Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Hitachi Ltd
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Hitachi Ltd
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Publication date
Priority claimed from JP10933781Aexternal-prioritypatent/JPS5811930A/ja
Priority claimed from JP57075231Aexternal-prioritypatent/JPS58192033A/ja
Priority claimed from CA000407336Aexternal-prioritypatent/CA1176903A/fr
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to CA000455393ApriorityCriticalpatent/CA1181627A/fr
Application grantedgrantedCritical
Publication of CA1181627ApublicationCriticalpatent/CA1181627A/fr
Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same
Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt