CA2099132C - Device and process for the vaporisation of material - Google Patents
Device and process for the vaporisation of material Download PDFInfo
- Publication number
- CA2099132C CA2099132C CA002099132A CA2099132A CA2099132C CA 2099132 C CA2099132 C CA 2099132C CA 002099132 A CA002099132 A CA 002099132A CA 2099132 A CA2099132 A CA 2099132A CA 2099132 C CA2099132 C CA 2099132C
- Authority
- CA
- Canada
- Prior art keywords
- crucible
- cathode
- anode
- heat
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000463 material Substances 0.000 title claims abstract description 44
- 238000009834 vaporization Methods 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 23
- 230000008569 process Effects 0.000 title claims abstract description 22
- 230000008016 vaporization Effects 0.000 claims abstract description 41
- 238000000576 coating method Methods 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 238000010891 electric arc Methods 0.000 claims abstract description 7
- 239000004020 conductor Substances 0.000 claims abstract description 5
- 239000007787 solid Substances 0.000 claims abstract description 5
- 230000003247 decreasing effect Effects 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims abstract description 4
- 230000009471 action Effects 0.000 claims abstract description 3
- 230000005540 biological transmission Effects 0.000 claims description 6
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims description 5
- 229910033181 TiB2 Inorganic materials 0.000 claims description 5
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 description 5
- 239000010406 cathode material Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012769 bulk production Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000010412 perfusion Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4100541A DE4100541C1 (enrdf_load_stackoverflow) | 1991-01-10 | 1991-01-10 | |
| DEP4100541.4 | 1991-01-10 | ||
| PCT/EP1991/002525 WO1992012275A1 (de) | 1991-01-10 | 1991-12-31 | Vorrichtung und verfahren zur materialverdampfung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2099132A1 CA2099132A1 (en) | 1992-07-11 |
| CA2099132C true CA2099132C (en) | 2001-04-10 |
Family
ID=6422784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002099132A Expired - Fee Related CA2099132C (en) | 1991-01-10 | 1991-12-31 | Device and process for the vaporisation of material |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0566606B1 (enrdf_load_stackoverflow) |
| JP (1) | JP2546591B2 (enrdf_load_stackoverflow) |
| AU (1) | AU9110191A (enrdf_load_stackoverflow) |
| CA (1) | CA2099132C (enrdf_load_stackoverflow) |
| DE (2) | DE4100541C1 (enrdf_load_stackoverflow) |
| WO (1) | WO1992012275A1 (enrdf_load_stackoverflow) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4307740C2 (de) * | 1993-03-11 | 1994-12-22 | Ttk Kunststoff Tech Gmbh | Verfahren zur Herstellung von Gehäusen mit wenigstens einer metallischen Abschirmschicht |
| US6223683B1 (en) | 1997-03-14 | 2001-05-01 | The Coca-Cola Company | Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating |
| US6251233B1 (en) | 1998-08-03 | 2001-06-26 | The Coca-Cola Company | Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation |
| US6740378B1 (en) | 2000-08-24 | 2004-05-25 | The Coca-Cola Company | Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same |
| US6720052B1 (en) | 2000-08-24 | 2004-04-13 | The Coca-Cola Company | Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same |
| US6599584B2 (en) | 2001-04-27 | 2003-07-29 | The Coca-Cola Company | Barrier coated plastic containers and coating methods therefor |
| JP2005522572A (ja) | 2002-04-15 | 2005-07-28 | ザ・コカ−コーラ・カンパニー | エポキシド添加剤を含有する被膜用組成物及びそれを被覆した構造体 |
| DE102005020946B4 (de) * | 2005-05-04 | 2007-08-02 | Esk Ceramics Gmbh & Co. Kg | Verfahren und Verdampferschiffchen zum Beschichten von Substraten mit Kupfer oder Silber |
| DE102005020945B4 (de) * | 2005-05-04 | 2007-07-12 | Esk Ceramics Gmbh & Co. Kg | Keramische Verdampferschiffchen, Verfahren zu ihrer Herstellung und ihre Verwendung |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH452313A (de) * | 1965-12-18 | 1968-05-31 | Balzers Patent Beteilig Ag | Vorrichtung zur Verdampfung von Stoffen im Vakuum |
| US3562141A (en) * | 1968-02-23 | 1971-02-09 | John R Morley | Vacuum vapor deposition utilizing low voltage electron beam |
| US4197157A (en) * | 1975-03-19 | 1980-04-08 | Arthur D. Little, Inc. | Method for forming refractory tubing |
| DE3413891C2 (de) * | 1984-04-12 | 1987-01-08 | Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich | Verfahren und Vorrichtung zur Materialverdampfung in einem Vakuumbehälter |
-
1991
- 1991-01-10 DE DE4100541A patent/DE4100541C1/de not_active Expired - Fee Related
- 1991-12-31 JP JP4501665A patent/JP2546591B2/ja not_active Expired - Fee Related
- 1991-12-31 EP EP92901885A patent/EP0566606B1/de not_active Expired - Lifetime
- 1991-12-31 DE DE59105635T patent/DE59105635D1/de not_active Expired - Fee Related
- 1991-12-31 AU AU91101/91A patent/AU9110191A/en not_active Abandoned
- 1991-12-31 CA CA002099132A patent/CA2099132C/en not_active Expired - Fee Related
- 1991-12-31 WO PCT/EP1991/002525 patent/WO1992012275A1/de active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| WO1992012275A1 (de) | 1992-07-23 |
| JP2546591B2 (ja) | 1996-10-23 |
| CA2099132A1 (en) | 1992-07-11 |
| DE59105635D1 (de) | 1995-07-06 |
| DE4100541C1 (enrdf_load_stackoverflow) | 1992-01-16 |
| EP0566606A1 (de) | 1993-10-27 |
| AU9110191A (en) | 1992-08-17 |
| JPH06501060A (ja) | 1994-01-27 |
| EP0566606B1 (de) | 1995-05-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKLA | Lapsed |