CA958936A - Photo-sensitive adhesive system - Google Patents
Photo-sensitive adhesive systemInfo
- Publication number
- CA958936A CA958936A CA066,978A CA66978A CA958936A CA 958936 A CA958936 A CA 958936A CA 66978 A CA66978 A CA 66978A CA 958936 A CA958936 A CA 958936A
- Authority
- CA
- Canada
- Prior art keywords
- photo
- sensitive adhesive
- adhesive system
- sensitive
- adhesive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J161/00—Adhesives based on condensation polymers of aldehydes or ketones; Adhesives based on derivatives of such polymers
- C09J161/04—Condensation polymers of aldehydes or ketones with phenols only
- C09J161/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/62—Metal compounds reducible to metal
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/28—Non-macromolecular organic substances
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0709—Catalytic ink or adhesive for electroless plating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Metallurgy (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Chemically Coating (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA206,694A CA968610A (en) | 1969-03-25 | 1974-08-09 | Photo-sensitive adhesive system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81037869A | 1969-03-25 | 1969-03-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA958936A true CA958936A (en) | 1974-12-10 |
Family
ID=25203717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA066,978A Expired CA958936A (en) | 1969-03-25 | 1969-11-07 | Photo-sensitive adhesive system |
Country Status (11)
Country | Link |
---|---|
US (1) | US3779758A (fr) |
JP (1) | JPS5040221B1 (fr) |
AT (1) | AT307846B (fr) |
CA (1) | CA958936A (fr) |
CH (1) | CH549098A (fr) |
DE (1) | DE2014737B2 (fr) |
DK (1) | DK141823B (fr) |
FR (1) | FR2039963A5 (fr) |
GB (1) | GB1310580A (fr) |
NL (1) | NL167032C (fr) |
SE (1) | SE372351B (fr) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3900320A (en) * | 1971-09-30 | 1975-08-19 | Bell & Howell Co | Activation method for electroless plating |
JPS5525418B2 (fr) * | 1972-12-20 | 1980-07-05 | ||
US3887373A (en) * | 1973-04-11 | 1975-06-03 | Motorola Inc | Non-polluting photoresist developing process |
DE2411869C3 (de) * | 1974-03-12 | 1982-07-08 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Photochemisches System zur Beschichtung des Leuchtschirmes von Farbfernsehröhren |
US3928670A (en) * | 1974-09-23 | 1975-12-23 | Amp Inc | Selective plating on non-metallic surfaces |
US4191573A (en) * | 1974-10-09 | 1980-03-04 | Fuji Photo Film Co., Ltd. | Photosensitive positive image forming process with two photo-sensitive layers |
US4107351A (en) * | 1976-10-15 | 1978-08-15 | Rca Corporation | Method of depositing or repairing a patterned metal layer on a substrate |
US4216246A (en) * | 1977-05-14 | 1980-08-05 | Hitachi Chemical Company, Ltd. | Method of improving adhesion between insulating substrates and metal deposits electrolessly plated thereon, and method of making additive printed circuit boards |
US4388351A (en) * | 1979-08-20 | 1983-06-14 | Western Electric Company, Inc. | Methods of forming a patterned metal film on a support |
DK427780A (da) * | 1980-10-10 | 1982-04-11 | Neselco As | Pulver til brug ved toer sensibilisering for stroemloes metallisering |
DE3130159C2 (de) * | 1981-07-30 | 1987-02-05 | Preh, Elektrofeinmechanische Werke Jakob Preh Nachf. Gmbh & Co, 8740 Bad Neustadt | Verfahren zur Herstellung von Leiterplatten |
EP0089221A1 (fr) * | 1982-03-15 | 1983-09-21 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Procédé électrographique pour la production des parcours conducteurs de circuits et panneaux de circuit produits de cette manière |
US4555414A (en) * | 1983-04-15 | 1985-11-26 | Polyonics Corporation | Process for producing composite product having patterned metal layer |
US4666735A (en) * | 1983-04-15 | 1987-05-19 | Polyonics Corporation | Process for producing product having patterned metal layer |
JPS62102241A (ja) * | 1985-10-30 | 1987-05-12 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
US4910072A (en) * | 1986-11-07 | 1990-03-20 | Monsanto Company | Selective catalytic activation of polymeric films |
US5075037A (en) * | 1986-11-07 | 1991-12-24 | Monsanto Company | Selective catalytic activation of polymeric films |
US4851159A (en) * | 1988-05-02 | 1989-07-25 | Monsanto Company | Process for the preparation of N- phosphonomethylglycine |
US5650261A (en) * | 1989-10-27 | 1997-07-22 | Rohm And Haas Company | Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system |
US5506091A (en) * | 1990-04-20 | 1996-04-09 | Nisshinbo Industries, Inc. | Photosensitive resin composition and method of forming conductive pattern |
US5631753A (en) * | 1991-06-28 | 1997-05-20 | Dai Nippon Printing Co., Ltd. | Black matrix base board and manufacturing method therefor, and liquid crystal display panel and manufacturing method therefor |
US5532105A (en) * | 1992-08-07 | 1996-07-02 | Hitachi Chemical Company, Ltd. | Photolithographically viahole-forming photosensitive element comprising two photosensitive layers for the fabrication process of multilayer wiring board |
ZA962880B (en) * | 1995-04-12 | 1997-03-17 | Procter & Gamble | A pharmaceutical composition for inhibiting the growth of viruses and cancers |
US5665713A (en) * | 1995-04-12 | 1997-09-09 | Procter & Gamble Company | Pharmaceutical composition for inhibiting the growth of viruses and cancers |
DE60112292T2 (de) * | 2000-05-23 | 2006-06-01 | Aprilis, Inc., Cambridge | Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellung |
CN103176365A (zh) * | 2011-12-22 | 2013-06-26 | 深圳富泰宏精密工业有限公司 | 菲林及其制作方法,应用该菲林进行遮蔽的方法 |
FR3064010B1 (fr) * | 2017-03-14 | 2022-11-18 | Commissariat Energie Atomique | Solution de precurseur pour former une couche d’oxyde metallique et procede de revetement d’un substrat par une couche d’oxyde metallique |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL46296C (fr) * | 1930-02-05 | |||
US2501874A (en) * | 1946-06-12 | 1950-03-28 | Gen Aniline & Film Corp | Photographic diazo-sensitized glassine paper |
NL76649C (fr) * | 1949-04-09 | |||
US3406068A (en) * | 1951-07-30 | 1968-10-15 | Rca Corp | Photographic methods of making electron-sensitive mosaic screens |
US2695846A (en) * | 1952-11-04 | 1954-11-30 | Powers Chemco Inc | Developing of diazo and azide sensitized colloids |
US2914404A (en) * | 1953-07-31 | 1959-11-24 | Blaupunkt Werke Gmbh | Method of producing two-dimensional circuits or circuit elements on supporting bases |
US2852379A (en) * | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
US3006819A (en) * | 1955-06-13 | 1961-10-31 | Sanders Associates Inc | Method of photo-plating electrical circuits |
US2996380A (en) * | 1957-10-08 | 1961-08-15 | Sylvania Electric Prod | Method of fabricating image display screens |
NL241541A (fr) * | 1959-07-22 | |||
US3222173A (en) * | 1961-05-15 | 1965-12-07 | Vitramon Inc | Method of making an electrical unit |
NL287857A (fr) * | 1962-01-27 | |||
US3259559A (en) * | 1962-08-22 | 1966-07-05 | Day Company | Method for electroless copper plating |
BE637058A (fr) * | 1962-09-07 | |||
US3316092A (en) * | 1963-05-09 | 1967-04-25 | Dietzgen Co Eugene | Diazotype material comprising a metal sulfate nitrogenous compound and polymeric anhydride |
US3326686A (en) * | 1963-05-31 | 1967-06-20 | Gen Aniline & Film Corp | Light-sensitive two-component diazotype materials adapted for heat development |
US3469984A (en) * | 1965-05-17 | 1969-09-30 | Addressograph Multigraph | Heat-sensitive diazotype materials |
DE1572155A1 (de) * | 1965-08-10 | 1970-01-02 | Dr Eduard Roell | Licht-bzw.strahlungsempfindliches Material und Verfahren zu dessen Herstellung |
US3458313A (en) * | 1966-09-07 | 1969-07-29 | Nasa | High resolution developing of photosensitive resists |
-
1969
- 1969-03-25 US US00810378A patent/US3779758A/en not_active Expired - Lifetime
- 1969-11-07 CA CA066,978A patent/CA958936A/en not_active Expired
- 1969-12-08 JP JP44098584A patent/JPS5040221B1/ja active Pending
-
1970
- 1970-03-20 GB GB1351970A patent/GB1310580A/en not_active Expired
- 1970-03-20 DE DE2014737A patent/DE2014737B2/de not_active Ceased
- 1970-03-23 CH CH435270A patent/CH549098A/xx not_active IP Right Cessation
- 1970-03-23 SE SE7003948A patent/SE372351B/xx unknown
- 1970-03-24 AT AT272370A patent/AT307846B/de not_active IP Right Cessation
- 1970-03-24 DK DK151570AA patent/DK141823B/da not_active IP Right Cessation
- 1970-03-25 FR FR7010711A patent/FR2039963A5/fr not_active Expired
- 1970-03-25 NL NL7004323.A patent/NL167032C/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DK141823B (da) | 1980-06-23 |
DE2014737A1 (de) | 1970-10-01 |
JPS5040221B1 (fr) | 1975-12-23 |
SE372351B (fr) | 1974-12-16 |
US3779758A (en) | 1973-12-18 |
DE2014737B2 (de) | 1975-03-06 |
NL167032C (nl) | 1981-10-15 |
DK141823C (fr) | 1980-11-10 |
FR2039963A5 (fr) | 1971-01-15 |
GB1310580A (en) | 1973-03-21 |
CH549098A (de) | 1974-05-15 |
NL7004323A (fr) | 1970-09-29 |
NL167032B (nl) | 1981-05-15 |
AT307846B (de) | 1973-06-12 |
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