CA2099132C - Device and process for the vaporisation of material - Google Patents
Device and process for the vaporisation of material Download PDFInfo
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- CA2099132C CA2099132C CA002099132A CA2099132A CA2099132C CA 2099132 C CA2099132 C CA 2099132C CA 002099132 A CA002099132 A CA 002099132A CA 2099132 A CA2099132 A CA 2099132A CA 2099132 C CA2099132 C CA 2099132C
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- 239000000463 material Substances 0.000 title claims abstract description 44
- 238000009834 vaporization Methods 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 23
- 230000008569 process Effects 0.000 title claims abstract description 22
- 230000008016 vaporization Effects 0.000 claims abstract description 41
- 238000000576 coating method Methods 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 238000010891 electric arc Methods 0.000 claims abstract description 7
- 239000004020 conductor Substances 0.000 claims abstract description 5
- 239000007787 solid Substances 0.000 claims abstract description 5
- 230000003247 decreasing effect Effects 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims abstract description 4
- 230000009471 action Effects 0.000 claims abstract description 3
- 230000005540 biological transmission Effects 0.000 claims description 6
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims description 5
- 229910033181 TiB2 Inorganic materials 0.000 claims description 5
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 description 5
- 239000010406 cathode material Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012769 bulk production Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000010412 perfusion Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a device for vaporizing material by means of a vacuum arc discharge using a cold cathode and a hot self-consuming anode, wherein the crucible (7) consists of an electrically conductive and heat-conductive material, and the connecting member (7a), due to its material properties or geometrical properties, permits electrically conductive and heat-insulating attachment of crucible (7) to the anode base plate (6), and the crucible (7) is arranged laterally above the working surface of the cathode (2a) that close to said working surface that the solid angle formed by the metal vapor plasma (9) flowing off from the anode crucible (7) is just not decreased by the diaphragm (13) in such fashion that homogenous vapor coating of substrates above the crucible (7) is no longer possible. Cathode (2) and anode are arranged opposite to each other.
Furthermore, the invention relates to a process for vaporizing material, wherein the plasma jets (5a,5b) emerging from the cathode surfaces are unimpeded in their action on the outer wall (7a) of the crucible and on the material vapor (9) above the crucible so that a high degree of vaporization is obtained, and the crucible (7) consists of an electrically conductive and heat conductive material.
Furthermore, the invention relates to a process for vaporizing material, wherein the plasma jets (5a,5b) emerging from the cathode surfaces are unimpeded in their action on the outer wall (7a) of the crucible and on the material vapor (9) above the crucible so that a high degree of vaporization is obtained, and the crucible (7) consists of an electrically conductive and heat conductive material.
Description
~Q~~~.~.~
KH
Device and Process for the Vaporization of Material This invention relates to a device for vaporizing material using a vacuum arc discharge in a vacuum chamber with a self-consuming cathode (2) having a coolable cathode supply (1) to which the cathode is attached and a self-con-suming hot anode, wherein, via connecting member (7a), a crucible (7) is attached to the anode base plate (6), and a diaphragm (13) shielding the cathode (2) is arranged above same, the crucible (7) consists of an electrically conductive and heat-conductive material, and the connecting member (7a), due to its material properties or geometrical properties, permits electrically conductive and heat-insulating attach-ment of crucible (7) to the anode base plate (6). Further-more, the invention relates to a process fox vaporizing mate-rial.
In recent years, plasma- and ion-supported coating processes have increasingly come to the fare in producing thin coatings on articles by vapor-depositing materials in vacuum. This is due to the improved quality of the coatings produced which, in particular, are outstanding because of their better adhesion of layers arid a more compact layer structure as compared to the classical processes.
Hitherto industrially employed familiar plasma- sup-ported coating processes include cathode sputtering, ion plating and vaporization by arcs. The arcs are operated with glow cathodes (U. S. 4,197,157) or hollow cathodes (U. S.
3,562,141). For maintaining the arc discharge, both types of cathodes require a process gas.
KH
Device and Process for the Vaporization of Material This invention relates to a device for vaporizing material using a vacuum arc discharge in a vacuum chamber with a self-consuming cathode (2) having a coolable cathode supply (1) to which the cathode is attached and a self-con-suming hot anode, wherein, via connecting member (7a), a crucible (7) is attached to the anode base plate (6), and a diaphragm (13) shielding the cathode (2) is arranged above same, the crucible (7) consists of an electrically conductive and heat-conductive material, and the connecting member (7a), due to its material properties or geometrical properties, permits electrically conductive and heat-insulating attach-ment of crucible (7) to the anode base plate (6). Further-more, the invention relates to a process fox vaporizing mate-rial.
In recent years, plasma- and ion-supported coating processes have increasingly come to the fare in producing thin coatings on articles by vapor-depositing materials in vacuum. This is due to the improved quality of the coatings produced which, in particular, are outstanding because of their better adhesion of layers arid a more compact layer structure as compared to the classical processes.
Hitherto industrially employed familiar plasma- sup-ported coating processes include cathode sputtering, ion plating and vaporization by arcs. The arcs are operated with glow cathodes (U. S. 4,197,157) or hollow cathodes (U. S.
3,562,141). For maintaining the arc discharge, both types of cathodes require a process gas.
2~~~~~2 Another group of arcs are the so-called vacuum arcs operating without process gas. Here, vaporized electrode material takes over the function of the process gas. Material vapor generated by the self-consuming electrodes, in addition to maintaining the arc discharge, serves to produce coatings on articles. Thus, from D.M. Sanders, "Review of Ton-Based Coating Processes Derived from the Cathodic Arc", J.Vac.Sci.
Technol. A7, No. 3, 2339 (1989), there is known a vacuum arc with a self-consuming cold cathode and furthermore, from DE
Technol. A7, No. 3, 2339 (1989), there is known a vacuum arc with a self-consuming cold cathode and furthermore, from DE
3,413,891, a vacuum arc wherein the electrons produced by a self-consuming cold cathode are used to vaporize material at the anode.
Therein, the anode designed as a vaporization cruci-ble is arranged with respect to a cold cathode such that the plasma jets emerging from the cathode spots on the working surface of the cold cathode heat up the exterior wall of the anodic vaporization crucible to such extent that the vapori-zation material located within the vaporization crucible is vaporized, and the resulting material vapor above the cruci-ble interacts with the plasma jets emerging from the cathode spots so that the material vapor is ionized.
A common drawback of the mentioned plasma-supported coating techniques is to be seen in the low coating rates being below 1 ~m/min in industrially practicable devices.
This, with the practicability of plasma-supported processes on an industrial scale, results in low production rates which, in terms of costs, are not capable of competing with the classical thermal vapor coating processes operating with-out conversion of the vaporization material into the plasma state.
The technical problem of the invention is to provide a device and a process fox vaporizing material allowing for coating rates of more than 1 ~m/min to permit low-cost, high quality vacuum vapor coating of bulk goods.
The technical problem is solved by arranging the crucible (7) laterally above the working surface of the cath-ode (2a) that close to said working surface that the solid angle formed by the metal vapor plasma (9) flowing off from the anode crucible (7) is just not decreased by the diaphragm (13) in such fashion that tromogenous vapor coating of sub-strates above the crucible (7) is no longer possible, and arranging cathode (2) and anode opposite to each other.
Furthermore, the techniacl problem is solved by a process for vaporizing material using a vacuum arc disckiarge in a vacuum chamber with a self-consuming cathode (2) having a coolable cathode supply (1) and a self-consuming hot anode consisting of anode base plate (6), a connecting member (7a) and a crucible (7), wherein heat transmission from anode crucible (7) to anode base plate (6) is held low, the plasma jets (5a,5b) emerging from the cathode spots are unimpeded in their action on the outer wall (7b) of the crucible (7) and on the material vapor (9) above crucible so that a high de-gree of vaporization is obtained, and the crucible (7) con-sists of an electrically conductive and heat conductive mate-rial.
In a particularly preferred embodiment the crucible consists of titanium diboride, tungsten or a mixed ceramic of boron nitride, titanium diboride and aluminum nitride.
Using process and device of the invention, high qual-ity coatings with coating rates on articles of more than 1 ~Cm/s are possible, so that bulk production under economic aspects becomes feasible.
With the process of the invention, coating rates in a distance 15 cm from the arc as illustrated in table 1 could be obtained. The power associated with the arc was 3 kW each.
~~~1~~
Therein, the anode designed as a vaporization cruci-ble is arranged with respect to a cold cathode such that the plasma jets emerging from the cathode spots on the working surface of the cold cathode heat up the exterior wall of the anodic vaporization crucible to such extent that the vapori-zation material located within the vaporization crucible is vaporized, and the resulting material vapor above the cruci-ble interacts with the plasma jets emerging from the cathode spots so that the material vapor is ionized.
A common drawback of the mentioned plasma-supported coating techniques is to be seen in the low coating rates being below 1 ~m/min in industrially practicable devices.
This, with the practicability of plasma-supported processes on an industrial scale, results in low production rates which, in terms of costs, are not capable of competing with the classical thermal vapor coating processes operating with-out conversion of the vaporization material into the plasma state.
The technical problem of the invention is to provide a device and a process fox vaporizing material allowing for coating rates of more than 1 ~m/min to permit low-cost, high quality vacuum vapor coating of bulk goods.
The technical problem is solved by arranging the crucible (7) laterally above the working surface of the cath-ode (2a) that close to said working surface that the solid angle formed by the metal vapor plasma (9) flowing off from the anode crucible (7) is just not decreased by the diaphragm (13) in such fashion that tromogenous vapor coating of sub-strates above the crucible (7) is no longer possible, and arranging cathode (2) and anode opposite to each other.
Furthermore, the techniacl problem is solved by a process for vaporizing material using a vacuum arc disckiarge in a vacuum chamber with a self-consuming cathode (2) having a coolable cathode supply (1) and a self-consuming hot anode consisting of anode base plate (6), a connecting member (7a) and a crucible (7), wherein heat transmission from anode crucible (7) to anode base plate (6) is held low, the plasma jets (5a,5b) emerging from the cathode spots are unimpeded in their action on the outer wall (7b) of the crucible (7) and on the material vapor (9) above crucible so that a high de-gree of vaporization is obtained, and the crucible (7) con-sists of an electrically conductive and heat conductive mate-rial.
In a particularly preferred embodiment the crucible consists of titanium diboride, tungsten or a mixed ceramic of boron nitride, titanium diboride and aluminum nitride.
Using process and device of the invention, high qual-ity coatings with coating rates on articles of more than 1 ~Cm/s are possible, so that bulk production under economic aspects becomes feasible.
With the process of the invention, coating rates in a distance 15 cm from the arc as illustrated in table 1 could be obtained. The power associated with the arc was 3 kW each.
~~~1~~
Vaporization Crucible Distance Coating Rate Material Material Anode-Cathode Aluminum TiB2 5 cm 4.8 ~m/min Copper W 5 cm 6.0 ~m/min Silver W 5 cm 9.0 ~m/min The values for the coating rate listed herein may be increased by using higher arc power.
The indicated coating rates exceed by far those val-ues obtainable with other plasma-supported or ion-supported processes. Thus, when using cathode sputtering which is most frequently employed for coatings, coating rates of more than 1 um/min are barely obtained, even when applying extreme power of <_ 50 kW.
On the basis of power fed into the arc, the coating rates of the process according to the invention exceed by far those obtained when using arcs with glow cathode, hollow cathode or self-consuming cold cathode without anode vapori-zation.
Thus, the present process according to the invention is outstanding for the effective utilization of power fed into the arc for the vaporization process. Due to this effec-tiveness, high vaporization rates can be obtained with rela-tively low electric power.
Furthermore, the effective utilization of power fed into the arc results in lower heat generation and thus, to lower thermal load on the articles to be coated and to lower consumption of electric energy and cooling water.
The indicated coating rates exceed by far those val-ues obtainable with other plasma-supported or ion-supported processes. Thus, when using cathode sputtering which is most frequently employed for coatings, coating rates of more than 1 um/min are barely obtained, even when applying extreme power of <_ 50 kW.
On the basis of power fed into the arc, the coating rates of the process according to the invention exceed by far those obtained when using arcs with glow cathode, hollow cathode or self-consuming cold cathode without anode vapori-zation.
Thus, the present process according to the invention is outstanding for the effective utilization of power fed into the arc for the vaporization process. Due to this effec-tiveness, high vaporization rates can be obtained with rela-tively low electric power.
Furthermore, the effective utilization of power fed into the arc results in lower heat generation and thus, to lower thermal load on the articles to be coated and to lower consumption of electric energy and cooling water.
Due to rapid heating of the vaporization material and subsequent high vaporization rate, the process according to the invention is also suited for a quasi-continous type of production, wherein the articles to be coated enter or exit the vaporization chamber via gates and the vapor deposition process is active only during the residence time of the arti-cle in the vacuum chamber.
Figure 1 shows a device suitable fox operating the process according to the invention.
Figure 2 shows the same device, however, with cathode and anode arranged in undesirable fashion with respect to each other.
Figure 3 shows a preferred arrangement of the device according to figure 1, wherein cathode and anode are arranged inclinedly towards to each other.
Figure 1 shows a cooled cathode supply (1) with the cathode material (2) and a support device (3) for the cathode material. Device (3) also serves to fixate the cathode spots (5) on the working surface (2a) of the cathode material (2).
The arc discharge is ignited according to prior art using an ignition unit (4) which is shown as a symbol only.
The anode consists of an anode holder (anode base plate) (6), an anode crucible (7) and an electrically conduc-tive connection (7a) between holder (6) and crucible (7). Due to its material or geometrical properties, the connecting member (7a) permits an electrically conductive and heat-in-sulating attachment of crucible (7) to the anode base plate (6). In a preferred embodiment, the connecting member (7a) has an electrical resistance dimensioned such that i~t is heated up by the current flowing to the crucible.
_ g It is advantageous to design the connection (7a) in such fashion that low heat transmission from crucible (7) to the holder (6) takes place.
Within the anode crucible (7), the vaporization mate-rial (8) is located. Consumed vaporization material (8) may be re-supplied by material in the form of a wire (10). For this purpose, the re--supplyable material (10) is stored on a wire roll and is fed to the vaporization crucible (7) via driving pulleys (1Z) and a guiding tube (12) in the usual manner.
The anode crucible (7) has a geometrical arrangement with respect to the working surface of cathode (2a) such that plasma jets (5a,5b) emerging from the cathode spots act both on the outer wall (7b) of the crucible and the material vapor (9) above the crucible. In a preferred embodiment, each.plas--ma jet (5a,5b) may originate from different cathodes. The plasma jet (5a) impinging on the outer wall (7b) of crucible ( 7 ) , due to the high energies of the particles ( 5 ) carried along with the plasma jet, causes rapid and strong heating of the crucible and thus, strong heating of the vaporization material. Therefore, it is particularly advantageous if the crucible consists of a material having good heat conductance.
This strong heating results in vigorous vaporization of the vaporization material (8). The plasma jet (5b) interacts with the material vapor (9) above the crucible. As a consequence of inelastic collision processes between particles of the plasma jet (5b) and the material vapor, this interaction results in formation of a dense plasma above the crucible.
This plasma impinges on the vaporization material (8) in the crucible (7), resulting in a further energy supply to the vaporization material and thus, to an increase in vaporiza-tion rate. The ionized metal vapor flowing out of the ionized cloud of vapor above the crucible into the surrounding vacuum may then be used for coating purposes.
~~5 For a high quality coating it is necessary to keep metal droplets emerging from the cathode spots (5) and being entrained by the plasma jet (5a,5b) away from the object to be coated. For this purpose, the diaphragm (13) illustrated in figure 1 is arranged above the cathode, restricting the cathodic plasma jet (5a,5b) to a space zone outside the object to be coated. The diaphragm (13) requires a minimum distance between working surface (2a) of the cathode and the anode crucible (7) since too small a distance results in an undesirable spatial restriction (14) of metal vapor plasma (9) flowing off from the anode crucible {7). Therefore, the crucible (7) is arranged laterally above the working surface (2a) of cathode (2) that close to said working surface that the solid angle formed by the metal vapor plasma (9j flowing off from the anode crucible {7) is just not decreased by the diaphragm {13) so that homogenous vapor coating of substrates above the crucible (7) takes place yet.
Figure 2 shows an undesirable arrangement of anode and cathode. Here, the distance between working surface (2a) of the cathode and the anode crucible (7) is so small that metal vapor plamsa (9) flowing off is hindered by the diaphragm (13). If the electrodes are too close together, a solid angle will no longer be utilized due to the shielding {14), and objects arranged in this direction will not be Coated.
In order to achieve high vaporization rates, it is advantageous if the connecting member (7a) providing elec-trical contact of vaporization material (g) and/or Crucible (7) hinders heat transmission between crucible (7) and holder (6). In a preferred embodiment, the hindrance of heat trans-mission may be achieved in that the connecting member (7a) is relatively long (about 5 cm) and designed with low cross-section. However, this geometrically caused decrease of heat transmission is limited by the required mechanical stability of connecting member (7a). Furthermore, in a particularly ~~~~a.rz _ g preferred embodiment, it may be advantageous if the connect-ing member (7a) has an electrical resistance dimensioned such that due to the f lux of current in the arc, the connecting member (7a) is heated up by this flux of current and hereby, heat flow-off from the crucible (7) to the holder (6) is prevented, or the electrical heating of connecting member (7a) by the flux of current even causes additional supply of energy to the crucible (7). Furthermore, it is advantageous if a portion of the crucible outer wall (7b) as large as possible is impinged by the plasma jet (5a). In a particular-ly favorable fashion, this is achieved in that the anode is arranged opposite to the cathode, and the crucible (7) is arranged laterally above the working surface of the cathode (2a). Furthermore, the crucible (7) should consist of a mate-rial having good heat conductance so that heat from the outer wall (7b) of the crucible will be effectively transmitted to the vaporization material.
Figure 3 shows an arrangement, wherein a cathode and an anode are arranged somewhat inclined to each other. This arrangement offers the advantage that, on the one hand, the molten vaporization material (8) flows to the anode tip [end of the vaporization crucible (7) pointing to the cathode] due to gravity. The anode tip, because of the proximity to the cathode, is heated particularly strongly by the plasma jet (5a). The inclination of the crucible (7) causes continuous perfusion of the anode tip with molten vaporization material and thus, effective vaporization.
On the other hand, the inclination causes further restriction of the space zone interspersed by the plasma jet (5a,5b) above crucible (7) so that a larger space zone is available for coating purposes.
Figure 1 shows a device suitable fox operating the process according to the invention.
Figure 2 shows the same device, however, with cathode and anode arranged in undesirable fashion with respect to each other.
Figure 3 shows a preferred arrangement of the device according to figure 1, wherein cathode and anode are arranged inclinedly towards to each other.
Figure 1 shows a cooled cathode supply (1) with the cathode material (2) and a support device (3) for the cathode material. Device (3) also serves to fixate the cathode spots (5) on the working surface (2a) of the cathode material (2).
The arc discharge is ignited according to prior art using an ignition unit (4) which is shown as a symbol only.
The anode consists of an anode holder (anode base plate) (6), an anode crucible (7) and an electrically conduc-tive connection (7a) between holder (6) and crucible (7). Due to its material or geometrical properties, the connecting member (7a) permits an electrically conductive and heat-in-sulating attachment of crucible (7) to the anode base plate (6). In a preferred embodiment, the connecting member (7a) has an electrical resistance dimensioned such that i~t is heated up by the current flowing to the crucible.
_ g It is advantageous to design the connection (7a) in such fashion that low heat transmission from crucible (7) to the holder (6) takes place.
Within the anode crucible (7), the vaporization mate-rial (8) is located. Consumed vaporization material (8) may be re-supplied by material in the form of a wire (10). For this purpose, the re--supplyable material (10) is stored on a wire roll and is fed to the vaporization crucible (7) via driving pulleys (1Z) and a guiding tube (12) in the usual manner.
The anode crucible (7) has a geometrical arrangement with respect to the working surface of cathode (2a) such that plasma jets (5a,5b) emerging from the cathode spots act both on the outer wall (7b) of the crucible and the material vapor (9) above the crucible. In a preferred embodiment, each.plas--ma jet (5a,5b) may originate from different cathodes. The plasma jet (5a) impinging on the outer wall (7b) of crucible ( 7 ) , due to the high energies of the particles ( 5 ) carried along with the plasma jet, causes rapid and strong heating of the crucible and thus, strong heating of the vaporization material. Therefore, it is particularly advantageous if the crucible consists of a material having good heat conductance.
This strong heating results in vigorous vaporization of the vaporization material (8). The plasma jet (5b) interacts with the material vapor (9) above the crucible. As a consequence of inelastic collision processes between particles of the plasma jet (5b) and the material vapor, this interaction results in formation of a dense plasma above the crucible.
This plasma impinges on the vaporization material (8) in the crucible (7), resulting in a further energy supply to the vaporization material and thus, to an increase in vaporiza-tion rate. The ionized metal vapor flowing out of the ionized cloud of vapor above the crucible into the surrounding vacuum may then be used for coating purposes.
~~5 For a high quality coating it is necessary to keep metal droplets emerging from the cathode spots (5) and being entrained by the plasma jet (5a,5b) away from the object to be coated. For this purpose, the diaphragm (13) illustrated in figure 1 is arranged above the cathode, restricting the cathodic plasma jet (5a,5b) to a space zone outside the object to be coated. The diaphragm (13) requires a minimum distance between working surface (2a) of the cathode and the anode crucible (7) since too small a distance results in an undesirable spatial restriction (14) of metal vapor plasma (9) flowing off from the anode crucible {7). Therefore, the crucible (7) is arranged laterally above the working surface (2a) of cathode (2) that close to said working surface that the solid angle formed by the metal vapor plasma (9j flowing off from the anode crucible {7) is just not decreased by the diaphragm {13) so that homogenous vapor coating of substrates above the crucible (7) takes place yet.
Figure 2 shows an undesirable arrangement of anode and cathode. Here, the distance between working surface (2a) of the cathode and the anode crucible (7) is so small that metal vapor plamsa (9) flowing off is hindered by the diaphragm (13). If the electrodes are too close together, a solid angle will no longer be utilized due to the shielding {14), and objects arranged in this direction will not be Coated.
In order to achieve high vaporization rates, it is advantageous if the connecting member (7a) providing elec-trical contact of vaporization material (g) and/or Crucible (7) hinders heat transmission between crucible (7) and holder (6). In a preferred embodiment, the hindrance of heat trans-mission may be achieved in that the connecting member (7a) is relatively long (about 5 cm) and designed with low cross-section. However, this geometrically caused decrease of heat transmission is limited by the required mechanical stability of connecting member (7a). Furthermore, in a particularly ~~~~a.rz _ g preferred embodiment, it may be advantageous if the connect-ing member (7a) has an electrical resistance dimensioned such that due to the f lux of current in the arc, the connecting member (7a) is heated up by this flux of current and hereby, heat flow-off from the crucible (7) to the holder (6) is prevented, or the electrical heating of connecting member (7a) by the flux of current even causes additional supply of energy to the crucible (7). Furthermore, it is advantageous if a portion of the crucible outer wall (7b) as large as possible is impinged by the plasma jet (5a). In a particular-ly favorable fashion, this is achieved in that the anode is arranged opposite to the cathode, and the crucible (7) is arranged laterally above the working surface of the cathode (2a). Furthermore, the crucible (7) should consist of a mate-rial having good heat conductance so that heat from the outer wall (7b) of the crucible will be effectively transmitted to the vaporization material.
Figure 3 shows an arrangement, wherein a cathode and an anode are arranged somewhat inclined to each other. This arrangement offers the advantage that, on the one hand, the molten vaporization material (8) flows to the anode tip [end of the vaporization crucible (7) pointing to the cathode] due to gravity. The anode tip, because of the proximity to the cathode, is heated particularly strongly by the plasma jet (5a). The inclination of the crucible (7) causes continuous perfusion of the anode tip with molten vaporization material and thus, effective vaporization.
On the other hand, the inclination causes further restriction of the space zone interspersed by the plasma jet (5a,5b) above crucible (7) so that a larger space zone is available for coating purposes.
Claims (5)
1. A device for vaporizing material using a vacuum arc discharge in a vacuum chamber with a self-consuming cathode having a coolable cathode supply to which the cathode is attached and a self-consuming hot anode, wherein, via a connecting member, a crucible is attached to the anode base plate, and a diaphragm shielding the cathode is arranged above same, the crucible consists of an electrically conductive and heat-conductive material, and the connecting member, due to its material properties or geometrical properties, permits electrically conductive and heat-insulating attachment of crucible to the anode base plate, characterized in that the crucible is arranged laterally above the working surface of the cathode that close to said working surface that a solid angle formed by the metal vapor plasma flowing off from the anode crucible is just not decreased by the diaphragm in such fashion that homogenous vapor coating of substrates above the crucible is no longer possible, and cathode and anode are arranged opposite to each other.
2. The device of claim 1, characterized in that the crucible consists of titanium diboride, tungsten or a mixed ceramic of boron nitride, titanium diboride and aluminum nitride.
3. The device of claim 1 or 2, characterized in that the connecting member has an electrical resistance dimensioned such that it is heated up by the current flowing to the crucible.
4. A process for vaporizing material using a vacuum arc discharge in a vacuum chamber with a self-consuming cathode, a coolable cathode supply and a self-consuming hot anode according to any one of claims 1 to 3, characterized in that heat transmission from anode crucible to anode base plate is held low and the plasma jets emerging from the cathode spots are unimpeded in their action on the outer wall of the crucible and on the material vapor above the crucible so that a high degree of vaporization is obtained.
5. The process according to claim 4, characterized in that separated cathodes are used for each plasma jet.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEP4100541.4 | 1991-01-10 | ||
| DE4100541A DE4100541C1 (en) | 1991-01-10 | 1991-01-10 | |
| PCT/EP1991/002525 WO1992012275A1 (en) | 1991-01-10 | 1991-12-31 | Device and process for the vaporisation of material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2099132A1 CA2099132A1 (en) | 1992-07-11 |
| CA2099132C true CA2099132C (en) | 2001-04-10 |
Family
ID=6422784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002099132A Expired - Fee Related CA2099132C (en) | 1991-01-10 | 1991-12-31 | Device and process for the vaporisation of material |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0566606B1 (en) |
| JP (1) | JP2546591B2 (en) |
| AU (1) | AU9110191A (en) |
| CA (1) | CA2099132C (en) |
| DE (2) | DE4100541C1 (en) |
| WO (1) | WO1992012275A1 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4307740C2 (en) * | 1993-03-11 | 1994-12-22 | Ttk Kunststoff Tech Gmbh | Method for producing housings with at least one metallic shielding layer |
| US6223683B1 (en) | 1997-03-14 | 2001-05-01 | The Coca-Cola Company | Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating |
| US6251233B1 (en) | 1998-08-03 | 2001-06-26 | The Coca-Cola Company | Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation |
| US6720052B1 (en) | 2000-08-24 | 2004-04-13 | The Coca-Cola Company | Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same |
| US6740378B1 (en) | 2000-08-24 | 2004-05-25 | The Coca-Cola Company | Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same |
| US6599584B2 (en) | 2001-04-27 | 2003-07-29 | The Coca-Cola Company | Barrier coated plastic containers and coating methods therefor |
| DE60302234D1 (en) | 2002-04-15 | 2005-12-15 | Coca Cola Co | COATING COMPOSITION CONTAINING EPOXY ADDITIVE AND STRUCTURES COATED THEREWITH |
| DE102005020946B4 (en) * | 2005-05-04 | 2007-08-02 | Esk Ceramics Gmbh & Co. Kg | Method and evaporator boat for coating substrates with copper or silver |
| DE102005020945B4 (en) * | 2005-05-04 | 2007-07-12 | Esk Ceramics Gmbh & Co. Kg | Ceramic evaporator boats, process for their preparation and their use |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH452313A (en) * | 1965-12-18 | 1968-05-31 | Balzers Patent Beteilig Ag | Device for the evaporation of substances in a vacuum |
| US3562141A (en) * | 1968-02-23 | 1971-02-09 | John R Morley | Vacuum vapor deposition utilizing low voltage electron beam |
| US4197157A (en) * | 1975-03-19 | 1980-04-08 | Arthur D. Little, Inc. | Method for forming refractory tubing |
| DE3413891C2 (en) * | 1984-04-12 | 1987-01-08 | Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich | Method and device for material evaporation in a vacuum container |
-
1991
- 1991-01-10 DE DE4100541A patent/DE4100541C1/de not_active Expired - Fee Related
- 1991-12-31 CA CA002099132A patent/CA2099132C/en not_active Expired - Fee Related
- 1991-12-31 JP JP4501665A patent/JP2546591B2/en not_active Expired - Fee Related
- 1991-12-31 AU AU91101/91A patent/AU9110191A/en not_active Abandoned
- 1991-12-31 EP EP92901885A patent/EP0566606B1/en not_active Expired - Lifetime
- 1991-12-31 DE DE59105635T patent/DE59105635D1/en not_active Expired - Fee Related
- 1991-12-31 WO PCT/EP1991/002525 patent/WO1992012275A1/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| CA2099132A1 (en) | 1992-07-11 |
| JP2546591B2 (en) | 1996-10-23 |
| EP0566606A1 (en) | 1993-10-27 |
| EP0566606B1 (en) | 1995-05-31 |
| DE59105635D1 (en) | 1995-07-06 |
| WO1992012275A1 (en) | 1992-07-23 |
| AU9110191A (en) | 1992-08-17 |
| DE4100541C1 (en) | 1992-01-16 |
| JPH06501060A (en) | 1994-01-27 |
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| EEER | Examination request | ||
| MKLA | Lapsed |