CH532128A - Process for vapor deposition of a thin layer - Google Patents

Process for vapor deposition of a thin layer

Info

Publication number
CH532128A
CH532128A CH1352170A CH1352170A CH532128A CH 532128 A CH532128 A CH 532128A CH 1352170 A CH1352170 A CH 1352170A CH 1352170 A CH1352170 A CH 1352170A CH 532128 A CH532128 A CH 532128A
Authority
CH
Switzerland
Prior art keywords
vapor deposition
thin layer
thin
layer
deposition
Prior art date
Application number
CH1352170A
Other languages
German (de)
Inventor
Cochrane Monachan Brian
Allen John
Napier Hope Alexander James
Original Assignee
Barr & Stroud Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Barr & Stroud Ltd filed Critical Barr & Stroud Ltd
Publication of CH532128A publication Critical patent/CH532128A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH1352170A 1969-09-19 1970-09-11 Process for vapor deposition of a thin layer CH532128A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4618569A GB1263582A (en) 1969-09-19 1969-09-19 Improvements in or relating to thin film deposition

Publications (1)

Publication Number Publication Date
CH532128A true CH532128A (en) 1972-12-31

Family

ID=10440203

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1352170A CH532128A (en) 1969-09-19 1970-09-11 Process for vapor deposition of a thin layer

Country Status (5)

Country Link
CH (1) CH532128A (en)
DE (1) DE2045198B2 (en)
FR (1) FR2062402A5 (en)
GB (1) GB1263582A (en)
NL (1) NL141582B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3518197A1 (en) * 1985-05-21 1986-11-27 Heinrich 7413 Gomaringen Grünwald METHOD FOR REMOVING METALIONS FROM BODIES OF GLASS, CERAMIC MATERIALS AND OTHER AMORPHOUS MATERIALS AND CRYSTALLINE MATERIALS

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
EP0845151A1 (en) * 1996-05-09 1998-06-03 Applied Materials, Inc. Recessed coil for generating a plasma
US6254746B1 (en) 1996-05-09 2001-07-03 Applied Materials, Inc. Recessed coil for generating a plasma

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3518197A1 (en) * 1985-05-21 1986-11-27 Heinrich 7413 Gomaringen Grünwald METHOD FOR REMOVING METALIONS FROM BODIES OF GLASS, CERAMIC MATERIALS AND OTHER AMORPHOUS MATERIALS AND CRYSTALLINE MATERIALS

Also Published As

Publication number Publication date
GB1263582A (en) 1972-02-09
NL7013403A (en) 1971-03-23
DE2045198A1 (en) 1971-04-01
NL141582B (en) 1974-03-15
FR2062402A5 (en) 1971-06-25
DE2045198B2 (en) 1972-06-22

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Legal Events

Date Code Title Description
PL Patent ceased