CH380410A - Thermisch isolierende Behandlungskammer mit Einrichtung zur beliebigen Einstellung der Raumlage der zu behandelnden Gegenstände - Google Patents

Thermisch isolierende Behandlungskammer mit Einrichtung zur beliebigen Einstellung der Raumlage der zu behandelnden Gegenstände

Info

Publication number
CH380410A
CH380410A CH7765659A CH7765659A CH380410A CH 380410 A CH380410 A CH 380410A CH 7765659 A CH7765659 A CH 7765659A CH 7765659 A CH7765659 A CH 7765659A CH 380410 A CH380410 A CH 380410A
Authority
CH
Switzerland
Prior art keywords
treated
objects
setting
treatment chamber
spatial position
Prior art date
Application number
CH7765659A
Other languages
English (en)
Inventor
Gessner Siegfried
Fritz Dr Grasenick
Original Assignee
Gessner Siegfried
Fritz Dr Grasenick
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from AT631058A external-priority patent/AT215495B/de
Application filed by Gessner Siegfried, Fritz Dr Grasenick filed Critical Gessner Siegfried
Publication of CH380410A publication Critical patent/CH380410A/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H35/00—Gearings or mechanisms with other special functional features
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F7/00—Shielded cells or rooms
    • G21F7/06—Structural combination with remotely-controlled apparatus, e.g. with manipulators
    • G21F7/063—Remotely manipulated measuring or controlling devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Mechanical Engineering (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Vapour Deposition (AREA)
CH7765659A 1958-09-09 1959-09-01 Thermisch isolierende Behandlungskammer mit Einrichtung zur beliebigen Einstellung der Raumlage der zu behandelnden Gegenstände CH380410A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT631058A AT215495B (de) 1958-09-09 1958-09-09 Einrichtung zur Einstellung der Raumlage von in einer thermisch isolierenden Behandlungskammer zu behandelnden Gegenständen

Publications (1)

Publication Number Publication Date
CH380410A true CH380410A (de) 1964-07-31

Family

ID=3585009

Family Applications (1)

Application Number Title Priority Date Filing Date
CH7765659A CH380410A (de) 1958-09-09 1959-09-01 Thermisch isolierende Behandlungskammer mit Einrichtung zur beliebigen Einstellung der Raumlage der zu behandelnden Gegenstände

Country Status (3)

Country Link
CH (1) CH380410A (de)
DE (1) DE1165900B (de)
GB (1) GB923637A (de)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE491601C (de) * 1926-09-18 1930-02-15 Karl Vossloh Ofen zum Vergueten von Stahlteilen im Dauerbetrieb, bei welchem kippbare Schalen durch einen ringfoermigen Heizkanal absatzweise gefuehrt werden
DE869129C (de) * 1942-07-19 1953-03-02 Suerth Maschf Pruefschrank
DE935637C (de) * 1953-09-02 1955-11-24 Heraeus Gmbh W C Temperaturregler fuer indirekt mittels Heizbad erwaermte Tauchbaeder

Also Published As

Publication number Publication date
DE1165900B (de) 1964-03-19
GB923637A (en) 1963-04-18

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