CA2149932A1 - Method of providing sacrificial spacer for micro-mechanical devices - Google Patents

Method of providing sacrificial spacer for micro-mechanical devices

Info

Publication number
CA2149932A1
CA2149932A1 CA002149932A CA2149932A CA2149932A1 CA 2149932 A1 CA2149932 A1 CA 2149932A1 CA 002149932 A CA002149932 A CA 002149932A CA 2149932 A CA2149932 A CA 2149932A CA 2149932 A1 CA2149932 A1 CA 2149932A1
Authority
CA
Canada
Prior art keywords
photoresist layer
photoresist
support
support element
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002149932A
Other languages
English (en)
French (fr)
Inventor
James C. Baker
Scott H. Prengle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2149932A1 publication Critical patent/CA2149932A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Drying Of Semiconductors (AREA)
CA002149932A 1994-06-21 1995-05-23 Method of providing sacrificial spacer for micro-mechanical devices Abandoned CA2149932A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/263,208 US5454906A (en) 1994-06-21 1994-06-21 Method of providing sacrificial spacer for micro-mechanical devices
US263,208 1994-06-21

Publications (1)

Publication Number Publication Date
CA2149932A1 true CA2149932A1 (en) 1995-12-22

Family

ID=23000835

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002149932A Abandoned CA2149932A1 (en) 1994-06-21 1995-05-23 Method of providing sacrificial spacer for micro-mechanical devices

Country Status (8)

Country Link
US (1) US5454906A (en, 2012)
EP (1) EP0689077B1 (en, 2012)
JP (1) JPH0862517A (en, 2012)
KR (1) KR100346876B1 (en, 2012)
CN (1) CN1099614C (en, 2012)
CA (1) CA2149932A1 (en, 2012)
DE (1) DE69524816T2 (en, 2012)
TW (1) TW284862B (en, 2012)

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EP0689077A3 (en) 1997-05-21
EP0689077A2 (en) 1995-12-27
DE69524816D1 (de) 2002-02-07
CN1099614C (zh) 2003-01-22
KR100346876B1 (ko) 2002-11-18
TW284862B (en, 2012) 1996-09-01
US5454906A (en) 1995-10-03
KR960002496A (ko) 1996-01-26
EP0689077B1 (en) 2002-01-02
JPH0862517A (ja) 1996-03-08
CN1117148A (zh) 1996-02-21

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