CA1071579A - End point control in plasma etching - Google Patents

End point control in plasma etching

Info

Publication number
CA1071579A
CA1071579A CA261,108A CA261108A CA1071579A CA 1071579 A CA1071579 A CA 1071579A CA 261108 A CA261108 A CA 261108A CA 1071579 A CA1071579 A CA 1071579A
Authority
CA
Canada
Prior art keywords
plasma
emission
etching
intensity
emission line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA261,108A
Other languages
English (en)
French (fr)
Inventor
Robert G. Poulsen
Gerald M. Smith
William D. Westwood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nortel Networks Ltd
Original Assignee
Northern Telecom Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Northern Telecom Ltd filed Critical Northern Telecom Ltd
Priority to CA261,108A priority Critical patent/CA1071579A/en
Priority to GB2591777A priority patent/GB1569939A/en
Priority to NL7707198A priority patent/NL7707198A/xx
Priority to DE19772736262 priority patent/DE2736262A1/de
Priority to JP52097935A priority patent/JPS6013072B2/ja
Priority to FR7727505A priority patent/FR2364593A1/fr
Priority to SE7710257A priority patent/SE439266B/sv
Application granted granted Critical
Publication of CA1071579A publication Critical patent/CA1071579A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H05H1/0025—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry by using photoelectric means

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Biochemistry (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
CA261,108A 1976-09-13 1976-09-13 End point control in plasma etching Expired CA1071579A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
CA261,108A CA1071579A (en) 1976-09-13 1976-09-13 End point control in plasma etching
GB2591777A GB1569939A (en) 1976-09-13 1977-06-21 End point control in plasma etching
NL7707198A NL7707198A (nl) 1976-09-13 1977-06-29 Werkwijze en inrichting voor de regeling van een plasma-etsproces.
DE19772736262 DE2736262A1 (de) 1976-09-13 1977-08-11 Verfahren und vorrichtung zur endpunkt-steuerung beim plasmaaetzen
JP52097935A JPS6013072B2 (ja) 1976-09-13 1977-08-17 プラズマエツチングの終点制御方法および装置
FR7727505A FR2364593A1 (fr) 1976-09-13 1977-09-12 Procede de controle du point d'arret dans une attaque par plasma et appareil mettant en oeuvre ce procede
SE7710257A SE439266B (sv) 1976-09-13 1977-09-13 Sett och anordning for astadkommande av slutpunktskontroll vid plasmaetsning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA261,108A CA1071579A (en) 1976-09-13 1976-09-13 End point control in plasma etching

Publications (1)

Publication Number Publication Date
CA1071579A true CA1071579A (en) 1980-02-12

Family

ID=4106853

Family Applications (1)

Application Number Title Priority Date Filing Date
CA261,108A Expired CA1071579A (en) 1976-09-13 1976-09-13 End point control in plasma etching

Country Status (7)

Country Link
JP (1) JPS6013072B2 (sv)
CA (1) CA1071579A (sv)
DE (1) DE2736262A1 (sv)
FR (1) FR2364593A1 (sv)
GB (1) GB1569939A (sv)
NL (1) NL7707198A (sv)
SE (1) SE439266B (sv)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54142143A (en) * 1978-04-27 1979-11-06 Anelva Corp Dry type etching device
FR2487574A1 (fr) * 1980-07-24 1982-01-29 Efcis Procede et dispositif d'attaque sous plasma d'une couche mince
US4415402A (en) * 1981-04-02 1983-11-15 The Perkin-Elmer Corporation End-point detection in plasma etching or phosphosilicate glass
JPS5839781A (ja) * 1981-09-02 1983-03-08 Toshiba Corp 反応性イオンエツチング装置
JPS58100740A (ja) * 1981-12-11 1983-06-15 Hitachi Ltd プラズマ分布モニタ
US4482424A (en) * 1983-05-06 1984-11-13 At&T Bell Laboratories Method for monitoring etching of resists by monitoring the flouresence of the unetched material
DE4016211A1 (de) * 1990-05-19 1991-11-21 Convac Gmbh Verfahren zur ueberwachung und steuerung eines aetzvorgangs und vorrichtung hierfuer
WO2000003232A1 (en) * 1998-07-11 2000-01-20 Vorgem Limited Improved process monitor
DE19860152C1 (de) * 1998-12-24 2000-06-15 Temic Semiconductor Gmbh Verfahren zur Erkennung von Lackverbrennungen
DE102014107385A1 (de) * 2014-05-26 2015-11-26 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung
GB201611652D0 (en) * 2016-07-04 2016-08-17 Spts Technologies Ltd Method of detecting a condition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US366492A (en) * 1887-07-12 Ash-sifter
JPS529353B2 (sv) * 1972-04-18 1977-03-15
JPS5135639A (ja) * 1974-09-20 1976-03-26 Hitachi Ltd Himakunopurazumaetsuchingushorishutenkenshutsuho
JPS5421711B2 (sv) * 1975-01-20 1979-08-01
JPS5326674A (en) * 1976-08-25 1978-03-11 Hitachi Ltd Plasma etching

Also Published As

Publication number Publication date
JPS6013072B2 (ja) 1985-04-04
GB1569939A (en) 1980-06-25
FR2364593A1 (fr) 1978-04-07
SE7710257L (sv) 1978-03-14
JPS5334641A (en) 1978-03-31
DE2736262A1 (de) 1978-03-16
SE439266B (sv) 1985-06-10
NL7707198A (nl) 1978-03-15

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