CA960504A - Light-sensitive copying composition and copying material produced therewith - Google Patents

Light-sensitive copying composition and copying material produced therewith

Info

Publication number
CA960504A
CA960504A CA117,814A CA117814A CA960504A CA 960504 A CA960504 A CA 960504A CA 117814 A CA117814 A CA 117814A CA 960504 A CA960504 A CA 960504A
Authority
CA
Canada
Prior art keywords
copying
light
material produced
composition
produced therewith
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA117,814A
Other languages
English (en)
Other versions
CA117814S (en
Inventor
Fritz Uhlig
Roland Giesse
Hartmut Steppan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19702034655 external-priority patent/DE2034655C3/de
Application filed by Hoechst AG filed Critical Hoechst AG
Application granted granted Critical
Publication of CA960504A publication Critical patent/CA960504A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217Polyurethanes; Epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C08F299/028Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4064Curing agents not provided for by the groups C08G59/42 - C08G59/66 sulfur containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4071Curing agents not provided for by the groups C08G59/42 - C08G59/66 phosphorus containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • C08G59/625Hydroxyacids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Epoxy Resins (AREA)
CA117,814A 1970-07-13 1971-07-09 Light-sensitive copying composition and copying material produced therewith Expired CA960504A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702034655 DE2034655C3 (de) 1970-07-13 Negativ arbeitende Kopierlösung und deren Verwendung für die Druckplattenherstellung

Publications (1)

Publication Number Publication Date
CA960504A true CA960504A (en) 1975-01-07

Family

ID=5776600

Family Applications (1)

Application Number Title Priority Date Filing Date
CA117,814A Expired CA960504A (en) 1970-07-13 1971-07-09 Light-sensitive copying composition and copying material produced therewith

Country Status (14)

Country Link
US (1) US3790385A (de)
JP (1) JPS543607B1 (de)
AT (1) AT308783B (de)
AU (1) AU3106471A (de)
BE (1) BE769906A (de)
CA (1) CA960504A (de)
CS (1) CS151407B2 (de)
FR (1) FR2101639A5 (de)
GB (1) GB1358922A (de)
HU (1) HU163890B (de)
NL (1) NL7109179A (de)
SE (1) SE370581B (de)
SU (1) SU461516A3 (de)
ZA (1) ZA714590B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4210449A (en) * 1972-10-16 1980-07-01 American Can Company Radiation sensitive composition comprising copolymer of glycidyl methacrylate and allyl glycidyl ether and diazonium salt of complex halogenide
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
US4272604A (en) * 1975-06-09 1981-06-09 Western Litho Plate & Supply Co. Base plate and lithographic plate prepared by sensitization thereof
US4272605A (en) * 1975-06-09 1981-06-09 Western Litho Plate & Supply Co. Base plate and lithographic plate prepared by sensitization thereof
US4198470A (en) * 1975-06-09 1980-04-15 Western Litho Plate & Supply Co. Base plate and lithographic plate prepared by sensitization thereof
US4171974A (en) * 1978-02-15 1979-10-23 Polychrome Corporation Aqueous alkali developable negative working lithographic printing plates
DE2822887A1 (de) * 1978-05-26 1979-11-29 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
US4245029A (en) * 1979-08-20 1981-01-13 General Electric Company Photocurable compositions using triarylsulfonium salts
FR2475753B1 (fr) * 1980-02-11 1987-03-20 Rhone Poulenc Syst Plaque lithographique a base de fluoborate de paradiazodiphenylamine et de resine epoxy liquide
US4292396A (en) * 1980-03-03 1981-09-29 Western Litho Plate & Supply Co. Method for improving the press life of a lithographic image having an outer layer comprising an epoxy resin and article produced by method
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3938788A1 (de) * 1989-11-23 1991-05-29 Hoechst Ag Verfahren zur herstellung einer negativ arbeitenden lichtempfindlichen druckform
US5206349A (en) * 1990-08-10 1993-04-27 Toyo Gosei Kogy Co., Ltd. Aromatic diazo compounds and photosensitive compositions using the same
IT1245307B (it) * 1990-12-13 1994-09-19 Lastra Spa Polimeri e lastre fotosensibili
DE69608734T2 (de) * 1995-02-15 2000-11-23 Agfa-Gevaert N.V., Mortsel Diazo-Aufzeichnungselement mit verbesserter Lagerstabilität

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB921530A (en) * 1958-09-02 1963-03-20 Algraphy Ltd Photopolymerisable materials derived from epoxy resins for lithographic printing plates
BE593423A (de) * 1959-07-29
BE606888A (de) * 1960-08-05 1900-01-01
BE630566A (de) * 1962-04-03
DE1202292B (de) * 1963-10-04 1965-10-07 Kalle Ag Aluminiumtraeger fuer Flachdruckformen
DE1447016C3 (de) * 1963-10-25 1973-11-15 Kalle Ag, 6202 Wiesbaden-Biebrich Vorsensibilisierte Druckplatte
US3615532A (en) * 1963-12-09 1971-10-26 Union Carbide Corp Printing plate compositions
US3453108A (en) * 1965-04-13 1969-07-01 Agfa Gevaert Nv Photochemical cross-linking of polymers
DE1546786C3 (de) * 1965-06-03 1973-12-13 Kalle Ag, 6202 Wiesbaden-Biebrich Verfahren und Material zur Her stellung von Flachdruckplatten
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
BE757479A (fr) * 1969-10-15 1971-04-14 Xidex Corp Element vesiculaire de formation d'une image
US3652272A (en) * 1969-10-31 1972-03-28 Lithoplate Inc Phenoxy photopolymer having no epoxy groups, and article made therefrom

Also Published As

Publication number Publication date
ZA714590B (en) 1972-04-26
DE2034655B2 (de) 1977-03-31
SU461516A3 (ru) 1975-02-25
GB1358922A (en) 1974-07-03
CS151407B2 (de) 1973-10-19
FR2101639A5 (de) 1972-03-31
US3790385A (en) 1974-02-05
BE769906A (fr) 1972-01-12
JPS543607B1 (de) 1979-02-24
AT308783B (de) 1973-07-25
NL7109179A (de) 1972-01-17
SE370581B (de) 1974-10-21
AU3106471A (en) 1973-01-11
DE2034655A1 (de) 1972-01-20
HU163890B (de) 1973-11-28

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