-16 Energy Conversion Devices, Inc. Method of making synthetically engineered materials
FR2714371B1 (fr) * 1993-12-24 1996-02-16 Cabloptic Sa Procédé de recharge d'une préforme de fibre optique, dispositif pour la mise en Óoeuvre de ce procédé et fibre optique par ce procédé.
US6541168B2 (en) * 2000-04-28 2003-04-01 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
US20020005051A1 (en) 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
DE10211958A1 (de) * 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
US20040187525A1 (en) * 2003-03-31 2004-09-30 Coffey Calvin T. Method and apparatus for making soot
DE10358065A1 (de) * 2003-12-11 2005-07-28 Wacker-Chemie Gmbh Vorrichtung zur Herstellung von Fused Silica
EP1700824A1 (de) * 2005-03-09 2006-09-13 Degussa AG Granulate basierend auf pyrogen hergestelles silicon dioxid, sowie Verfahren zu deren Herstellung und Verwendung dergleichen
DE102005018209B4 (de) * 2005-04-19 2007-08-30 Heraeus Tenevo Gmbh Vorrichtung und Verfahren zur Herstellung eines Quarzglaskörpers
DE102006029725B4 (de) * 2006-06-28 2008-08-28 Siemens Ag Verfahren und Vorrichtung zum Einbringen von Stäuben in eine Metallschmelze einer pyrometallurgischen Anlage

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB796735A (en) * 1955-07-25 1958-06-18 British Titan Products Production of silicon dioxide
US2819423A (en) * 1957-03-11 1958-01-07 Gen Electric Plasma transmitter
US2967115A (en) * 1958-07-25 1961-01-03 Gen Electric Method of depositing silicon on a silica coated substrate
US3004137A (en) * 1960-06-07 1961-10-10 Comb And Explosives Res Inc Method and apparatus for the production of high gas temperatures

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2122895A1 (de) * 1970-05-11 1971-11-25 Corning Glass Works Verfahren zur Herstellung optischer Fasern
WO2002008132A1 (de) * 2000-07-21 2002-01-31 Heraeus Tenevo Ag Verfahren zur herstellung einer vorform für optische fasern, sowie die vorform und die optische faser

Also Published As

Publication number Publication date
NL6400714A (de) 1964-07-30
DE1208740B (de) 1966-01-13
US3275408A (en) 1966-09-27
GB1061042A (en) 1967-03-08
JPS4816330B1 (de) 1973-05-21
NL128054C (de)

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