CA988647A - Film forming polymeric compositions - Google Patents

Film forming polymeric compositions

Info

Publication number
CA988647A
CA988647A CA139,053A CA139053A CA988647A CA 988647 A CA988647 A CA 988647A CA 139053 A CA139053 A CA 139053A CA 988647 A CA988647 A CA 988647A
Authority
CA
Canada
Prior art keywords
film forming
polymeric compositions
forming polymeric
compositions
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA139,053A
Other languages
English (en)
Other versions
CA139053S (en
Inventor
Fredrick L. Hamb
John C. Wilson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of CA988647A publication Critical patent/CA988647A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16—Dicarboxylic acids and dihydroxy compounds
    • C08G63/18—Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/199—Acids or hydroxy compounds containing cycloaliphatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/44—Polyester-amides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G03C1/7954—Polyesters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polyamides (AREA)
CA139,053A 1971-05-07 1972-04-06 Film forming polymeric compositions Expired CA988647A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14144571A 1971-05-07 1971-05-07

Publications (1)

Publication Number Publication Date
CA988647A true CA988647A (en) 1976-05-04

Family

ID=22495727

Family Applications (1)

Application Number Title Priority Date Filing Date
CA139,053A Expired CA988647A (en) 1971-05-07 1972-04-06 Film forming polymeric compositions

Country Status (6)

Country Link
US (1) US3725070A (de)
BE (1) BE783169A (de)
CA (1) CA988647A (de)
DE (1) DE2222145C3 (de)
FR (1) FR2137599B1 (de)
GB (1) GB1369923A (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3816122A (en) * 1972-02-02 1974-06-11 Eastman Kodak Co Film element comprising aromatic diester containing copolyester support
US3856751A (en) * 1972-06-14 1974-12-24 Eastman Kodak Co Diacid-xanthylium ion polyester and photographic element comprised thereof
US3856526A (en) * 1973-08-06 1974-12-24 Eastman Kodak Co Protective layer for photothermographic elements
US3856527A (en) * 1973-08-06 1974-12-24 Eastman Kodak Co Protective layer for photothermographic elements
US3915939A (en) * 1974-02-21 1975-10-28 Eastman Kodak Co High temperature film forming polyamide polymers
US3897253A (en) * 1974-02-21 1975-07-29 Eastman Kodak Co Photographic elements containing high temperature-resistant polyamides
US4076532A (en) * 1976-01-16 1978-02-28 Eastman Kodak Company Thermosensitive image-forming element and method of processing thereof
US4197393A (en) * 1978-05-30 1980-04-08 University Patents, Inc. Biphenylene polymers and resins and the production thereof
US4414380A (en) * 1982-10-29 1983-11-08 Uop Inc. Unsubstituted biphenylene as a cross-linking monomer
DE3482606D1 (de) 1983-11-25 1990-08-02 Fuji Photo Film Co Ltd Waermeentwickelbares lichtempfindliches material.
US4710631A (en) * 1984-08-28 1987-12-01 Fuji Photo Film Co., Ltd. Temperature compensation for a semiconductor light source used for exposure of light sensitive material
JPS61250636A (ja) 1985-04-30 1986-11-07 Fuji Photo Film Co Ltd 熱現像感光材料
JPH083621B2 (ja) 1985-07-31 1996-01-17 富士写真フイルム株式会社 画像形成方法
US4757132A (en) * 1986-10-20 1988-07-12 General Electric Company Cyclic polyester oligomer polymerization
US4808754A (en) * 1987-02-27 1989-02-28 General Electric Company Spirobiindane bis-aminophenoxy ethers
USRE34431E (en) * 1986-07-21 1993-11-02 General Electric Company Macrocyclic oligomers containing spiro(bis)indane moieties
US4980453A (en) * 1986-07-21 1990-12-25 General Electric Company Macrocyclic oligomers containing spiro(bis)indane moietes
WO1988006605A1 (en) * 1987-02-27 1988-09-07 General Electric Company Macrocyclic oligomers containing spiro(bis)indane moieties
US4868279A (en) * 1987-02-27 1989-09-19 General Electric Company Spiro(bis) indane copolyamide and preparation thereof
US4853457A (en) * 1987-10-26 1989-08-01 General Electric Company Preparation of spirobiindane polyarylates, and spirobiindane polyarylate-polyethylene terephthalate copolymers, via melt polymerization
US4864034A (en) * 1988-01-20 1989-09-05 General Electric Company Spiro(bis)indane bis-oxyphthalic acids and functional derivatives thereof
US5110893A (en) * 1988-01-20 1992-05-05 General Electric Company Preparation and polymerization of cyclic aromatic ketones
US4942105A (en) * 1989-01-03 1990-07-17 Xerox Corporation Electrostatographic imaging system
DE4002082A1 (de) * 1990-01-25 1991-08-01 Hoechst Ag Verwendung von polyetherketonen als orientierungsschichten
US5935748A (en) * 1998-07-23 1999-08-10 Xerox Corporation Mechanically robust anti-curl layer
US6071662A (en) * 1998-07-23 2000-06-06 Xerox Corporation Imaging member with improved anti-curl backing layer
KR20160048863A (ko) 2013-08-25 2016-05-04 몰레큘러 글래시스, 인코포레이티드 유기 전자공학 응용을 위한 분자 유리 혼합물
US10593886B2 (en) 2013-08-25 2020-03-17 Molecular Glasses, Inc. OLED devices with improved lifetime using non-crystallizable molecular glass mixture hosts
US10211409B2 (en) 2014-02-02 2019-02-19 Molecular Glasses, Inc. Noncrystallizable sensitized layers for OLED and OEDs

Also Published As

Publication number Publication date
FR2137599A1 (de) 1972-12-29
BE783169A (fr) 1972-09-01
FR2137599B1 (de) 1974-09-27
GB1369923A (en) 1974-10-09
DE2222145C3 (de) 1979-03-29
DE2222145A1 (de) 1972-11-23
US3725070A (en) 1973-04-03
DE2222145B2 (de) 1978-07-20

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