CA1203644A - Systeme de fabrication de puces reglable automatiquement - Google Patents
Systeme de fabrication de puces reglable automatiquementInfo
- Publication number
- CA1203644A CA1203644A CA000438023A CA438023A CA1203644A CA 1203644 A CA1203644 A CA 1203644A CA 000438023 A CA000438023 A CA 000438023A CA 438023 A CA438023 A CA 438023A CA 1203644 A CA1203644 A CA 1203644A
- Authority
- CA
- Canada
- Prior art keywords
- aperture
- pattern
- electron beam
- shapes
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims abstract description 71
- 238000013461 design Methods 0.000 title description 33
- 238000010894 electron beam technology Methods 0.000 claims abstract description 73
- 238000004519 manufacturing process Methods 0.000 claims abstract description 16
- 238000004590 computer program Methods 0.000 claims description 6
- 238000012986 modification Methods 0.000 claims description 3
- 230000004048 modification Effects 0.000 claims description 3
- 230000004044 response Effects 0.000 claims description 2
- 230000008569 process Effects 0.000 abstract description 30
- 238000012545 processing Methods 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 68
- 208000022976 Liberfarb syndrome Diseases 0.000 description 42
- 235000012431 wafers Nutrition 0.000 description 39
- 230000008859 change Effects 0.000 description 11
- 229920005994 diacetyl cellulose Polymers 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000001465 metallisation Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000001343 mnemonic effect Effects 0.000 description 6
- 239000000872 buffer Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000007943 implant Substances 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 239000010979 ruby Substances 0.000 description 3
- 229910001750 ruby Inorganic materials 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 101000640056 Homo sapiens Protein strawberry notch homolog 2 Proteins 0.000 description 2
- 102100033980 Protein strawberry notch homolog 2 Human genes 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 101100454361 Arabidopsis thaliana LCB1 gene Proteins 0.000 description 1
- 241000490229 Eucephalus Species 0.000 description 1
- 101100171146 Oryza sativa subsp. japonica DREB2C gene Proteins 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- PWPJGUXAGUPAHP-UHFFFAOYSA-N lufenuron Chemical compound C1=C(Cl)C(OC(F)(F)C(C(F)(F)F)F)=CC(Cl)=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F PWPJGUXAGUPAHP-UHFFFAOYSA-N 0.000 description 1
- HYIMSNHJOBLJNT-UHFFFAOYSA-N nifedipine Chemical compound COC(=O)C1=C(C)NC(C)=C(C(=O)OC)C1C1=CC=CC=C1[N+]([O-])=O HYIMSNHJOBLJNT-UHFFFAOYSA-N 0.000 description 1
- 239000002674 ointment Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- NQLVQOSNDJXLKG-UHFFFAOYSA-N prosulfocarb Chemical compound CCCN(CCC)C(=O)SCC1=CC=CC=C1 NQLVQOSNDJXLKG-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0277—Electrolithographic processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30405—Details
- H01J2237/30416—Handling of data
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
- H01J2237/31762—Computer and memory organisation
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US43009682A | 1982-09-30 | 1982-09-30 | |
| US06/430,096 | 1982-09-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1203644A true CA1203644A (fr) | 1986-04-22 |
Family
ID=23706051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000438023A Expired CA1203644A (fr) | 1982-09-30 | 1983-09-29 | Systeme de fabrication de puces reglable automatiquement |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0120089A4 (fr) |
| JP (1) | JPS59502004A (fr) |
| CA (1) | CA1203644A (fr) |
| WO (1) | WO1984001454A1 (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6110269A (ja) * | 1984-06-26 | 1986-01-17 | Nec Corp | 半導体集積回路 |
| US4718019A (en) * | 1985-06-28 | 1988-01-05 | Control Data Corporation | Election beam exposure system and an apparatus for carrying out a pattern unwinder |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3881098A (en) * | 1973-07-05 | 1975-04-29 | Gerber Scientific Instr Co | Photoexposure system |
| US4280186A (en) * | 1978-07-07 | 1981-07-21 | Tokyo Shibaura Denki Kabushiki Kaisha | Exposure apparatus using electron beams |
| JPS5511303A (en) * | 1978-07-10 | 1980-01-26 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron-beam exposure device |
| US4409686A (en) * | 1980-06-16 | 1983-10-11 | Harris Corporation | Method of serialization of dice |
| US4377849A (en) * | 1980-12-29 | 1983-03-22 | International Business Machines Corporation | Macro assembler process for automated circuit design |
-
1983
- 1983-09-27 EP EP19830903641 patent/EP0120089A4/fr not_active Withdrawn
- 1983-09-27 WO PCT/US1983/001541 patent/WO1984001454A1/fr not_active Application Discontinuation
- 1983-09-27 JP JP50348283A patent/JPS59502004A/ja active Pending
- 1983-09-29 CA CA000438023A patent/CA1203644A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| EP0120089A1 (fr) | 1984-10-03 |
| WO1984001454A1 (fr) | 1984-04-12 |
| JPS59502004A (ja) | 1984-11-29 |
| EP0120089A4 (fr) | 1985-06-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |