GB2171713B - Radiation-polymerizable composition - Google Patents

Radiation-polymerizable composition

Info

Publication number
GB2171713B
GB2171713B GB08604818A GB8604818A GB2171713B GB 2171713 B GB2171713 B GB 2171713B GB 08604818 A GB08604818 A GB 08604818A GB 8604818 A GB8604818 A GB 8604818A GB 2171713 B GB2171713 B GB 2171713B
Authority
GB
United Kingdom
Prior art keywords
radiation
polymerizable composition
polymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08604818A
Other versions
GB2171713A (en
GB8604818D0 (en
Inventor
John E Walls
Carlos Tellechea
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
American Hoechst Corp
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Hoechst Corp, Hoechst Celanese Corp filed Critical American Hoechst Corp
Publication of GB8604818D0 publication Critical patent/GB8604818D0/en
Publication of GB2171713A publication Critical patent/GB2171713A/en
Application granted granted Critical
Publication of GB2171713B publication Critical patent/GB2171713B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
GB08604818A 1985-02-28 1986-02-27 Radiation-polymerizable composition Expired GB2171713B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70711085A 1985-02-28 1985-02-28

Publications (3)

Publication Number Publication Date
GB8604818D0 GB8604818D0 (en) 1986-04-03
GB2171713A GB2171713A (en) 1986-09-03
GB2171713B true GB2171713B (en) 1988-05-25

Family

ID=24840382

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08604818A Expired GB2171713B (en) 1985-02-28 1986-02-27 Radiation-polymerizable composition

Country Status (4)

Country Link
JP (1) JPS61201234A (en)
CA (1) CA1300294C (en)
DE (1) DE3605717A1 (en)
GB (1) GB2171713B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3425328A1 (en) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
JPH0766186B2 (en) * 1985-07-02 1995-07-19 富士写真フイルム株式会社 Photosensitive composition
JPS62238553A (en) * 1986-04-10 1987-10-19 Nippon Foil Mfg Co Ltd Photosensitive resin composition
JPS63194111A (en) * 1987-02-06 1988-08-11 Hitachi Ltd Combustion method for gas fuel and equipment thereof
DE3738863A1 (en) * 1987-11-16 1989-05-24 Hoechst Ag LIGHT-SENSITIVE PRINTING PLATE FOR WATERLESS OFFSET PRINTING
JPH04362350A (en) * 1991-06-06 1992-12-15 Kubota Corp Transmission lubricating structure
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
US5858615A (en) * 1997-07-31 1999-01-12 Morton International, Inc. Hardenable photoimageable compositions
US6689489B2 (en) 1999-10-07 2004-02-10 Isg Technologies, Inc. Composition for controlling spangle size, a coated steel product, and a coating method
WO2001027343A1 (en) 1999-10-07 2001-04-19 Bethlehem Steel Corporation A coating composition for steel product, a coated steel product, and a steel product coating method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8001085A (en) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg PHOTOSENSITIVE MATERIALS AND OBJECTS.
DE3120052A1 (en) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND COPYING MATERIAL MADE THEREOF

Also Published As

Publication number Publication date
JPS61201234A (en) 1986-09-05
GB2171713A (en) 1986-09-03
GB8604818D0 (en) 1986-04-03
DE3605717A1 (en) 1986-08-28
CA1300294C (en) 1992-05-05

Similar Documents

Publication Publication Date Title
GB8621580D0 (en) Composition
GB8531635D0 (en) Composition
GB2179338B (en) Composition
GB8514052D0 (en) Compositions
GB8508717D0 (en) Composition
GB8500862D0 (en) Composition
GB8509409D0 (en) Compositions
GB8622856D0 (en) Composition
GB2171713B (en) Radiation-polymerizable composition
GB8629991D0 (en) Fat-desensitizing composition
GB8604135D0 (en) Composition
GB8504489D0 (en) Aminomethylenephosphonate compositions
GB8513550D0 (en) Compositions
PT83574A (en) Composition
GB8514418D0 (en) Aminobenzylamine composition
EP0225309A3 (en) Aminomethylenephosphonate compositions
GB8606846D0 (en) Composition
GB8501400D0 (en) Compositions
GB8520289D0 (en) Compositions
EG17458A (en) Fungicial compositions
GB8515327D0 (en) Composition
BG40413A1 (en) Polyalkyl- 2 cyanacrylatic composition
IE850993L (en) Haematinic composition
GB8616866D0 (en) Composition
GB8506586D0 (en) Composition

Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940227