CA1064852A - Method for evaluating a system for electrodeposition of metals - Google Patents

Method for evaluating a system for electrodeposition of metals

Info

Publication number
CA1064852A
CA1064852A CA268,900A CA268900A CA1064852A CA 1064852 A CA1064852 A CA 1064852A CA 268900 A CA268900 A CA 268900A CA 1064852 A CA1064852 A CA 1064852A
Authority
CA
Canada
Prior art keywords
current
voltage
set forth
solution
electrolytic solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA268,900A
Other languages
English (en)
French (fr)
Inventor
Thomas J. O'keefe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teck Metals Ltd
Original Assignee
Teck Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teck Metals Ltd filed Critical Teck Metals Ltd
Application granted granted Critical
Publication of CA1064852A publication Critical patent/CA1064852A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/416Systems
    • G01N27/48Systems using polarography, i.e. measuring changes in current under a slowly-varying voltage

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electrolytic Production Of Metals (AREA)
CA268,900A 1975-12-31 1976-12-30 Method for evaluating a system for electrodeposition of metals Expired CA1064852A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US64560975A 1975-12-31 1975-12-31

Publications (1)

Publication Number Publication Date
CA1064852A true CA1064852A (en) 1979-10-23

Family

ID=24589715

Family Applications (1)

Application Number Title Priority Date Filing Date
CA268,900A Expired CA1064852A (en) 1975-12-31 1976-12-30 Method for evaluating a system for electrodeposition of metals

Country Status (2)

Country Link
US (1) US4146437A (US07534539-20090519-C00280.png)
CA (1) CA1064852A (US07534539-20090519-C00280.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0437921A2 (en) * 1989-10-24 1991-07-24 Inco Limited Cyclic voltamperemetry

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BG26638A1 (US07534539-20090519-C00280.png) * 1978-06-06 1979-05-15
US4336111A (en) * 1978-11-02 1982-06-22 The Boeing Company Method for determining the strength of a metal processing solution
US4326940A (en) * 1979-05-21 1982-04-27 Rohco Incorporated Automatic analyzer and control system for electroplating baths
US4324621A (en) * 1979-12-26 1982-04-13 Cominco Ltd. Method and apparatus for controlling the quality of electrolytes
CA1179751A (en) * 1982-01-07 1984-12-18 Robert C. Kerby Controlling metal electro-deposition using electrolyte containing, two polarizing agents
US4581122A (en) * 1982-06-09 1986-04-08 Energy Development Associates, Inc. State of charge analytical apparatus
US4474649A (en) * 1982-06-21 1984-10-02 Asarco Incorporated Method of thiourea addition of electrolytic solutions useful for copper refining
US4479852A (en) * 1983-01-21 1984-10-30 International Business Machines Corporation Method for determination of concentration of organic additive in plating bath
EP0137776B1 (en) * 1983-02-28 1988-04-06 Asarco Incorporated Method of maintaining and testing for proper concentrations of thiourea in copper refining electrolysis cells
US4789445A (en) * 1983-05-16 1988-12-06 Asarco Incorporated Method for the electrodeposition of metals
US4725339A (en) * 1984-02-13 1988-02-16 International Business Machines Corporation Method for monitoring metal ion concentrations in plating baths
TR22348A (tr) * 1984-06-14 1987-02-23 Asorco Inc Bakir saflandirilmasinda yararh elektrolit coezeltilerine tiouere ilave etme yoentemi
DE3668915D1 (de) * 1985-02-28 1990-03-15 Uemura Kogyo Kk Verfahren und vorrichtung zum feststellen des beginns des stromlosen plattierungsvorgangs.
US4631116A (en) * 1985-06-05 1986-12-23 Hughes Aircraft Company Method of monitoring trace constituents in plating baths
US4654126A (en) * 1985-10-07 1987-03-31 International Business Machines Corporation Process for determining the plating activity of an electroless plating bath
US4820643A (en) * 1986-03-10 1989-04-11 International Business Machines Corporation Process for determining the activity of a palladium-tin catalyst
US4917774A (en) * 1986-04-24 1990-04-17 Shipley Company Inc. Method for analyzing additive concentration
US4917777A (en) * 1986-04-24 1990-04-17 Shipley Company Inc. Method for analyzing additive concentration
US4908242A (en) * 1986-10-31 1990-03-13 Kollmorgen Corporation Method of consistently producing a copper deposit on a substrate by electroless deposition which deposit is essentially free of fissures
US4812210A (en) * 1987-10-16 1989-03-14 The United States Department Of Energy Measuring surfactant concentration in plating solutions
US5071527A (en) * 1990-06-29 1991-12-10 University Of Dayton Complete oil analysis technique
JP3037971B2 (ja) * 1990-07-04 2000-05-08 アンリツ株式会社 アジ検出方法
US5223118A (en) * 1991-03-08 1993-06-29 Shipley Company Inc. Method for analyzing organic additives in an electroplating bath
US5192403A (en) * 1991-05-16 1993-03-09 International Business Machines Corporation Cyclic voltammetric method for the measurement of concentrations of subcomponents of plating solution additive mixtures
US5273641A (en) * 1992-01-21 1993-12-28 Inco Limited Electrode and method for measuring levelling power
US5236571A (en) * 1992-01-21 1993-08-17 Inco Limited Electrode and method for measuring levelling power
US5352350A (en) * 1992-02-14 1994-10-04 International Business Machines Corporation Method for controlling chemical species concentration
US5389215A (en) * 1992-11-05 1995-02-14 Nippon Telegraph And Telephone Corporation Electrochemical detection method and apparatus therefor
CA2087801C (en) * 1993-01-21 1996-08-13 Noranda Ipco Inc. Method and apparatus for on-line monitoring the quality of a purified metal sulphate solution
US5298132A (en) * 1993-03-25 1994-03-29 Hughes Aircraft Company Method for monitoring purification treatment in plating baths
EP0665431A3 (de) * 1994-01-14 1996-11-13 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Detektion von Nitrotoluolen.
US5889200A (en) * 1996-08-30 1999-03-30 The University Of Dayton Tandem technique for fluid monitoring
US5933016A (en) * 1996-08-30 1999-08-03 The University Of Dayton Single electrode conductivity technique
DE19748124C1 (de) * 1997-10-31 1999-03-18 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Detektion schwerflüchtiger Substanzen
JP2002506531A (ja) * 1998-05-01 2002-02-26 セミトウール・インコーポレーテツド 電気メッキ浴中の添加物の測定法
US6365033B1 (en) * 1999-05-03 2002-04-02 Semitoof, Inc. Methods for controlling and/or measuring additive concentration in an electroplating bath
US6814855B2 (en) * 1998-05-01 2004-11-09 Semitool, Inc. Automated chemical management system having improved analysis unit
USRE38931E1 (en) * 1998-05-01 2006-01-10 Semitool, Inc. Methods for controlling and/or measuring additive concentration in an electroplating bath
US6899805B2 (en) * 1998-05-01 2005-05-31 Semitool, Inc. Automated chemical management system executing improved electrolyte analysis method
DE69929607T2 (de) 1998-06-30 2006-07-27 Semitool, Inc., Kalispell Metallisierungsstrukturen für mikroelektronische anwendungen und verfahren zur herstellung dieser strukturen
FI109296B (fi) * 1999-12-21 2002-06-28 Outokumpu Oy Menetelmä kuparin elektrolyyttiseksi puhdistamiseksi
US6592736B2 (en) 2001-07-09 2003-07-15 Semitool, Inc. Methods and apparatus for controlling an amount of a chemical constituent of an electrochemical bath
JP2004537653A (ja) * 2001-08-14 2004-12-16 マグパワー・システムズ・インコーポレイテッド 亜鉛電解採取のための水素発生抑制添加剤
US6991710B2 (en) * 2002-02-22 2006-01-31 Semitool, Inc. Apparatus for manually and automatically processing microelectronic workpieces
US20100098863A1 (en) * 2003-03-12 2010-04-22 University Of Missouri Process for spontaneous deposition from an organic solution
JP2005082843A (ja) * 2003-09-05 2005-03-31 Ebara Corp 電解液管理方法及び管理装置
US20050236280A1 (en) * 2004-04-27 2005-10-27 Jianwen Han Methods for analyzing inorganic components of an electrolytic solution, and /or cleaning an electrochemical analytical cell
US9864345B2 (en) * 2014-01-31 2018-01-09 Technic, Inc. Eliminating temperature variation effects to improve accuracy of electroplating bath monitoring

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3925168A (en) * 1972-07-26 1975-12-09 Anaconda American Brass Co Method of monitoring the active roughening agent in a copper plating bath

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0437921A2 (en) * 1989-10-24 1991-07-24 Inco Limited Cyclic voltamperemetry
EP0437921A3 (en) * 1989-10-24 1991-12-11 Inco Limited Cyclic voltamperemetry

Also Published As

Publication number Publication date
US4146437B1 (US07534539-20090519-C00280.png) 1987-07-14
US4146437A (en) 1979-03-27

Similar Documents

Publication Publication Date Title
CA1064852A (en) Method for evaluating a system for electrodeposition of metals
Potje‐Kamloth et al. Electrochemically prepared insulation for carbon fiber microelectrodes
KR20020034894A (ko) 도금조 분석 방법
JPS6019455B2 (ja) 有機レベリング剤の有効量を決定する方法
JPS62273444A (ja) 添加物濃度を分析する方法
Mackinnon et al. The effect of lead on zinc deposit structures obtained from high purity synthetic and industrial acid sulphate electrolytes
US4217189A (en) Method and apparatus for control of electrowinning of zinc
EP1471348A1 (en) Electrochemical method for determining a quantity of an organic component in an electroplating bath
CA1179751A (en) Controlling metal electro-deposition using electrolyte containing, two polarizing agents
Madou et al. Anodic Processes at the n‐and p‐Type GaP Electrodes
Elder The electrochemical behavior of zinc in alkaline media
Ai et al. Preparation of Fluorine‐Doped Lead Dioxide Modified Electrodes for Electroanalytical Applications
US5124011A (en) Cyclic voltammetry
Kötz et al. Probe beam deflection for the analysis of ion fluxes at the solid/liquid interface
Vertes et al. Oxidation on the nickel hydroxide electrode
Dumont et al. Dissolution and passivation processes in the corrosion of copper and nickel in KF. 2HF at 85 C
US4693790A (en) Method for monitoring the quality of ZnSO4 electrolyte containing Sb (V)
Yaniv et al. Electrodeposition and stripping at graphite cloth electrodes
Hills et al. The adsorption of the hexafluorophosphate ion at the non-aqueous solution-mercury interface
SU1833814A1 (ru) Boльtamпepometpичeckий cпocoб oпpeдeлehия иoдat-иohob
Hosny et al. Hull cell technique for evaluating zinc sulfate electrolytes
JPS6260476B2 (US07534539-20090519-C00280.png)
Smith et al. Cyclic voltammetry at metal electrodes
Antula et al. Investigation of the cathodic reduction of lithium and arsenic ions on monocrystalline silicon by cyclic voltammetry
Metikoš‐Huković et al. Determination of Polarization resistance and corrosion rate by using pulse method, polarization curves and AAS