AT231530B - Method and device for applying thin layers by thermal evaporation - Google Patents

Method and device for applying thin layers by thermal evaporation

Info

Publication number
AT231530B
AT231530B AT30362A AT30362A AT231530B AT 231530 B AT231530 B AT 231530B AT 30362 A AT30362 A AT 30362A AT 30362 A AT30362 A AT 30362A AT 231530 B AT231530 B AT 231530B
Authority
AT
Austria
Prior art keywords
thin layers
thermal evaporation
applying thin
applying
evaporation
Prior art date
Application number
AT30362A
Other languages
German (de)
Inventor
Herwig Dr Horn
Adolf Aldrian
Original Assignee
Herwig Dr Horn
Adolf Aldrian
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL287577D priority Critical patent/NL287577A/xx
Application filed by Herwig Dr Horn, Adolf Aldrian filed Critical Herwig Dr Horn
Priority to AT30362A priority patent/AT231530B/en
Priority to CH16963A priority patent/CH418770A/en
Priority to GB1326/63A priority patent/GB1005341A/en
Priority to US251325A priority patent/US3333982A/en
Priority to FR921630A priority patent/FR1343437A/en
Application granted granted Critical
Publication of AT231530B publication Critical patent/AT231530B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/935—Gas flow control
AT30362A 1962-01-16 1962-01-16 Method and device for applying thin layers by thermal evaporation AT231530B (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL287577D NL287577A (en) 1962-01-16
AT30362A AT231530B (en) 1962-01-16 1962-01-16 Method and device for applying thin layers by thermal evaporation
CH16963A CH418770A (en) 1962-01-16 1963-01-08 Process for applying thin layers by thermal evaporation
GB1326/63A GB1005341A (en) 1962-01-16 1963-01-11 Improvements in and relating to methods and devices for applying coatings by vaporisation
US251325A US3333982A (en) 1962-01-16 1963-01-14 Process for the vapor deposition of material without thermal radiation of the substrate
FR921630A FR1343437A (en) 1962-01-16 1963-01-16 Process for applying thin layers by thermal vaporization on an element not subjected to heat radiation, in particular for a microscope, as well as the device for applying the process or similar process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT30362A AT231530B (en) 1962-01-16 1962-01-16 Method and device for applying thin layers by thermal evaporation

Publications (1)

Publication Number Publication Date
AT231530B true AT231530B (en) 1964-02-10

Family

ID=3486966

Family Applications (1)

Application Number Title Priority Date Filing Date
AT30362A AT231530B (en) 1962-01-16 1962-01-16 Method and device for applying thin layers by thermal evaporation

Country Status (5)

Country Link
US (1) US3333982A (en)
AT (1) AT231530B (en)
CH (1) CH418770A (en)
GB (1) GB1005341A (en)
NL (1) NL287577A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010021547A1 (en) * 2010-05-20 2011-11-24 Konstantinos Fostiropoulos Depositing thin films on substrates by vacuum deposition method, comprises heating coating material in form of vapor cloud in evaporation source until it vaporizes, and spreading evaporated coating material on surface of substrate

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3569706A (en) * 1965-10-22 1971-03-09 Physics Technology Lab Inc Method and apparatus for generating a continuous beam of neutral atoms
FR2455634A1 (en) * 1979-05-04 1980-11-28 Bois Daniel METHOD AND DEVICE FOR VACUUM EVAPORATION DEPOSITION USING A MOLDED ELECTRON BEAM AND A SCREEN
CA1197088A (en) * 1983-10-17 1985-11-26 Jerzy A. Dobrowolski Vapour deposition regulating apparatus
US5133286A (en) * 1989-04-14 1992-07-28 Samsung Electro-Mechanics Co., Ltd. Substrate-heating device and boat structure for a vacuum-depositing apparatus
DE4100643C1 (en) * 1991-01-11 1991-10-31 Leybold Ag, 6450 Hanau, De
DE10330401B3 (en) * 2003-07-04 2005-02-24 Applied Films Gmbh & Co. Kg Method and device for the area-wise application of release agents
KR20130079489A (en) * 2010-07-28 2013-07-10 시너스 테크놀리지, 인코포레이티드 Rotating reactor assembly for depositing film on substrate
US20150024538A1 (en) * 2013-07-19 2015-01-22 Tsmc Solar Ltd. Vapor dispensing apparatus and method for solar panel

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2160981A (en) * 1935-10-19 1939-06-06 O'brien Brian Method and apparatus for producing thin wedges
US2614524A (en) * 1946-08-22 1952-10-21 Rca Corp Capacitor manufacturing evaporation apparatus
US3087838A (en) * 1955-10-05 1963-04-30 Hupp Corp Methods of photoelectric cell manufacture
US2948261A (en) * 1956-12-07 1960-08-09 Western Electric Co Apparatus for producing printed wiring by metal vaporization
US3108560A (en) * 1959-07-15 1963-10-29 Gen Motors Corp Means for assembling printed circuits with components

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010021547A1 (en) * 2010-05-20 2011-11-24 Konstantinos Fostiropoulos Depositing thin films on substrates by vacuum deposition method, comprises heating coating material in form of vapor cloud in evaporation source until it vaporizes, and spreading evaporated coating material on surface of substrate

Also Published As

Publication number Publication date
NL287577A (en)
US3333982A (en) 1967-08-01
CH418770A (en) 1966-08-15
GB1005341A (en) 1965-09-22

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