CH307775A - Verfahren zur Herstellung halbleitender, kristallinischer Schichten. - Google Patents

Verfahren zur Herstellung halbleitender, kristallinischer Schichten.

Info

Publication number
CH307775A
CH307775A CH307775DA CH307775A CH 307775 A CH307775 A CH 307775A CH 307775D A CH307775D A CH 307775DA CH 307775 A CH307775 A CH 307775A
Authority
CH
Switzerland
Prior art keywords
semiconducting
production
crystalline layers
crystalline
layers
Prior art date
Application number
Other languages
English (en)
Inventor
Telefonaktiebolaget L Ericsson
Original Assignee
Ericsson Telefon Ab L M
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ericsson Telefon Ab L M filed Critical Ericsson Telefon Ab L M
Publication of CH307775A publication Critical patent/CH307775A/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02425Conductive materials, e.g. metallic silicides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02524Group 14 semiconducting materials
    • H01L21/02532Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02631Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02656Special treatments
    • H01L21/02664Aftertreatments

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
CH307775D 1952-01-22 1952-09-26 Verfahren zur Herstellung halbleitender, kristallinischer Schichten. CH307775A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE307775X 1952-01-22

Publications (1)

Publication Number Publication Date
CH307775A true CH307775A (de) 1955-06-15

Family

ID=20307566

Family Applications (1)

Application Number Title Priority Date Filing Date
CH307775D CH307775A (de) 1952-01-22 1952-09-26 Verfahren zur Herstellung halbleitender, kristallinischer Schichten.

Country Status (4)

Country Link
BE (1) BE514927A (de)
CH (1) CH307775A (de)
FR (1) FR1064045A (de)
GB (1) GB732797A (de)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1058634B (de) * 1956-06-07 1959-06-04 Ibm Deutschland Gasdiffusionsverfahren zur Herstellung eines Transistors
US3034924A (en) * 1958-10-30 1962-05-15 Balzers Patent Beteilig Ag Use of a rare earth metal in vaporizing metals and metal oxides
US3036933A (en) * 1959-10-06 1962-05-29 Ibm Vacuum evaporation method
US3063871A (en) * 1959-10-23 1962-11-13 Merck & Co Inc Production of semiconductor films
US3071495A (en) * 1958-01-17 1963-01-01 Siemens Ag Method of manufacturing a peltier thermopile
US3172778A (en) * 1961-01-03 1965-03-09 Method for producing thin semi- conducting layers of semicon- ductor compounds
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE548791A (de) * 1955-06-20
DE1227433B (de) * 1955-07-28 1966-10-27 Siemens Ag Verfahren zum Einbau definierter Stoerstellen in Metall- oder Halbleiterschichten
US2963390A (en) * 1955-09-26 1960-12-06 Hoffman Electronics Corp Method of making a photosensitive semi-conductor device
US2964435A (en) * 1957-03-27 1960-12-13 Mc Graw Edison Co Semiconductor devices and their manufacture
DE1098316B (de) * 1957-06-26 1961-01-26 Union Carbide Corp Verfahren zum Herstellen einkristalliner UEberzuege aus dotierten Halbleitergrundstoffen durch Aufdampfen im Vakuum
NL275889A (de) * 1961-03-14
NL291466A (de) * 1962-04-13
DE1237076B (de) * 1962-06-19 1967-03-23 Western Electric Co Verfahren zum Herstellen eines epitaxial aufgewachsenen Siliciumfilms auf einer Halbleiterunterlage

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1058634B (de) * 1956-06-07 1959-06-04 Ibm Deutschland Gasdiffusionsverfahren zur Herstellung eines Transistors
US3071495A (en) * 1958-01-17 1963-01-01 Siemens Ag Method of manufacturing a peltier thermopile
US3034924A (en) * 1958-10-30 1962-05-15 Balzers Patent Beteilig Ag Use of a rare earth metal in vaporizing metals and metal oxides
US3036933A (en) * 1959-10-06 1962-05-29 Ibm Vacuum evaporation method
US3063871A (en) * 1959-10-23 1962-11-13 Merck & Co Inc Production of semiconductor films
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components
US3172778A (en) * 1961-01-03 1965-03-09 Method for producing thin semi- conducting layers of semicon- ductor compounds

Also Published As

Publication number Publication date
FR1064045A (fr) 1954-05-10
BE514927A (de)
GB732797A (en) 1955-06-29

Similar Documents

Publication Publication Date Title
CH328081A (de) Verfahren zur Herstellung fester, haltbarer Diazoniumverbindungen
CH311154A (de) Verfahren zur Herstellung von geformten Gebilden.
CH307775A (de) Verfahren zur Herstellung halbleitender, kristallinischer Schichten.
CH308184A (de) Verfahren zur Herstellung geformter Gebilde aus Polyacrylnitril.
CH322260A (de) Verfahren zur Herstellung von N-Methylol-polypyrrolidonen
CH300957A (de) Verfahren zur Herstellung von Halbzellstoff.
CH307931A (de) Verfahren zur Herstellung von Gespinsten aus Viscose.
CH304353A (de) Verfahren zur Herstellung geformter Gebilde aus Polyacrylnitril.
CH307970A (de) Verfahren zur Herstellung von Chlorfluoräthenen.
AT185893B (de) Verfahren zur Herstellung von P-N-Schichten in Halbleitern
CH305358A (de) Verfahren zur Herstellung von insektizid wirkenden Belägen.
CH311197A (de) Verfahren zur Herstellung von Perchlorindan.
AT182391B (de) Verfahren zur Herstellung von neuen, basischen Äthern substituierter Diphenyl-methyl-carbinole
CH295071A (de) Verfahren zur Herstellung von Polyacrylnitril.
AT195938B (de) Verfahren zur Herstellung neuer, organischer Phosphorverbindungen
CH300332A (de) Verfahren zur Herstellung von B-Phenyl-äthanol.
CH322982A (de) Verfahren zur Herstellung von Dicyan.
AT183075B (de) Verfahren zur Herstellung neuer, basisch substituierter Carbonsäureamide
CH305490A (de) Verfahren zur Herstellung poröser Formkörper.
AT175565B (de) Verfahren zur Herstellung neuer Furanverbindungen
AT176559B (de) Verfahren zur Herstellung neuer Furanverbindungen
AT176558B (de) Verfahren zur Herstellung neuer Furanverbindungen
AT171714B (de) Verfahren zur Herstellung neuer Halogenaryl-pyridyl-alkanone
AT177781B (de) Verfahren zur Herstellung neuer Bis-phenyl-thioharnstoffe
CH296635A (de) Verfahren zur Herstellung von sogenannten Wachstüchern.