CA2099132A1 - Device and process for the vaporisation of material - Google Patents
Device and process for the vaporisation of materialInfo
- Publication number
- CA2099132A1 CA2099132A1 CA002099132A CA2099132A CA2099132A1 CA 2099132 A1 CA2099132 A1 CA 2099132A1 CA 002099132 A CA002099132 A CA 002099132A CA 2099132 A CA2099132 A CA 2099132A CA 2099132 A1 CA2099132 A1 CA 2099132A1
- Authority
- CA
- Canada
- Prior art keywords
- crucible
- anode
- cathode
- electrically conductive
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a device for vaporizing material by means of a vacuum arc discharge using a cold cathode and a hot self-consuming anode, wherein the crucible (7) consists of an electrically conductive and heat-conductive material, and the connecting member (7a), due to its material properties or geometrical properties, permits electrically conductive and heat-insulating attachment of crucible (7) to the anode base plate (6), and the crucible (7) is arranged laterally above the working surface of the cathode (2a) that close to said working surface that the solid angle formed by the metal vapor plasma (9) flowing off from the anode crucible (7) is just not decreased by the diaphragm (13) in such fashion that homogenous vapor coating of substrates above the crucible (7) is no longer possible. Cathode (2) and anode are arranged opposite to each other.
Furthermore, the invention relates to a process for vaporizing material, wherein the plasma jets (5a,5b) emerging from the cathode surfaces are unimpeded in their action on the outer wall (7a) of the crucible and on the material vapor (9) above the crucible so that a high degree of vaporization is obtained, and the crucible (7) consists of an electrically conductive and heat conductive material.
Furthermore, the invention relates to a process for vaporizing material, wherein the plasma jets (5a,5b) emerging from the cathode surfaces are unimpeded in their action on the outer wall (7a) of the crucible and on the material vapor (9) above the crucible so that a high degree of vaporization is obtained, and the crucible (7) consists of an electrically conductive and heat conductive material.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4100541A DE4100541C1 (en) | 1991-01-10 | 1991-01-10 | |
DEP4100541.4 | 1991-01-10 | ||
PCT/EP1991/002525 WO1992012275A1 (en) | 1991-01-10 | 1991-12-31 | Device and process for the vaporisation of material |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2099132A1 true CA2099132A1 (en) | 1992-07-11 |
CA2099132C CA2099132C (en) | 2001-04-10 |
Family
ID=6422784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002099132A Expired - Fee Related CA2099132C (en) | 1991-01-10 | 1991-12-31 | Device and process for the vaporisation of material |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0566606B1 (en) |
JP (1) | JP2546591B2 (en) |
AU (1) | AU9110191A (en) |
CA (1) | CA2099132C (en) |
DE (2) | DE4100541C1 (en) |
WO (1) | WO1992012275A1 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4307740C2 (en) * | 1993-03-11 | 1994-12-22 | Ttk Kunststoff Tech Gmbh | Method for producing housings with at least one metallic shielding layer |
US6223683B1 (en) | 1997-03-14 | 2001-05-01 | The Coca-Cola Company | Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating |
US6251233B1 (en) | 1998-08-03 | 2001-06-26 | The Coca-Cola Company | Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation |
US6740378B1 (en) | 2000-08-24 | 2004-05-25 | The Coca-Cola Company | Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same |
US6720052B1 (en) | 2000-08-24 | 2004-04-13 | The Coca-Cola Company | Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same |
US6599584B2 (en) | 2001-04-27 | 2003-07-29 | The Coca-Cola Company | Barrier coated plastic containers and coating methods therefor |
DE102005020945B4 (en) * | 2005-05-04 | 2007-07-12 | Esk Ceramics Gmbh & Co. Kg | Ceramic evaporator boats, process for their preparation and their use |
DE102005020946B4 (en) * | 2005-05-04 | 2007-08-02 | Esk Ceramics Gmbh & Co. Kg | Method and evaporator boat for coating substrates with copper or silver |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH452313A (en) * | 1965-12-18 | 1968-05-31 | Balzers Patent Beteilig Ag | Device for the evaporation of substances in a vacuum |
US3562141A (en) * | 1968-02-23 | 1971-02-09 | John R Morley | Vacuum vapor deposition utilizing low voltage electron beam |
US4197157A (en) * | 1975-03-19 | 1980-04-08 | Arthur D. Little, Inc. | Method for forming refractory tubing |
DE3413891C2 (en) * | 1984-04-12 | 1987-01-08 | Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich | Method and device for material evaporation in a vacuum container |
-
1991
- 1991-01-10 DE DE4100541A patent/DE4100541C1/de not_active Expired - Fee Related
- 1991-12-31 DE DE59105635T patent/DE59105635D1/en not_active Expired - Fee Related
- 1991-12-31 EP EP92901885A patent/EP0566606B1/en not_active Expired - Lifetime
- 1991-12-31 CA CA002099132A patent/CA2099132C/en not_active Expired - Fee Related
- 1991-12-31 AU AU91101/91A patent/AU9110191A/en not_active Abandoned
- 1991-12-31 JP JP4501665A patent/JP2546591B2/en not_active Expired - Fee Related
- 1991-12-31 WO PCT/EP1991/002525 patent/WO1992012275A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
DE59105635D1 (en) | 1995-07-06 |
CA2099132C (en) | 2001-04-10 |
DE4100541C1 (en) | 1992-01-16 |
JP2546591B2 (en) | 1996-10-23 |
JPH06501060A (en) | 1994-01-27 |
EP0566606B1 (en) | 1995-05-31 |
EP0566606A1 (en) | 1993-10-27 |
WO1992012275A1 (en) | 1992-07-23 |
AU9110191A (en) | 1992-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |