Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nortel Networks Ltd
Original Assignee
Northern Telecom Ltd
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Filing date
Publication date
Application filed by Northern Telecom LtdfiledCriticalNorthern Telecom Ltd
Priority to CA265,953ApriorityCriticalpatent/CA1057633A/fr
Application grantedgrantedCritical
Publication of CA1057633ApublicationCriticalpatent/CA1057633A/fr
Low pressure anisotropic etch process for tantalum silicide or titanium silicide layer formed over polysilicon layer deposited on silicon oxide layer on semiconductor wafer
Méthode et procédé pour l'attaque du bioxyde de silicium utilisant du nitrure de silicium ou du bioxyde de silicium riche en silicium comme barière d'attaque