CA2000171A1 - Mode de preparation des alliages heteroarchiques amorphes - Google Patents
Mode de preparation des alliages heteroarchiques amorphesInfo
- Publication number
- CA2000171A1 CA2000171A1 CA2000171A CA2000171A CA2000171A1 CA 2000171 A1 CA2000171 A1 CA 2000171A1 CA 2000171 A CA2000171 A CA 2000171A CA 2000171 A CA2000171 A CA 2000171A CA 2000171 A1 CA2000171 A1 CA 2000171A1
- Authority
- CA
- Canada
- Prior art keywords
- preparation
- amorphous superlattice
- amorphous
- alloys
- superlattice alloys
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63260021A JPH02107757A (ja) | 1988-10-15 | 1988-10-15 | アモルファス超格子合金の作製法 |
JP63-260021 | 1988-10-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2000171A1 true CA2000171A1 (fr) | 1990-04-15 |
CA2000171C CA2000171C (fr) | 1999-08-24 |
Family
ID=17342207
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002000171A Expired - Fee Related CA2000171C (fr) | 1988-10-15 | 1989-10-05 | Mode de preparation des alliages heteroarchiques amorphes |
Country Status (7)
Country | Link |
---|---|
US (1) | US5015352A (fr) |
EP (1) | EP0364902B1 (fr) |
JP (1) | JPH02107757A (fr) |
AU (1) | AU613530B2 (fr) |
BR (1) | BR8905316A (fr) |
CA (1) | CA2000171C (fr) |
DE (2) | DE364902T1 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU620155B2 (en) * | 1988-10-15 | 1992-02-13 | Koji Hashimoto | Amorphous aluminum alloys |
EP0600303B1 (fr) * | 1992-12-01 | 2002-02-06 | Matsushita Electric Industrial Co., Ltd. | Procédé pour fabriquer une couche mince diélectrique |
AU7403694A (en) * | 1994-07-19 | 1996-02-16 | American Plating Systems, Inc. | Electrolytic plating apparatus and method |
US6395156B1 (en) | 2001-06-29 | 2002-05-28 | Super Light Wave Corp. | Sputtering chamber with moving table producing orbital motion of target for improved uniformity |
FR2905707B1 (fr) * | 2006-09-08 | 2009-01-23 | Centre Nat Rech Scient | Procede pour deposer sur un substrat une couche mince d'alliage metallique et alliage metallique sous forme de couche mince. |
US20140174907A1 (en) * | 2012-12-21 | 2014-06-26 | Intermolecular, Inc. | High Deposition Rate Chamber with Co-Sputtering Capabilities |
CN117604462A (zh) * | 2023-12-06 | 2024-02-27 | 江苏科技大学 | 一种具有室温拉伸塑性Ti基非晶合金及其制备方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2111534A (en) * | 1981-12-16 | 1983-07-06 | Energy Conversion Devices Inc | Making photoresponsive amorphous alloys and devices by reactive plasma sputtering |
JPS5974648A (ja) * | 1982-10-22 | 1984-04-27 | Hitachi Ltd | スパツタ装置 |
DE3471834D1 (en) * | 1983-03-11 | 1988-07-07 | Exxon Research Engineering Co | A multi-layered amorphous semiconductor material |
JPS6052574A (ja) * | 1983-09-02 | 1985-03-25 | Hitachi Ltd | 連続スパツタ装置 |
US4591417A (en) * | 1983-12-27 | 1986-05-27 | Ford Motor Company | Tandem deposition of cermets |
JPS6119774A (ja) * | 1984-07-06 | 1986-01-28 | Anelva Corp | スパツタリング装置 |
JPS61238958A (ja) * | 1985-04-15 | 1986-10-24 | Hitachi Ltd | 複合薄膜形成法及び装置 |
JPS61250163A (ja) * | 1985-04-26 | 1986-11-07 | Nippon Telegr & Teleph Corp <Ntt> | 多層薄膜の製造方法および装置 |
US4701395A (en) * | 1985-05-20 | 1987-10-20 | Exxon Research And Engineering Company | Amorphous photoreceptor with high sensitivity to long wavelengths |
JPS6379951A (ja) * | 1986-09-22 | 1988-04-09 | Showa Denko Kk | 磁性金属多層膜およびその製造方法 |
-
1988
- 1988-10-15 JP JP63260021A patent/JPH02107757A/ja active Pending
-
1989
- 1989-10-05 CA CA002000171A patent/CA2000171C/fr not_active Expired - Fee Related
- 1989-10-06 AU AU42651/89A patent/AU613530B2/en not_active Ceased
- 1989-10-13 EP EP89119081A patent/EP0364902B1/fr not_active Expired - Lifetime
- 1989-10-13 DE DE198989119081T patent/DE364902T1/de active Pending
- 1989-10-13 US US07/420,903 patent/US5015352A/en not_active Expired - Lifetime
- 1989-10-13 DE DE68921838T patent/DE68921838T2/de not_active Expired - Fee Related
- 1989-10-16 BR BR8905316-8A patent/BR8905316A/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0364902B1 (fr) | 1995-03-22 |
DE68921838T2 (de) | 1995-11-02 |
BR8905316A (pt) | 1990-05-22 |
DE364902T1 (de) | 1990-11-08 |
EP0364902A1 (fr) | 1990-04-25 |
US5015352A (en) | 1991-05-14 |
AU613530B2 (en) | 1991-08-01 |
CA2000171C (fr) | 1999-08-24 |
DE68921838D1 (de) | 1995-04-27 |
JPH02107757A (ja) | 1990-04-19 |
AU4265189A (en) | 1990-04-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |