CA1281247C - Methode de depot de films supraconducteurs a tc elevee - Google Patents
Methode de depot de films supraconducteurs a tc eleveeInfo
- Publication number
- CA1281247C CA1281247C CA000572637A CA572637A CA1281247C CA 1281247 C CA1281247 C CA 1281247C CA 000572637 A CA000572637 A CA 000572637A CA 572637 A CA572637 A CA 572637A CA 1281247 C CA1281247 C CA 1281247C
- Authority
- CA
- Canada
- Prior art keywords
- films
- boat
- deposition
- boats
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims abstract description 42
- 230000008021 deposition Effects 0.000 title abstract description 33
- 239000002887 superconductor Substances 0.000 title abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 239000010408 film Substances 0.000 claims description 69
- 238000000151 deposition Methods 0.000 claims description 32
- 229910002480 Cu-O Inorganic materials 0.000 claims description 20
- 238000010438 heat treatment Methods 0.000 claims description 16
- 239000010409 thin film Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910009203 Y-Ba-Cu-O Inorganic materials 0.000 claims description 4
- 229910015901 Bi-Sr-Ca-Cu-O Inorganic materials 0.000 claims description 3
- 230000003319 supportive effect Effects 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 1
- 239000003973 paint Substances 0.000 abstract description 5
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 description 35
- 238000001704 evaporation Methods 0.000 description 21
- 230000008020 evaporation Effects 0.000 description 20
- 229910052788 barium Inorganic materials 0.000 description 17
- 229910052791 calcium Inorganic materials 0.000 description 17
- 239000010453 quartz Substances 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 229910052716 thallium Inorganic materials 0.000 description 13
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 239000000843 powder Substances 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 6
- 230000001788 irregular Effects 0.000 description 5
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 5
- QPLDLSVMHZLSFG-UHFFFAOYSA-N CuO Inorganic materials [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Inorganic materials [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- MYWUZJCMWCOHBA-VIFPVBQESA-N methamphetamine Chemical compound CN[C@@H](C)CC1=CC=CC=C1 MYWUZJCMWCOHBA-VIFPVBQESA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 231100000701 toxic element Toxicity 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0352—Processes for depositing or forming copper oxide superconductor layers from a suspension or slurry, e.g. screen printing or doctor blade casting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0381—Processes for depositing or forming copper oxide superconductor layers by evaporation, e.g. MBE
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA000572637A CA1281247C (fr) | 1988-07-21 | 1988-07-21 | Methode de depot de films supraconducteurs a tc elevee |
| CA000615607A CA1313087C (fr) | 1988-07-21 | 1989-11-10 | Methode de deposition de pellicules supraconductrices a champ eleve |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA000572637A CA1281247C (fr) | 1988-07-21 | 1988-07-21 | Methode de depot de films supraconducteurs a tc elevee |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000615607A Division CA1313087C (fr) | 1988-07-21 | 1989-11-10 | Methode de deposition de pellicules supraconductrices a champ eleve |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1281247C true CA1281247C (fr) | 1991-03-12 |
Family
ID=4138411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000572637A Expired CA1281247C (fr) | 1988-07-21 | 1988-07-21 | Methode de depot de films supraconducteurs a tc elevee |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA1281247C (fr) |
-
1988
- 1988-07-21 CA CA000572637A patent/CA1281247C/fr not_active Expired
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5212148A (en) | Method for manufacturing oxide superconducting films by laser evaporation | |
| US5262394A (en) | Superconductive articles including cerium oxide layer | |
| Schieber | Deposition of high temperature superconducting films by physical and chemical methods | |
| US4925829A (en) | Method for preparing thin film of compound oxide superconductor by ion beam techniques | |
| EP0282839B2 (fr) | Couches d'oxydes supraconducteurs à hautes Tc et leur procédé de fabrication | |
| US4874741A (en) | Non-enhanced laser evaporation of oxide superconductors | |
| JPH10507590A (ja) | 多層複合体および製造法 | |
| US5196398A (en) | Process for producing thallium type superconducting thin film | |
| US5061684A (en) | Production of thin layers of a high temperature superconductor (htsc) by a plasma-activated physical vapor deposition process, and cathodes used therein | |
| CA1281247C (fr) | Methode de depot de films supraconducteurs a tc elevee | |
| CA1313087C (fr) | Methode de deposition de pellicules supraconductrices a champ eleve | |
| CA2003850C (fr) | Procede de preparation d'un film supraconducteur de type perovskite | |
| US5462921A (en) | Method of forming Hg-containing oxide superconducting films | |
| US4981839A (en) | Method of forming superconducting oxide films using zone annealing | |
| US5104850A (en) | Preparation of high temperature superconducting coated wires by dipping and post annealing | |
| EP0643400B1 (fr) | Procédé de fabrication d'supraconducteur à couche mince | |
| US4914080A (en) | Method for fabricating superconductive film | |
| JPH05170448A (ja) | セラミックス薄膜の製造方法 | |
| EP0333513B1 (fr) | Oxyde supraconducteur | |
| JP2523785B2 (ja) | 超電導体薄膜の製造方法 | |
| JP2594271B2 (ja) | 超電導体用薄膜の製造装置および超電導体用薄膜の製造方法 | |
| JP2817299B2 (ja) | 複合酸化物超電導薄膜の作製方法 | |
| JPH0517147A (ja) | 鉛を含む複合酸化物薄膜の製造方法 | |
| Bhushan | Preparation of YBa2Cu3Ox Thin Films by Multisource Deposition | |
| Mohan | HIGH Tc SUPERCONDUCTING THIN FILMS–PROCESSING METHODS AND PROPERTIES |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKLA | Lapsed |