AT264953B - Process for vapor deposition of thin layers - Google Patents

Process for vapor deposition of thin layers

Info

Publication number
AT264953B
AT264953B AT9766A AT9766A AT264953B AT 264953 B AT264953 B AT 264953B AT 9766 A AT9766 A AT 9766A AT 9766 A AT9766 A AT 9766A AT 264953 B AT264953 B AT 264953B
Authority
AT
Austria
Prior art keywords
vapor deposition
thin layers
layers
thin
deposition
Prior art date
Application number
AT9766A
Other languages
German (de)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Application granted granted Critical
Publication of AT264953B publication Critical patent/AT264953B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
AT9766A 1965-01-08 1966-01-05 Process for vapor deposition of thin layers AT264953B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB104965A GB1103211A (en) 1965-01-08 1965-01-08 Improvements in and relating to vapour deposition and evaporation sources

Publications (1)

Publication Number Publication Date
AT264953B true AT264953B (en) 1968-09-25

Family

ID=9715280

Family Applications (1)

Application Number Title Priority Date Filing Date
AT9766A AT264953B (en) 1965-01-08 1966-01-05 Process for vapor deposition of thin layers

Country Status (6)

Country Link
AT (1) AT264953B (en)
CH (1) CH487263A (en)
DE (1) DE1521421A1 (en)
FR (1) FR1462913A (en)
GB (1) GB1103211A (en)
NL (1) NL6600024A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1440921A (en) * 1972-07-14 1976-06-30 Secr Defence Evaporation of metals
US6223683B1 (en) 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
US6251233B1 (en) * 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
US6599584B2 (en) 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
EP1495069A1 (en) 2002-04-15 2005-01-12 The Coca-Cola Company Coating composition containing an epoxide additive and structures coated therewith
HUE052716T2 (en) * 2015-06-29 2021-05-28 Flisom Ag Evaporation crucible with floater

Also Published As

Publication number Publication date
NL6600024A (en) 1966-07-11
CH487263A (en) 1970-03-15
FR1462913A (en) 1966-12-16
GB1103211A (en) 1968-02-14
DE1521421A1 (en) 1969-12-11

Similar Documents

Publication Publication Date Title
CH510747A (en) Process for the deposition of a thin film
CH458710A (en) Process for coating substrates
CH499628A (en) Process for growing thin, non-conductive layers
CH491207A (en) Maskless vapor deposition process
AT250541B (en) Process for coating objects
AT264953B (en) Process for vapor deposition of thin layers
SE333175B (en) PROCEDURE FOR ELECTROLY-FREE DEPOSIT OF A COBOLATE LAYER
CH418770A (en) Process for applying thin layers by thermal evaporation
CH457374A (en) Process for depositing an epitaxial layer of crystalline material
AT303485B (en) PROCESS FOR VACUUM EVAPORATION OF LAYERS
CH475030A (en) Process for the production of semiconductor layers by deposition from the gas phase
AT270749B (en) Process for the deposition of highly pure crystalline material
AT280478B (en) Process for coating tablets
CH513252A (en) Process for the thermal application of layers
CH484198A (en) Process for reducing substituted silanes
AT264746B (en) Arrangement for vapor deposition of interference layers
AT273230B (en) Process for covering substrates by vapor deposition
AT280449B (en) Process for coating an electrode
CH532128A (en) Process for vapor deposition of a thin layer
CH519584A (en) Process for depositing thin layers of metal
CH469815A (en) Process for vapor deposition of a layer
CH438701A (en) Process for coating synthetic organic thermoplastic films
CH480449A (en) Process for the deposition of monocrystalline semiconducting or metallic substances
CH499461A (en) Process for the production of dicyan
AT285164B (en) Process for the interpolymerization of olefinic compounds