CA1156684A - Very low expansion sealing frits - Google Patents
Very low expansion sealing fritsInfo
- Publication number
- CA1156684A CA1156684A CA000390015A CA390015A CA1156684A CA 1156684 A CA1156684 A CA 1156684A CA 000390015 A CA000390015 A CA 000390015A CA 390015 A CA390015 A CA 390015A CA 1156684 A CA1156684 A CA 1156684A
- Authority
- CA
- Canada
- Prior art keywords
- glass
- sealing
- zno
- ceramic
- cs2o
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007789 sealing Methods 0.000 title claims description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 67
- 239000011521 glass Substances 0.000 claims abstract description 41
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 28
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 24
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 24
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 24
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 24
- 239000005394 sealing glass Substances 0.000 claims abstract description 21
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 21
- KOPBYBDAPCDYFK-UHFFFAOYSA-N Cs2O Inorganic materials [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 claims abstract description 16
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910001953 rubidium(I) oxide Inorganic materials 0.000 claims abstract description 13
- AKUNKIJLSDQFLS-UHFFFAOYSA-M dicesium;hydroxide Chemical compound [OH-].[Cs+].[Cs+] AKUNKIJLSDQFLS-UHFFFAOYSA-M 0.000 claims abstract description 12
- 239000002241 glass-ceramic Substances 0.000 claims abstract description 12
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 claims abstract description 8
- 239000000919 ceramic Substances 0.000 claims abstract description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract 4
- 229910052593 corundum Inorganic materials 0.000 claims abstract 4
- 229910001845 yogo sapphire Inorganic materials 0.000 claims abstract 4
- 239000005350 fused silica glass Substances 0.000 claims description 9
- 238000002425 crystallisation Methods 0.000 claims description 7
- 230000008025 crystallization Effects 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 5
- 229910010293 ceramic material Inorganic materials 0.000 claims description 2
- 230000001747 exhibiting effect Effects 0.000 claims description 2
- 238000011065 in-situ storage Methods 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 239000011701 zinc Substances 0.000 description 11
- 150000002500 ions Chemical class 0.000 description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 9
- 229910052725 zinc Inorganic materials 0.000 description 9
- 239000002585 base Substances 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- 238000005245 sintering Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 6
- NJXPYZHXZZCTNI-UHFFFAOYSA-N 3-aminobenzonitrile Chemical compound NC1=CC=CC(C#N)=C1 NJXPYZHXZZCTNI-UHFFFAOYSA-N 0.000 description 5
- 238000007792 addition Methods 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910000500 β-quartz Inorganic materials 0.000 description 4
- CNLWCVNCHLKFHK-UHFFFAOYSA-N aluminum;lithium;dioxido(oxo)silane Chemical compound [Li+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O CNLWCVNCHLKFHK-UHFFFAOYSA-N 0.000 description 3
- 229910000174 eucryptite Inorganic materials 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 229910052644 β-spodumene Inorganic materials 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- HEHRHMRHPUNLIR-UHFFFAOYSA-N aluminum;hydroxy-[hydroxy(oxo)silyl]oxy-oxosilane;lithium Chemical compound [Li].[Al].O[Si](=O)O[Si](O)=O.O[Si](=O)O[Si](O)=O HEHRHMRHPUNLIR-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 230000007775 late Effects 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- KRTSDMXIXPKRQR-AATRIKPKSA-N monocrotophos Chemical compound CNC(=O)\C=C(/C)OP(=O)(OC)OC KRTSDMXIXPKRQR-AATRIKPKSA-N 0.000 description 2
- 229910052670 petalite Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910052642 spodumene Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910052845 zircon Inorganic materials 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 244000228957 Ferula foetida Species 0.000 description 1
- 229910000502 Li-aluminosilicate Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 241000282322 Panthera Species 0.000 description 1
- 241000282320 Panthera leo Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 239000006105 batch ingredient Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002447 crystallographic data Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000006064 precursor glass Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0036—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
- C03C10/0045—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents containing SiO2, Al2O3 and MgO as main constituents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/218,358 US4315991A (en) | 1980-12-19 | 1980-12-19 | Very low expansion sealing frits |
| US218,358 | 1980-12-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1156684A true CA1156684A (en) | 1983-11-08 |
Family
ID=22814790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000390015A Expired CA1156684A (en) | 1980-12-19 | 1981-11-13 | Very low expansion sealing frits |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4315991A (enExample) |
| EP (1) | EP0055052B1 (enExample) |
| JP (1) | JPS57123840A (enExample) |
| AU (1) | AU545657B2 (enExample) |
| CA (1) | CA1156684A (enExample) |
| DE (1) | DE3163928D1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0631995A1 (en) | 1993-06-24 | 1995-01-04 | Dentsply GmbH | Dental prosthesis |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4865436A (en) * | 1986-03-25 | 1989-09-12 | Honeywell Inc. | Low cost ring laser angular rate sensor |
| JPS6379771A (ja) * | 1986-09-22 | 1988-04-09 | 工業技術院長 | 酸化物系セラミツクス用接着剤およびその接着方法 |
| US4865451A (en) * | 1986-12-22 | 1989-09-12 | Ahonen Robert G | Silicon substrate mirror assembly for lasers |
| US4917934A (en) * | 1989-04-27 | 1990-04-17 | Corning Incorporated | Telescope mirror blank and method of production |
| US5118552A (en) * | 1991-03-04 | 1992-06-02 | Corning Incorporated | Composite article and method |
| GB9807977D0 (en) * | 1998-04-16 | 1998-06-17 | Gec Alsthom Ltd | Improvements in or relating to coating |
| US20070123410A1 (en) | 2005-11-30 | 2007-05-31 | Morena Robert M | Crystallization-free glass frit compositions and frits made therefrom for microreactor devices |
| US9976058B2 (en) * | 2015-05-29 | 2018-05-22 | Palo Alto Research Center Incorporated | High temperature seal compositions and methods of using same |
| US12326583B2 (en) | 2022-04-29 | 2025-06-10 | Eagle Technology, Llc | Methods of manufacturing mirrors |
| US11780173B1 (en) | 2022-04-29 | 2023-10-10 | Eagle Technology, Llc | Methods of manufacturing mirrors |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3006775A (en) * | 1959-09-23 | 1961-10-31 | Gen Electric | Ceramic material and method of making the same |
| GB968277A (en) * | 1960-05-02 | 1964-09-02 | English Electric Co Ltd | Improvements in or relating to bonding agents and processes and bonded assemblies produced therewith |
| US3499787A (en) * | 1965-08-12 | 1970-03-10 | Nippon Toki Kk | Method of manufacturing low thermal-expansion porcelain |
| BE756235A (fr) * | 1969-09-16 | 1971-03-16 | Corning Glass Works | Ciments en ceramique de verre |
| US3856497A (en) * | 1972-03-29 | 1974-12-24 | Ppg Industries Inc | Method of making crystallized glass |
| US3812689A (en) * | 1972-05-26 | 1974-05-28 | Corning Glass Works | Method of making glass-ceramic articles |
| US3929494A (en) * | 1972-12-22 | 1975-12-30 | Owens Illinois Inc | Sealant for glass-ceramic surfaces |
| DE2263234C3 (de) * | 1972-12-23 | 1975-07-10 | Jenaer Glaswerk Schott & Gen., 6500 Mainz | Verfahren zur Herstellung von hochfesten und temperaturwechselbeständigen Glasgegenständen durch Oberflächenkristallisation unter Ausnutzung eines lonenaustausches innerhalb des Glases |
| US3978315A (en) * | 1975-09-19 | 1976-08-31 | Corning Glass Works | Electrical heating units |
| US4111708A (en) * | 1978-01-06 | 1978-09-05 | Corning Glass Works | Machinable glasses |
-
1980
- 1980-12-19 US US06/218,358 patent/US4315991A/en not_active Expired - Lifetime
-
1981
- 1981-11-13 CA CA000390015A patent/CA1156684A/en not_active Expired
- 1981-12-09 EP EP81305804A patent/EP0055052B1/en not_active Expired
- 1981-12-09 DE DE8181305804T patent/DE3163928D1/de not_active Expired
- 1981-12-11 JP JP56199962A patent/JPS57123840A/ja active Granted
- 1981-12-15 AU AU78527/81A patent/AU545657B2/en not_active Ceased
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0631995A1 (en) | 1993-06-24 | 1995-01-04 | Dentsply GmbH | Dental prosthesis |
| US5849068A (en) * | 1993-06-24 | 1998-12-15 | Dentsply G.M.B.H. | Dental prosthesis |
| US6126732A (en) * | 1993-06-24 | 2000-10-03 | Dentsply Detrey Gmbh | Dental prosthesis |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0147411B2 (enExample) | 1989-10-13 |
| AU545657B2 (en) | 1985-07-25 |
| EP0055052A1 (en) | 1982-06-30 |
| DE3163928D1 (en) | 1984-07-05 |
| EP0055052B1 (en) | 1984-05-30 |
| JPS57123840A (en) | 1982-08-02 |
| US4315991A (en) | 1982-02-16 |
| AU7852781A (en) | 1982-06-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |