CA1286905C - Resist process using polysulfone polymers - Google Patents
Resist process using polysulfone polymersInfo
- Publication number
- CA1286905C CA1286905C CA 184354 CA184354A CA1286905C CA 1286905 C CA1286905 C CA 1286905C CA 184354 CA184354 CA 184354 CA 184354 A CA184354 A CA 184354A CA 1286905 C CA1286905 C CA 1286905C
- Authority
- CA
- Canada
- Prior art keywords
- olefin
- film
- polymer
- copolymer
- sulfone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30623472A | 1972-11-13 | 1972-11-13 | |
US306,234 | 1972-11-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1286905C true CA1286905C (en) | 1991-07-30 |
Family
ID=23184410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA 184354 Expired - Fee Related CA1286905C (en) | 1972-11-13 | 1973-10-26 | Resist process using polysulfone polymers |
Country Status (5)
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3893127A (en) * | 1973-09-27 | 1975-07-01 | Rca Corp | Electron beam recording media |
KR880701400A (ko) * | 1986-03-24 | 1988-07-26 | 엘리 와이스 | 집적 회로 장치의 제조방법 |
DE19917790A1 (de) * | 1999-04-20 | 2000-11-02 | Hoechst Trespaphan Gmbh | Biaxial orientierte Folie für die Herstellung von Keramikkondensatoren |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3535137A (en) * | 1967-01-13 | 1970-10-20 | Ibm | Method of fabricating etch resistant masks |
SE391405B (sv) * | 1972-05-01 | 1977-02-14 | Western Electric Co | Forfarande for astadkommande av resistmonster pa ett substrat |
-
1973
- 1973-08-31 GB GB4110673A patent/GB1421805A/en not_active Expired
- 1973-09-19 FR FR7334210A patent/FR2206527B1/fr not_active Expired
- 1973-10-26 CA CA 184354 patent/CA1286905C/en not_active Expired - Fee Related
- 1973-10-26 JP JP12003673A patent/JPS4979525A/ja active Pending
- 1973-11-07 DE DE19732355701 patent/DE2355701A1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2206527B1 (US07655688-20100202-C00086.png) | 1978-01-13 |
FR2206527A1 (US07655688-20100202-C00086.png) | 1974-06-07 |
DE2355701A1 (de) | 1974-05-16 |
JPS4979525A (US07655688-20100202-C00086.png) | 1974-08-01 |
GB1421805A (en) | 1976-01-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKLA | Lapsed |