CH418770A - Process for applying thin layers by thermal evaporation - Google Patents

Process for applying thin layers by thermal evaporation

Info

Publication number
CH418770A
CH418770A CH16963A CH16963A CH418770A CH 418770 A CH418770 A CH 418770A CH 16963 A CH16963 A CH 16963A CH 16963 A CH16963 A CH 16963A CH 418770 A CH418770 A CH 418770A
Authority
CH
Switzerland
Prior art keywords
thin layers
thermal evaporation
applying thin
applying
evaporation
Prior art date
Application number
CH16963A
Other languages
German (de)
Inventor
Herwig Dr Horn
Aldrian Adolf
Original Assignee
Herwig Dr Horn
Aldrian Adolf
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Herwig Dr Horn, Aldrian Adolf filed Critical Herwig Dr Horn
Publication of CH418770A publication Critical patent/CH418770A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/935Gas flow control
CH16963A 1962-01-16 1963-01-08 Process for applying thin layers by thermal evaporation CH418770A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT30362A AT231530B (en) 1962-01-16 1962-01-16 Method and device for applying thin layers by thermal evaporation

Publications (1)

Publication Number Publication Date
CH418770A true CH418770A (en) 1966-08-15

Family

ID=3486966

Family Applications (1)

Application Number Title Priority Date Filing Date
CH16963A CH418770A (en) 1962-01-16 1963-01-08 Process for applying thin layers by thermal evaporation

Country Status (5)

Country Link
US (1) US3333982A (en)
AT (1) AT231530B (en)
CH (1) CH418770A (en)
GB (1) GB1005341A (en)
NL (1) NL287577A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3569706A (en) * 1965-10-22 1971-03-09 Physics Technology Lab Inc Method and apparatus for generating a continuous beam of neutral atoms
FR2455634A1 (en) * 1979-05-04 1980-11-28 Bois Daniel METHOD AND DEVICE FOR VACUUM EVAPORATION DEPOSITION USING A MOLDED ELECTRON BEAM AND A SCREEN
CA1197088A (en) * 1983-10-17 1985-11-26 Jerzy A. Dobrowolski Vapour deposition regulating apparatus
US5133286A (en) * 1989-04-14 1992-07-28 Samsung Electro-Mechanics Co., Ltd. Substrate-heating device and boat structure for a vacuum-depositing apparatus
DE4100643C1 (en) * 1991-01-11 1991-10-31 Leybold Ag, 6450 Hanau, De
DE10330401B3 (en) * 2003-07-04 2005-02-24 Applied Films Gmbh & Co. Kg Method and device for the area-wise application of release agents
DE102010021547A1 (en) * 2010-05-20 2011-11-24 Konstantinos Fostiropoulos Depositing thin films on substrates by vacuum deposition method, comprises heating coating material in form of vapor cloud in evaporation source until it vaporizes, and spreading evaporated coating material on surface of substrate
US20120027953A1 (en) * 2010-07-28 2012-02-02 Synos Technology, Inc. Rotating Reactor Assembly for Depositing Film on Substrate
US20150024538A1 (en) * 2013-07-19 2015-01-22 Tsmc Solar Ltd. Vapor dispensing apparatus and method for solar panel

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2160981A (en) * 1935-10-19 1939-06-06 O'brien Brian Method and apparatus for producing thin wedges
US2614524A (en) * 1946-08-22 1952-10-21 Rca Corp Capacitor manufacturing evaporation apparatus
US3087838A (en) * 1955-10-05 1963-04-30 Hupp Corp Methods of photoelectric cell manufacture
US2948261A (en) * 1956-12-07 1960-08-09 Western Electric Co Apparatus for producing printed wiring by metal vaporization
US3108560A (en) * 1959-07-15 1963-10-29 Gen Motors Corp Means for assembling printed circuits with components

Also Published As

Publication number Publication date
NL287577A (en)
GB1005341A (en) 1965-09-22
AT231530B (en) 1964-02-10
US3333982A (en) 1967-08-01

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