BE783169A - Polycondensats filmogenes utilisables pour preparer des supports photographiques - Google Patents

Polycondensats filmogenes utilisables pour preparer des supports photographiques

Info

Publication number
BE783169A
BE783169A BE783169A BE783169A BE783169A BE 783169 A BE783169 A BE 783169A BE 783169 A BE783169 A BE 783169A BE 783169 A BE783169 A BE 783169A BE 783169 A BE783169 A BE 783169A
Authority
BE
Belgium
Prior art keywords
film
generated
prepare photographic
photographic substrates
polycondensates used
Prior art date
Application number
BE783169A
Other languages
English (en)
French (fr)
Inventor
F L Hamb
J C Wilson
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of BE783169A publication Critical patent/BE783169A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16—Dicarboxylic acids and dihydroxy compounds
    • C08G63/18—Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/199—Acids or hydroxy compounds containing cycloaliphatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/44—Polyester-amides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G03C1/7954—Polyesters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polyamides (AREA)
BE783169A 1971-05-07 1972-05-08 Polycondensats filmogenes utilisables pour preparer des supports photographiques BE783169A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14144571A 1971-05-07 1971-05-07

Publications (1)

Publication Number Publication Date
BE783169A true BE783169A (fr) 1972-09-01

Family

ID=22495727

Family Applications (1)

Application Number Title Priority Date Filing Date
BE783169A BE783169A (fr) 1971-05-07 1972-05-08 Polycondensats filmogenes utilisables pour preparer des supports photographiques

Country Status (6)

Country Link
US (1) US3725070A (xx)
BE (1) BE783169A (xx)
CA (1) CA988647A (xx)
DE (1) DE2222145C3 (xx)
FR (1) FR2137599B1 (xx)
GB (1) GB1369923A (xx)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3816122A (en) * 1972-02-02 1974-06-11 Eastman Kodak Co Film element comprising aromatic diester containing copolyester support
US3856751A (en) * 1972-06-14 1974-12-24 Eastman Kodak Co Diacid-xanthylium ion polyester and photographic element comprised thereof
US3856527A (en) * 1973-08-06 1974-12-24 Eastman Kodak Co Protective layer for photothermographic elements
US3856526A (en) * 1973-08-06 1974-12-24 Eastman Kodak Co Protective layer for photothermographic elements
US3897253A (en) * 1974-02-21 1975-07-29 Eastman Kodak Co Photographic elements containing high temperature-resistant polyamides
US3915939A (en) * 1974-02-21 1975-10-28 Eastman Kodak Co High temperature film forming polyamide polymers
US4076532A (en) * 1976-01-16 1978-02-28 Eastman Kodak Company Thermosensitive image-forming element and method of processing thereof
US4197393A (en) * 1978-05-30 1980-04-08 University Patents, Inc. Biphenylene polymers and resins and the production thereof
US4414380A (en) * 1982-10-29 1983-11-08 Uop Inc. Unsubstituted biphenylene as a cross-linking monomer
EP0143424B1 (en) 1983-11-25 1990-06-27 Fuji Photo Film Co., Ltd. Heat-developable light-sensitive materials
US4710631A (en) * 1984-08-28 1987-12-01 Fuji Photo Film Co., Ltd. Temperature compensation for a semiconductor light source used for exposure of light sensitive material
JPS61250636A (ja) 1985-04-30 1986-11-07 Fuji Photo Film Co Ltd 熱現像感光材料
JPH083621B2 (ja) 1985-07-31 1996-01-17 富士写真フイルム株式会社 画像形成方法
US4757132A (en) * 1986-10-20 1988-07-12 General Electric Company Cyclic polyester oligomer polymerization
US4808754A (en) * 1987-02-27 1989-02-28 General Electric Company Spirobiindane bis-aminophenoxy ethers
USRE34431E (en) * 1986-07-21 1993-11-02 General Electric Company Macrocyclic oligomers containing spiro(bis)indane moieties
US4980453A (en) * 1986-07-21 1990-12-25 General Electric Company Macrocyclic oligomers containing spiro(bis)indane moietes
JP2565559B2 (ja) * 1987-02-27 1996-12-18 ゼネラル・エレクトリック・カンパニイ スピロービスーインダン部分を含む大環式オリゴマー
US4868279A (en) * 1987-02-27 1989-09-19 General Electric Company Spiro(bis) indane copolyamide and preparation thereof
US4853457A (en) * 1987-10-26 1989-08-01 General Electric Company Preparation of spirobiindane polyarylates, and spirobiindane polyarylate-polyethylene terephthalate copolymers, via melt polymerization
US4864034A (en) * 1988-01-20 1989-09-05 General Electric Company Spiro(bis)indane bis-oxyphthalic acids and functional derivatives thereof
US5110893A (en) * 1988-01-20 1992-05-05 General Electric Company Preparation and polymerization of cyclic aromatic ketones
US4942105A (en) * 1989-01-03 1990-07-17 Xerox Corporation Electrostatographic imaging system
DE4002082A1 (de) * 1990-01-25 1991-08-01 Hoechst Ag Verwendung von polyetherketonen als orientierungsschichten
US6071662A (en) * 1998-07-23 2000-06-06 Xerox Corporation Imaging member with improved anti-curl backing layer
US5935748A (en) * 1998-07-23 1999-08-10 Xerox Corporation Mechanically robust anti-curl layer
US10593886B2 (en) 2013-08-25 2020-03-17 Molecular Glasses, Inc. OLED devices with improved lifetime using non-crystallizable molecular glass mixture hosts
CN105793779A (zh) 2013-08-25 2016-07-20 分子玻璃公司 用于有机电子应用的分子玻璃混合物
WO2015117100A1 (en) 2014-02-02 2015-08-06 Molaire Consulting Llc Noncrystallizable sensitized layers for oled and oeds

Also Published As

Publication number Publication date
GB1369923A (en) 1974-10-09
US3725070A (en) 1973-04-03
DE2222145B2 (de) 1978-07-20
DE2222145A1 (de) 1972-11-23
FR2137599B1 (xx) 1974-09-27
FR2137599A1 (xx) 1972-12-29
DE2222145C3 (de) 1979-03-29
CA988647A (en) 1976-05-04

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