CA2502239A1 - Lithographic method for forming mold inserts and molds - Google Patents
Lithographic method for forming mold inserts and molds Download PDFInfo
- Publication number
- CA2502239A1 CA2502239A1 CA002502239A CA2502239A CA2502239A1 CA 2502239 A1 CA2502239 A1 CA 2502239A1 CA 002502239 A CA002502239 A CA 002502239A CA 2502239 A CA2502239 A CA 2502239A CA 2502239 A1 CA2502239 A1 CA 2502239A1
- Authority
- CA
- Canada
- Prior art keywords
- radiation
- substrate
- deposit
- curable material
- curved surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 60
- 239000000463 material Substances 0.000 claims description 103
- 239000000758 substrate Substances 0.000 claims description 34
- 238000000576 coating method Methods 0.000 claims description 27
- 239000011248 coating agent Substances 0.000 claims description 26
- 230000005855 radiation Effects 0.000 claims description 23
- 238000000465 moulding Methods 0.000 claims description 19
- 239000004593 Epoxy Substances 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 10
- -1 poly(norbornene) Polymers 0.000 claims description 10
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 claims description 4
- 229920002635 polyurethane Polymers 0.000 claims description 4
- 239000004814 polyurethane Substances 0.000 claims description 4
- 230000003044 adaptive effect Effects 0.000 claims description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims 3
- 229920000636 poly(norbornene) polymer Polymers 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 abstract description 18
- 238000001723 curing Methods 0.000 description 16
- 229920002120 photoresistant polymer Polymers 0.000 description 12
- 238000005286 illumination Methods 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 230000035515 penetration Effects 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000000017 hydrogel Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000011088 calibration curve Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 238000009987 spinning Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 241001270131 Agaricus moelleri Species 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical class CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 1
- 229920002574 CR-39 Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 208000029091 Refraction disease Diseases 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000004430 ametropia Effects 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
- 229920000402 bisphenol A polycarbonate polymer Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 208000014733 refractive error Diseases 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 238000009416 shuttering Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- NLAIHECABDOZBR-UHFFFAOYSA-M sodium 2,2-bis(2-methylprop-2-enoyloxymethyl)butyl 2-methylprop-2-enoate 2-hydroxyethyl 2-methylprop-2-enoate 2-methylprop-2-enoate Chemical compound [Na+].CC(=C)C([O-])=O.CC(=C)C(=O)OCCO.CCC(COC(=O)C(C)=C)(COC(=O)C(C)=C)COC(=O)C(C)=C NLAIHECABDOZBR-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001256 tonic effect Effects 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- PLCFYBDYBCOLSP-UHFFFAOYSA-N tris(prop-2-enyl) 2-hydroxypropane-1,2,3-tricarboxylate Chemical compound C=CCOC(=O)CC(O)(CC(=O)OCC=C)C(=O)OCC=C PLCFYBDYBCOLSP-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00432—Auxiliary operations, e.g. machines for filling the moulds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Ophthalmology & Optometry (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
- Eyeglasses (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42174802P | 2002-10-28 | 2002-10-28 | |
| US60/421,748 | 2002-10-28 | ||
| PCT/US2003/031450 WO2004039554A2 (en) | 2002-10-28 | 2003-10-03 | Lithographic method for forming mold inserts and molds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2502239A1 true CA2502239A1 (en) | 2004-05-13 |
Family
ID=32230262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002502239A Abandoned CA2502239A1 (en) | 2002-10-28 | 2003-10-03 | Lithographic method for forming mold inserts and molds |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP1556739A2 (ja) |
| JP (1) | JP4652055B2 (ja) |
| KR (1) | KR20050074973A (ja) |
| CN (1) | CN1708727A (ja) |
| AR (1) | AR041847A1 (ja) |
| AU (1) | AU2003282671B8 (ja) |
| BR (1) | BR0315685A (ja) |
| CA (1) | CA2502239A1 (ja) |
| TW (1) | TWI315698B (ja) |
| WO (1) | WO2004039554A2 (ja) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1822935A (zh) * | 2003-07-11 | 2006-08-23 | 皇家飞利浦电子股份有限公司 | 一种制造用于产生光学表面的模型的方法、一种生产隐形眼镜的方法和一种供这些方法使用的设备 |
| SE0402769D0 (sv) | 2004-11-12 | 2004-11-12 | Amo Groningen Bv | Method of selecting intraocular lenses |
| KR101137845B1 (ko) | 2005-06-24 | 2012-04-20 | 엘지디스플레이 주식회사 | 소프트 몰드의 제조방법 |
| US20070257387A1 (en) * | 2006-05-05 | 2007-11-08 | Hofmann Gregory J | Package mold combination |
| CN1916768A (zh) | 2006-09-08 | 2007-02-21 | 中国科学院光电技术研究所 | 个性化隐形眼镜定制设备 |
| US8313828B2 (en) | 2008-08-20 | 2012-11-20 | Johnson & Johnson Vision Care, Inc. | Ophthalmic lens precursor and lens |
| US8317505B2 (en) | 2007-08-21 | 2012-11-27 | Johnson & Johnson Vision Care, Inc. | Apparatus for formation of an ophthalmic lens precursor and lens |
| US7905594B2 (en) | 2007-08-21 | 2011-03-15 | Johnson & Johnson Vision Care, Inc. | Free form ophthalmic lens |
| US8318055B2 (en) * | 2007-08-21 | 2012-11-27 | Johnson & Johnson Vision Care, Inc. | Methods for formation of an ophthalmic lens precursor and lens |
| AU2009323770B2 (en) | 2008-04-04 | 2015-05-07 | Amo Regional Holdings | Systems and methods for determining intraocular lens power |
| US9417464B2 (en) | 2008-08-20 | 2016-08-16 | Johnson & Johnson Vision Care, Inc. | Method and apparatus of forming a translating multifocal contact lens having a lower-lid contact surface |
| JP6076599B2 (ja) | 2008-12-01 | 2017-02-08 | パーフェクト・ビジョン・テクノロジー・（ホンコン）・リミテッドＰｅｒｆｅｃｔ Ｖｉｓｉｏｎ Ｔｅｃｈｎｏｌｏｇｙ （Ｈｋ） Ｌｔｄ． | 眼を屈折矯正するための方法及び装置 |
| US8240849B2 (en) | 2009-03-31 | 2012-08-14 | Johnson & Johnson Vision Care, Inc. | Free form lens with refractive index variations |
| US8807076B2 (en) | 2010-03-12 | 2014-08-19 | Johnson & Johnson Vision Care, Inc. | Apparatus for vapor phase processing ophthalmic devices |
| EP2765901A1 (en) | 2011-10-14 | 2014-08-20 | Amo Groningen B.V. | Apparatus, system and method to account for spherical aberration at the iris plane in the design of an intraocular lens |
| JP6162234B2 (ja) * | 2012-06-29 | 2017-07-12 | ジョンソン・アンド・ジョンソン・ビジョン・ケア・インコーポレイテッドＪｏｈｎｓｏｎ ＆ Ｊｏｈｎｓｏｎ Ｖｉｓｉｏｎ Ｃａｒｅ， Ｉｎｃ． | 眼用レンズ製造用の特徴部位を有するレンズ前駆体 |
| CN106414015A (zh) * | 2014-03-31 | 2017-02-15 | Crt技术股份有限公司 | 模具的增材制造以及由此制作模具和装置的方法 |
| US9645412B2 (en) | 2014-11-05 | 2017-05-09 | Johnson & Johnson Vision Care Inc. | Customized lens device and method |
| US10359643B2 (en) | 2015-12-18 | 2019-07-23 | Johnson & Johnson Vision Care, Inc. | Methods for incorporating lens features and lenses having such features |
| US10197806B2 (en) * | 2016-06-07 | 2019-02-05 | Google Llc | Fabrication of air gap regions in multicomponent lens systems |
| AU2018330603B2 (en) | 2017-09-11 | 2024-07-18 | Amo Groningen B.V. | Intraocular lenses with customized add power |
| US11364696B2 (en) | 2020-09-18 | 2022-06-21 | Johnson & Johnson Vision Care, Inc | Apparatus for forming an ophthalmic lens |
| JP7546437B2 (ja) | 2020-10-08 | 2024-09-06 | Ｔｉａｎｍａ Ｊａｐａｎ株式会社 | 光造形装置及び光変調装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3658528A (en) * | 1969-09-22 | 1972-04-25 | Itek Corp | Photochemical figuring of optical elements |
| JPH0524121A (ja) * | 1991-07-23 | 1993-02-02 | Hitachi Ltd | 光学部品、光学部品マザー、それらの製造方法、及び関連製品 |
| JP2001150451A (ja) * | 1999-11-22 | 2001-06-05 | Canon Inc | 成形型およびその製造方法 |
| JP2001235611A (ja) * | 2000-02-25 | 2001-08-31 | Shimadzu Corp | ホログラフィック・グレーティング |
| US20020110766A1 (en) * | 2001-02-09 | 2002-08-15 | Industrial Technology Research Institute | Process method of using excimer laser for forming micro spherical and non-spherical polymeric structure array |
-
2003
- 2003-10-03 KR KR1020057007376A patent/KR20050074973A/ko not_active Application Discontinuation
- 2003-10-03 WO PCT/US2003/031450 patent/WO2004039554A2/en active Application Filing
- 2003-10-03 CN CNA2003801022968A patent/CN1708727A/zh active Pending
- 2003-10-03 EP EP03774557A patent/EP1556739A2/en not_active Withdrawn
- 2003-10-03 BR BR0315685-0A patent/BR0315685A/pt not_active IP Right Cessation
- 2003-10-03 AU AU2003282671A patent/AU2003282671B8/en not_active Ceased
- 2003-10-03 JP JP2004548351A patent/JP4652055B2/ja not_active Expired - Fee Related
- 2003-10-03 CA CA002502239A patent/CA2502239A1/en not_active Abandoned
- 2003-10-28 AR ARP030103936A patent/AR041847A1/es active IP Right Grant
- 2003-10-28 TW TW092129885A patent/TWI315698B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| AR041847A1 (es) | 2005-06-01 |
| AU2003282671B8 (en) | 2010-05-27 |
| AU2003282671B2 (en) | 2010-01-28 |
| AU2003282671A1 (en) | 2004-05-25 |
| WO2004039554A2 (en) | 2004-05-13 |
| BR0315685A (pt) | 2005-09-06 |
| JP4652055B2 (ja) | 2011-03-16 |
| WO2004039554A3 (en) | 2004-12-09 |
| CN1708727A (zh) | 2005-12-14 |
| EP1556739A2 (en) | 2005-07-27 |
| KR20050074973A (ko) | 2005-07-19 |
| TW200420403A (en) | 2004-10-16 |
| JP2006503738A (ja) | 2006-02-02 |
| TWI315698B (en) | 2009-10-11 |
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