ZA201800363B - Method for observation state of optical path in optical emission spectroscopy of a sample and computer program product for a processing device - Google Patents

Method for observation state of optical path in optical emission spectroscopy of a sample and computer program product for a processing device

Info

Publication number
ZA201800363B
ZA201800363B ZA2018/00363A ZA201800363A ZA201800363B ZA 201800363 B ZA201800363 B ZA 201800363B ZA 2018/00363 A ZA2018/00363 A ZA 2018/00363A ZA 201800363 A ZA201800363 A ZA 201800363A ZA 201800363 B ZA201800363 B ZA 201800363B
Authority
ZA
South Africa
Prior art keywords
sample
computer program
processing device
program product
emission spectroscopy
Prior art date
Application number
ZA2018/00363A
Inventor
Lauri Köresaar
Björn Salmi
Arto Ollikainen
Original Assignee
Outotec Finland Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Outotec Finland Oy filed Critical Outotec Finland Oy
Publication of ZA201800363B publication Critical patent/ZA201800363B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/718—Laser microanalysis, i.e. with formation of sample plasma
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
    • G01N2021/155—Monitoring cleanness of window, lens, or other parts
    • G01N2021/157—Monitoring by optical means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/85—Investigating moving fluids or granular solids
    • G01N2021/8592—Grain or other flowing solid samples
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
    • G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/85—Investigating moving fluids or granular solids
ZA2018/00363A 2015-07-10 2018-01-18 Method for observation state of optical path in optical emission spectroscopy of a sample and computer program product for a processing device ZA201800363B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20155546A FI20155546A (en) 2015-07-10 2015-07-10 METHOD FOR MONITORING THE OPTICAL ROAD STATUS IN THE OPTICAL RADIATION SPECTROSCOPY OF THE SAMPLE AND A COMPUTER PROGRAM FOR THE PROCESSING DEVICE
PCT/FI2016/050504 WO2017009528A1 (en) 2015-07-10 2016-07-08 Method for observation state of optical path in optical emission spectroscopy of a sample and computer program product for a processing device

Publications (1)

Publication Number Publication Date
ZA201800363B true ZA201800363B (en) 2019-08-28

Family

ID=56413702

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA2018/00363A ZA201800363B (en) 2015-07-10 2018-01-18 Method for observation state of optical path in optical emission spectroscopy of a sample and computer program product for a processing device

Country Status (6)

Country Link
AU (1) AU2016293213B2 (en)
BR (1) BR112018000233A2 (en)
CA (1) CA2991462A1 (en)
FI (1) FI20155546A (en)
WO (1) WO2017009528A1 (en)
ZA (1) ZA201800363B (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6603538B1 (en) * 2000-11-21 2003-08-05 Applied Materials, Inc. Method and apparatus employing optical emission spectroscopy to detect a fault in process conditions of a semiconductor processing system
FR2882593B1 (en) * 2005-02-28 2007-05-04 Commissariat Energie Atomique METHOD AND SYSTEM FOR PHYSICOCHEMICAL ANALYSIS USING PULSE LASER ABLATION
DE102006028250A1 (en) * 2006-06-20 2007-12-27 Carl Zeiss Microimaging Gmbh Monitoring laser welding processes with or without spontaneous plasma zone formation, images optical radiation from processing region, analyzes spectrally and evaluates
US7948617B2 (en) * 2007-07-09 2011-05-24 Fluke Corporation Optical multiwavelength window contamination monitor for optical control sensors and systems
JP2013036779A (en) * 2011-08-04 2013-02-21 Toshiba Corp Laser-induced breakdown spectral analyzer
CA2931919C (en) * 2013-12-02 2021-05-04 Outotec (Finland) Oy Method and apparatus for online analysis by laser-induced spectroscopy

Also Published As

Publication number Publication date
CA2991462A1 (en) 2017-01-19
AU2016293213A1 (en) 2018-02-08
AU2016293213B2 (en) 2018-11-29
BR112018000233A2 (en) 2018-09-04
FI20155546A (en) 2017-01-11
WO2017009528A1 (en) 2017-01-19

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