BE769906A - Masse de reproduction photosensible et materiel de reproductionprepare a l'aide de cette masse - Google Patents

Masse de reproduction photosensible et materiel de reproductionprepare a l'aide de cette masse

Info

Publication number
BE769906A
BE769906A BE769906A BE769906A BE769906A BE 769906 A BE769906 A BE 769906A BE 769906 A BE769906 A BE 769906A BE 769906 A BE769906 A BE 769906A BE 769906 A BE769906 A BE 769906A
Authority
BE
Belgium
Prior art keywords
mass
reproductive
photosensitive
material prepared
reproductive material
Prior art date
Application number
BE769906A
Other languages
English (en)
French (fr)
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19702034655 external-priority patent/DE2034655C3/de
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of BE769906A publication Critical patent/BE769906A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4064—Curing agents not provided for by the groups C08G59/42 - C08G59/66 sulfur containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4071—Curing agents not provided for by the groups C08G59/42 - C08G59/66 phosphorus containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62—Alcohols or phenols
    • C08G59/625—Hydroxyacids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Epoxy Resins (AREA)
BE769906A 1970-07-13 1971-07-12 Masse de reproduction photosensible et materiel de reproductionprepare a l'aide de cette masse BE769906A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702034655 DE2034655C3 (de) 1970-07-13 Negativ arbeitende Kopierlösung und deren Verwendung für die Druckplattenherstellung

Publications (1)

Publication Number Publication Date
BE769906A true BE769906A (fr) 1972-01-12

Family

ID=5776600

Family Applications (1)

Application Number Title Priority Date Filing Date
BE769906A BE769906A (fr) 1970-07-13 1971-07-12 Masse de reproduction photosensible et materiel de reproductionprepare a l'aide de cette masse

Country Status (14)

Country Link
US (1) US3790385A (xx)
JP (1) JPS543607B1 (xx)
AT (1) AT308783B (xx)
AU (1) AU3106471A (xx)
BE (1) BE769906A (xx)
CA (1) CA960504A (xx)
CS (1) CS151407B2 (xx)
FR (1) FR2101639A5 (xx)
GB (1) GB1358922A (xx)
HU (1) HU163890B (xx)
NL (1) NL7109179A (xx)
SE (1) SE370581B (xx)
SU (1) SU461516A3 (xx)
ZA (1) ZA714590B (xx)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4210449A (en) * 1972-10-16 1980-07-01 American Can Company Radiation sensitive composition comprising copolymer of glycidyl methacrylate and allyl glycidyl ether and diazonium salt of complex halogenide
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
US4272604A (en) * 1975-06-09 1981-06-09 Western Litho Plate & Supply Co. Base plate and lithographic plate prepared by sensitization thereof
US4272605A (en) * 1975-06-09 1981-06-09 Western Litho Plate & Supply Co. Base plate and lithographic plate prepared by sensitization thereof
US4198470A (en) * 1975-06-09 1980-04-15 Western Litho Plate & Supply Co. Base plate and lithographic plate prepared by sensitization thereof
US4171974A (en) * 1978-02-15 1979-10-23 Polychrome Corporation Aqueous alkali developable negative working lithographic printing plates
DE2822887A1 (de) * 1978-05-26 1979-11-29 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
US4245029A (en) * 1979-08-20 1981-01-13 General Electric Company Photocurable compositions using triarylsulfonium salts
FR2475753B1 (fr) * 1980-02-11 1987-03-20 Rhone Poulenc Syst Plaque lithographique a base de fluoborate de paradiazodiphenylamine et de resine epoxy liquide
US4292396A (en) * 1980-03-03 1981-09-29 Western Litho Plate & Supply Co. Method for improving the press life of a lithographic image having an outer layer comprising an epoxy resin and article produced by method
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3938788A1 (de) * 1989-11-23 1991-05-29 Hoechst Ag Verfahren zur herstellung einer negativ arbeitenden lichtempfindlichen druckform
US5206349A (en) * 1990-08-10 1993-04-27 Toyo Gosei Kogy Co., Ltd. Aromatic diazo compounds and photosensitive compositions using the same
IT1245307B (it) * 1990-12-13 1994-09-19 Lastra Spa Polimeri e lastre fotosensibili
DE69608734T2 (de) * 1995-02-15 2000-11-23 Agfa-Gevaert N.V., Mortsel Diazo-Aufzeichnungselement mit verbesserter Lagerstabilität

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB921530A (en) * 1958-09-02 1963-03-20 Algraphy Ltd Photopolymerisable materials derived from epoxy resins for lithographic printing plates
BE593423A (xx) * 1959-07-29
BE606888A (xx) * 1960-08-05 1900-01-01
BE630566A (xx) * 1962-04-03
DE1202292B (de) * 1963-10-04 1965-10-07 Kalle Ag Aluminiumtraeger fuer Flachdruckformen
DE1447016C3 (de) * 1963-10-25 1973-11-15 Kalle Ag, 6202 Wiesbaden-Biebrich Vorsensibilisierte Druckplatte
US3615532A (en) * 1963-12-09 1971-10-26 Union Carbide Corp Printing plate compositions
US3453108A (en) * 1965-04-13 1969-07-01 Agfa Gevaert Nv Photochemical cross-linking of polymers
DE1546786C3 (de) * 1965-06-03 1973-12-13 Kalle Ag, 6202 Wiesbaden-Biebrich Verfahren und Material zur Her stellung von Flachdruckplatten
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
BE757479A (fr) * 1969-10-15 1971-04-14 Xidex Corp Element vesiculaire de formation d'une image
US3652272A (en) * 1969-10-31 1972-03-28 Lithoplate Inc Phenoxy photopolymer having no epoxy groups, and article made therefrom

Also Published As

Publication number Publication date
ZA714590B (en) 1972-04-26
DE2034655B2 (de) 1977-03-31
SU461516A3 (ru) 1975-02-25
GB1358922A (en) 1974-07-03
CS151407B2 (xx) 1973-10-19
FR2101639A5 (xx) 1972-03-31
US3790385A (en) 1974-02-05
JPS543607B1 (xx) 1979-02-24
AT308783B (de) 1973-07-25
NL7109179A (xx) 1972-01-17
SE370581B (xx) 1974-10-21
AU3106471A (en) 1973-01-11
DE2034655A1 (xx) 1972-01-20
HU163890B (xx) 1973-11-28
CA960504A (en) 1975-01-07

Similar Documents

Publication Publication Date Title
BE769906A (fr) Masse de reproduction photosensible et materiel de reproductionprepare a l'aide de cette masse
BE750694A (fr) Materiel de reproduction photosensible
ZA715281B (en) Photopolymerizable copying composition and copying material produced therewith
BE750692A (fr) Composes photosensibles et materiel de reproduction avec des dits composes
BE770285A (fr) Materiel de reproduction photopolymerisable
GB1380309A (en) Photographic silver salt materials and developer compositions
BE753067A (fr) Materiel de reproduction photosensible pour la preparation d'epreuves en couleurs
BE765966A (fr) Poudres photosensible de reproduction et materiel de reproduction resistant a la gravure prepare a l'aide de ce materiel
RO69019A (ro) Material preimpregnat si procedeu de realizare a acestuia
BE750693A (fr) Procede pour la preparation de composes photosensibles et materiel de reproduction prepare avec ceux-ci
GB1366304A (en) Photographic resist transfer materials
ZA715906B (en) Photopolymerizable compounds and copying compositions and copying materials produced therewith
FR1510796A (fr) Masse de reproduction photosensible pour la reprographie et matériel de reproduction enduit de celle-ci
IL33344A0 (en) Light-sensitive reproduction material and process for the preparation of a printing forme
BE754065A (fr) Materiel de reproduction photosensible
GB1366926A (en) Sensitive silver-dye-bleach photographic material
CH476328A (fr) Composition formatrice de germes d'image latente
FR1513907A (fr) Masse reprographique à copier et matériel pour la reprographie préparé avec cette masse
BE788225A (fr) Materiel d'impression photosensible
CA962504A (en) Stabilized photographic material
FR2316693A1 (fr) Memoire numerique d'image
FR2287710A1 (fr) Materiau photosensible formateur d'image positive
FR1514540A (fr) Masse à copier pour la reprographie et matériel reprographique préparé avec celle-ci
ZA714591B (en) Light-sensitive copying composition and copying material produced therewith
FR2100985A7 (fr) Ferme triangulaire et raccord d'arete pour cette ferme

Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: HOECHST A.G.

Effective date: 19870731