CA2991462A1 - Procede pour etat d'observation de trajet optique en spectroscopie d'emission optique d'un echantillon et produit-programme informatique pour un dispositif de traitement - Google Patents

Procede pour etat d'observation de trajet optique en spectroscopie d'emission optique d'un echantillon et produit-programme informatique pour un dispositif de traitement Download PDF

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Publication number
CA2991462A1
CA2991462A1 CA2991462A CA2991462A CA2991462A1 CA 2991462 A1 CA2991462 A1 CA 2991462A1 CA 2991462 A CA2991462 A CA 2991462A CA 2991462 A CA2991462 A CA 2991462A CA 2991462 A1 CA2991462 A1 CA 2991462A1
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CA
Canada
Prior art keywords
sample
ratio
time
emission line
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CA2991462A
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English (en)
Inventor
Lauri Koresaar
Bjorn Salmi
Arto OLLIKAINEN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Metso Finland Oy
Original Assignee
Outotec Finland Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Outotec Finland Oy filed Critical Outotec Finland Oy
Publication of CA2991462A1 publication Critical patent/CA2991462A1/fr
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/718Laser microanalysis, i.e. with formation of sample plasma
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15Preventing contamination of the components of the optical system or obstruction of the light path
    • G01N2021/155Monitoring cleanness of window, lens, or other parts
    • G01N2021/157Monitoring by optical means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/85Investigating moving fluids or granular solids
    • G01N2021/8592Grain or other flowing solid samples
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/68Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/85Investigating moving fluids or granular solids

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

L'invention concerne un procédé pour l'état d'observation d'un trajet optique en spectroscopie d'émission optique d'un échantillon (1). Le procédé comprend une étape de calcul consistant à (i) calculer un premier rapport entre une première ligne d'émission générée dans une première étape d'analyse et une seconde ligne d'émission générée dans une première étape d'analyse et consistant à (ii) calculer un second rapport entre une première ligne d'émission ultérieure générée dans une seconde étape d'analyse et une seconde ligne d'émission générée dans une seconde étape d'analyse et consistant à (iii) calculer une différence entre le premier rapport et le second rapport afin d'obtenir une différence d'intensité calculée, la différence d'intensité calculée étant indicative de la propreté du chemin optique. L'invention concerne également un produit-programme informatique pour un dispositif de traitement.
CA2991462A 2015-07-10 2016-07-08 Procede pour etat d'observation de trajet optique en spectroscopie d'emission optique d'un echantillon et produit-programme informatique pour un dispositif de traitement Pending CA2991462A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20155546 2015-07-10
FI20155546A FI20155546A (fi) 2015-07-10 2015-07-10 Menetelmä optisen tien tilan valvomiseksi näytteen optisessa säteilyspektroskooppiassa ja tietokoneohjelma prosessointilaitetta varten
PCT/FI2016/050504 WO2017009528A1 (fr) 2015-07-10 2016-07-08 Procédé pour état d'observation de trajet optique en spectroscopie d'émission optique d'un échantillon et produit-programme informatique pour un dispositif de traitement

Publications (1)

Publication Number Publication Date
CA2991462A1 true CA2991462A1 (fr) 2017-01-19

Family

ID=56413702

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2991462A Pending CA2991462A1 (fr) 2015-07-10 2016-07-08 Procede pour etat d'observation de trajet optique en spectroscopie d'emission optique d'un echantillon et produit-programme informatique pour un dispositif de traitement

Country Status (6)

Country Link
AU (1) AU2016293213B2 (fr)
BR (1) BR112018000233A2 (fr)
CA (1) CA2991462A1 (fr)
FI (1) FI20155546A (fr)
WO (1) WO2017009528A1 (fr)
ZA (1) ZA201800363B (fr)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6603538B1 (en) * 2000-11-21 2003-08-05 Applied Materials, Inc. Method and apparatus employing optical emission spectroscopy to detect a fault in process conditions of a semiconductor processing system
FR2882593B1 (fr) * 2005-02-28 2007-05-04 Commissariat Energie Atomique Procede et systeme d'analyse physicochimique a l'aide d'une ablation par pulse laser
DE102006028250A1 (de) * 2006-06-20 2007-12-27 Carl Zeiss Microimaging Gmbh Verfahren zur Überwachung von Laserbearbeitungsprozessen
US7948617B2 (en) * 2007-07-09 2011-05-24 Fluke Corporation Optical multiwavelength window contamination monitor for optical control sensors and systems
JP2013036779A (ja) * 2011-08-04 2013-02-21 Toshiba Corp レーザー誘起ブレークダウン分光分析装置
NO3077789T3 (fr) * 2013-12-02 2018-02-17

Also Published As

Publication number Publication date
AU2016293213A1 (en) 2018-02-08
ZA201800363B (en) 2019-08-28
FI20155546A (fi) 2017-01-11
BR112018000233A2 (pt) 2018-09-04
WO2017009528A1 (fr) 2017-01-19
AU2016293213B2 (en) 2018-11-29

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