TWI315698B - Lithographic method for forming mold inserts and molds - Google Patents

Lithographic method for forming mold inserts and molds

Info

Publication number
TWI315698B
TWI315698B TW092129885A TW92129885A TWI315698B TW I315698 B TWI315698 B TW I315698B TW 092129885 A TW092129885 A TW 092129885A TW 92129885 A TW92129885 A TW 92129885A TW I315698 B TWI315698 B TW I315698B
Authority
TW
Taiwan
Prior art keywords
molds
forming mold
lithographic method
mold inserts
inserts
Prior art date
Application number
TW092129885A
Other languages
English (en)
Other versions
TW200420403A (en
Inventor
John Harchanko
Rodney Clark
Takahisa Minamitani
Gregory J Hofmann
Thomas R Rooney
Original Assignee
Johnson & Johnson Vision Care
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Johnson & Johnson Vision Care filed Critical Johnson & Johnson Vision Care
Publication of TW200420403A publication Critical patent/TW200420403A/zh
Application granted granted Critical
Publication of TWI315698B publication Critical patent/TWI315698B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00432—Auxiliary operations, e.g. machines for filling the moulds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Ophthalmology & Optometry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Eyeglasses (AREA)
TW092129885A 2002-10-28 2003-10-28 Lithographic method for forming mold inserts and molds TWI315698B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US42174802P 2002-10-28 2002-10-28

Publications (2)

Publication Number Publication Date
TW200420403A TW200420403A (en) 2004-10-16
TWI315698B true TWI315698B (en) 2009-10-11

Family

ID=32230262

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092129885A TWI315698B (en) 2002-10-28 2003-10-28 Lithographic method for forming mold inserts and molds

Country Status (10)

Country Link
EP (1) EP1556739A2 (zh)
JP (1) JP4652055B2 (zh)
KR (1) KR20050074973A (zh)
CN (1) CN1708727A (zh)
AR (1) AR041847A1 (zh)
AU (1) AU2003282671B8 (zh)
BR (1) BR0315685A (zh)
CA (1) CA2502239A1 (zh)
TW (1) TWI315698B (zh)
WO (1) WO2004039554A2 (zh)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
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CN1822935A (zh) * 2003-07-11 2006-08-23 皇家飞利浦电子股份有限公司 一种制造用于产生光学表面的模型的方法、一种生产隐形眼镜的方法和一种供这些方法使用的设备
SE0402769D0 (sv) 2004-11-12 2004-11-12 Amo Groningen Bv Method of selecting intraocular lenses
KR101137845B1 (ko) 2005-06-24 2012-04-20 엘지디스플레이 주식회사 소프트 몰드의 제조방법
US20070257387A1 (en) * 2006-05-05 2007-11-08 Hofmann Gregory J Package mold combination
CN1916768A (zh) 2006-09-08 2007-02-21 中国科学院光电技术研究所 个性化隐形眼镜定制设备
US8313828B2 (en) 2008-08-20 2012-11-20 Johnson & Johnson Vision Care, Inc. Ophthalmic lens precursor and lens
US8317505B2 (en) 2007-08-21 2012-11-27 Johnson & Johnson Vision Care, Inc. Apparatus for formation of an ophthalmic lens precursor and lens
US7905594B2 (en) 2007-08-21 2011-03-15 Johnson & Johnson Vision Care, Inc. Free form ophthalmic lens
US8318055B2 (en) * 2007-08-21 2012-11-27 Johnson & Johnson Vision Care, Inc. Methods for formation of an ophthalmic lens precursor and lens
AU2009323770B2 (en) 2008-04-04 2015-05-07 Amo Regional Holdings Systems and methods for determining intraocular lens power
US9417464B2 (en) 2008-08-20 2016-08-16 Johnson & Johnson Vision Care, Inc. Method and apparatus of forming a translating multifocal contact lens having a lower-lid contact surface
JP6076599B2 (ja) 2008-12-01 2017-02-08 パーフェクト・ビジョン・テクノロジー・（ホンコン）・リミテッドＰｅｒｆｅｃｔ Ｖｉｓｉｏｎ Ｔｅｃｈｎｏｌｏｇｙ （Ｈｋ） Ｌｔｄ． 眼を屈折矯正するための方法及び装置
US8240849B2 (en) 2009-03-31 2012-08-14 Johnson & Johnson Vision Care, Inc. Free form lens with refractive index variations
US8807076B2 (en) 2010-03-12 2014-08-19 Johnson & Johnson Vision Care, Inc. Apparatus for vapor phase processing ophthalmic devices
EP2765901A1 (en) 2011-10-14 2014-08-20 Amo Groningen B.V. Apparatus, system and method to account for spherical aberration at the iris plane in the design of an intraocular lens
JP6162234B2 (ja) * 2012-06-29 2017-07-12 ジョンソン・アンド・ジョンソン・ビジョン・ケア・インコーポレイテッドＪｏｈｎｓｏｎ ＆ Ｊｏｈｎｓｏｎ Ｖｉｓｉｏｎ Ｃａｒｅ， Ｉｎｃ． 眼用レンズ製造用の特徴部位を有するレンズ前駆体
CN106414015A (zh) * 2014-03-31 2017-02-15 Crt技术股份有限公司 模具的增材制造以及由此制作模具和装置的方法
US9645412B2 (en) 2014-11-05 2017-05-09 Johnson & Johnson Vision Care Inc. Customized lens device and method
US10359643B2 (en) 2015-12-18 2019-07-23 Johnson & Johnson Vision Care, Inc. Methods for incorporating lens features and lenses having such features
US10197806B2 (en) * 2016-06-07 2019-02-05 Google Llc Fabrication of air gap regions in multicomponent lens systems
AU2018330603B2 (en) 2017-09-11 2024-07-18 Amo Groningen B.V. Intraocular lenses with customized add power
US11364696B2 (en) 2020-09-18 2022-06-21 Johnson & Johnson Vision Care, Inc Apparatus for forming an ophthalmic lens
JP7546437B2 (ja) 2020-10-08 2024-09-06 Ｔｉａｎｍａ Ｊａｐａｎ株式会社 光造形装置及び光変調装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3658528A (en) * 1969-09-22 1972-04-25 Itek Corp Photochemical figuring of optical elements
JPH0524121A (ja) * 1991-07-23 1993-02-02 Hitachi Ltd 光学部品、光学部品マザー、それらの製造方法、及び関連製品
JP2001150451A (ja) * 1999-11-22 2001-06-05 Canon Inc 成形型およびその製造方法
JP2001235611A (ja) * 2000-02-25 2001-08-31 Shimadzu Corp ホログラフィック・グレーティング
US20020110766A1 (en) * 2001-02-09 2002-08-15 Industrial Technology Research Institute Process method of using excimer laser for forming micro spherical and non-spherical polymeric structure array

Also Published As

Publication number Publication date
AR041847A1 (es) 2005-06-01
AU2003282671B8 (en) 2010-05-27
AU2003282671B2 (en) 2010-01-28
AU2003282671A1 (en) 2004-05-25
WO2004039554A2 (en) 2004-05-13
BR0315685A (pt) 2005-09-06
JP4652055B2 (ja) 2011-03-16
WO2004039554A3 (en) 2004-12-09
CN1708727A (zh) 2005-12-14
EP1556739A2 (en) 2005-07-27
KR20050074973A (ko) 2005-07-19
TW200420403A (en) 2004-10-16
JP2006503738A (ja) 2006-02-02
CA2502239A1 (en) 2004-05-13

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees