CH307775A - Process for the production of semiconducting, crystalline layers. - Google Patents

Process for the production of semiconducting, crystalline layers.

Info

Publication number
CH307775A
CH307775A CH307775DA CH307775A CH 307775 A CH307775 A CH 307775A CH 307775D A CH307775D A CH 307775DA CH 307775 A CH307775 A CH 307775A
Authority
CH
Switzerland
Prior art keywords
semiconducting
production
crystalline layers
crystalline
layers
Prior art date
Application number
Other languages
German (de)
Inventor
Telefonaktiebolaget L Ericsson
Original Assignee
Ericsson Telefon Ab L M
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ericsson Telefon Ab L M filed Critical Ericsson Telefon Ab L M
Publication of CH307775A publication Critical patent/CH307775A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02425—Conductive materials, e.g. metallic silicides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
CH307775D 1952-01-22 1952-09-26 Process for the production of semiconducting, crystalline layers. CH307775A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE307775X 1952-01-22

Publications (1)

Publication Number Publication Date
CH307775A true CH307775A (en) 1955-06-15

Family

ID=20307566

Family Applications (1)

Application Number Title Priority Date Filing Date
CH307775D CH307775A (en) 1952-01-22 1952-09-26 Process for the production of semiconducting, crystalline layers.

Country Status (4)

Country Link
BE (1) BE514927A (en)
CH (1) CH307775A (en)
FR (1) FR1064045A (en)
GB (1) GB732797A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1058634B (en) * 1956-06-07 1959-06-04 Ibm Deutschland Gas diffusion process for manufacturing a transistor
US3034924A (en) * 1958-10-30 1962-05-15 Balzers Patent Beteilig Ag Use of a rare earth metal in vaporizing metals and metal oxides
US3036933A (en) * 1959-10-06 1962-05-29 Ibm Vacuum evaporation method
US3063871A (en) * 1959-10-23 1962-11-13 Merck & Co Inc Production of semiconductor films
US3071495A (en) * 1958-01-17 1963-01-01 Siemens Ag Method of manufacturing a peltier thermopile
US3172778A (en) * 1961-01-03 1965-03-09 Method for producing thin semi- conducting layers of semicon- ductor compounds
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE548791A (en) * 1955-06-20
DE1227433B (en) * 1955-07-28 1966-10-27 Siemens Ag Process for the installation of defined interference points in metal or semiconductor layers
US2963390A (en) * 1955-09-26 1960-12-06 Hoffman Electronics Corp Method of making a photosensitive semi-conductor device
US2964435A (en) * 1957-03-27 1960-12-13 Mc Graw Edison Co Semiconductor devices and their manufacture
DE1098316B (en) * 1957-06-26 1961-01-26 Union Carbide Corp Process for the production of single-crystalline coatings from doped semiconductor raw materials by vapor deposition in a vacuum
FR1317607A (en) * 1961-03-14 1963-05-08
NL291466A (en) * 1962-04-13
DE1237076B (en) * 1962-06-19 1967-03-23 Western Electric Co Process for producing an epitaxially grown silicon film on a semiconductor substrate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1058634B (en) * 1956-06-07 1959-06-04 Ibm Deutschland Gas diffusion process for manufacturing a transistor
US3071495A (en) * 1958-01-17 1963-01-01 Siemens Ag Method of manufacturing a peltier thermopile
US3034924A (en) * 1958-10-30 1962-05-15 Balzers Patent Beteilig Ag Use of a rare earth metal in vaporizing metals and metal oxides
US3036933A (en) * 1959-10-06 1962-05-29 Ibm Vacuum evaporation method
US3063871A (en) * 1959-10-23 1962-11-13 Merck & Co Inc Production of semiconductor films
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components
US3172778A (en) * 1961-01-03 1965-03-09 Method for producing thin semi- conducting layers of semicon- ductor compounds

Also Published As

Publication number Publication date
FR1064045A (en) 1954-05-10
BE514927A (en)
GB732797A (en) 1955-06-29

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