CA1300294C - Composition photopolymerisable - Google Patents

Composition photopolymerisable

Info

Publication number
CA1300294C
CA1300294C CA000502905A CA502905A CA1300294C CA 1300294 C CA1300294 C CA 1300294C CA 000502905 A CA000502905 A CA 000502905A CA 502905 A CA502905 A CA 502905A CA 1300294 C CA1300294 C CA 1300294C
Authority
CA
Canada
Prior art keywords
composition
monomer
polyvinyl
polymerizable mixture
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CA000502905A
Other languages
English (en)
Inventor
John E. Walls
Carlos Tellechea
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
American Hoechst Corp
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Hoechst Corp, Hoechst Celanese Corp filed Critical American Hoechst Corp
Application granted granted Critical
Publication of CA1300294C publication Critical patent/CA1300294C/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
CA000502905A 1985-02-28 1986-02-27 Composition photopolymerisable Expired - Lifetime CA1300294C (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70711085A 1985-02-28 1985-02-28
US707,110 1985-02-28

Publications (1)

Publication Number Publication Date
CA1300294C true CA1300294C (fr) 1992-05-05

Family

ID=24840382

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000502905A Expired - Lifetime CA1300294C (fr) 1985-02-28 1986-02-27 Composition photopolymerisable

Country Status (4)

Country Link
JP (1) JPS61201234A (fr)
CA (1) CA1300294C (fr)
DE (1) DE3605717A1 (fr)
GB (1) GB2171713B (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3425328A1 (de) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JPH0766186B2 (ja) * 1985-07-02 1995-07-19 富士写真フイルム株式会社 感光性組成物
JPS62238553A (ja) * 1986-04-10 1987-10-19 Nippon Foil Mfg Co Ltd 感光性樹脂組成物
JPS63194111A (ja) * 1987-02-06 1988-08-11 Hitachi Ltd ガス燃料の燃焼方法及び装置
DE3738863A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
JPH04362350A (ja) * 1991-06-06 1992-12-15 Kubota Corp ミッションの潤滑構造
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
US5858615A (en) * 1997-07-31 1999-01-12 Morton International, Inc. Hardenable photoimageable compositions
US6689489B2 (en) 1999-10-07 2004-02-10 Isg Technologies, Inc. Composition for controlling spangle size, a coated steel product, and a coating method
WO2001027343A1 (fr) 1999-10-07 2001-04-19 Bethlehem Steel Corporation Composition d'enrobage pour produit en acier; produit en acier enrobe, et procede d'enrobage d'un produit en acier

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8001085A (nl) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg Fotogevoelige materialen en voorwerpen.
DE3120052A1 (de) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial

Also Published As

Publication number Publication date
JPS61201234A (ja) 1986-09-05
GB2171713A (en) 1986-09-03
GB8604818D0 (en) 1986-04-03
GB2171713B (en) 1988-05-25
DE3605717A1 (de) 1986-08-28

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