CA1035472A - Amelioration dans le developpement de films a revetement isolant sensible au faisceau electronique - Google Patents

Amelioration dans le developpement de films a revetement isolant sensible au faisceau electronique

Info

Publication number
CA1035472A
CA1035472A CA232A CA232A CA1035472A CA 1035472 A CA1035472 A CA 1035472A CA 232 A CA232 A CA 232A CA 232 A CA232 A CA 232A CA 1035472 A CA1035472 A CA 1035472A
Authority
CA
Canada
Prior art keywords
electron
resist films
sensitive resist
improved development
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA232A
Other languages
English (en)
Inventor
Lucian A. Barton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Application granted granted Critical
Publication of CA1035472A publication Critical patent/CA1035472A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
CA232A 1974-09-16 1975-07-23 Amelioration dans le developpement de films a revetement isolant sensible au faisceau electronique Expired CA1035472A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/506,444 US3961101A (en) 1974-09-16 1974-09-16 Process for improved development of electron-beam-sensitive resist films

Publications (1)

Publication Number Publication Date
CA1035472A true CA1035472A (fr) 1978-07-25

Family

ID=24014616

Family Applications (1)

Application Number Title Priority Date Filing Date
CA232A Expired CA1035472A (fr) 1974-09-16 1975-07-23 Amelioration dans le developpement de films a revetement isolant sensible au faisceau electronique

Country Status (7)

Country Link
US (1) US3961101A (fr)
JP (1) JPS5159634A (fr)
CA (1) CA1035472A (fr)
DE (1) DE2539691A1 (fr)
FR (1) FR2284907A1 (fr)
GB (1) GB1513388A (fr)
NL (1) NL7510828A (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4359520A (en) * 1977-11-23 1982-11-16 International Business Machines Corporation Enhancement of resist development
CA1120763A (fr) * 1977-11-23 1982-03-30 James A. Carothers Amelioration du developpement a resist
US4415653A (en) * 1981-05-07 1983-11-15 Honeywell Inc. Method of making sensitive positive electron beam resists
US4409319A (en) * 1981-07-15 1983-10-11 International Business Machines Corporation Electron beam exposed positive resist mask process
GB2166254A (en) * 1984-10-08 1986-04-30 British Telecomm Method for the production of a metal patterning mask
US4613561A (en) * 1984-10-17 1986-09-23 James Marvin Lewis Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution
JPH0721640B2 (ja) * 1984-11-19 1995-03-08 富士通株式会社 レジスト現像方法
JPS61156125A (ja) * 1984-12-28 1986-07-15 Fujitsu Ltd 光ディスク用原盤のプリグルーブパターン形成方法
JPS622254A (ja) * 1985-06-27 1987-01-08 Fuji Photo Film Co Ltd 感光材料の現像方法
US4710449A (en) * 1986-01-29 1987-12-01 Petrarch Systems, Inc. High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants
US5783367A (en) * 1989-09-20 1998-07-21 Fujitsu Limited Process for production of semiconductor device and resist developing apparatus used therein
KR940006332B1 (ko) * 1989-09-20 1994-07-16 후지쓰 가부시끼가이샤 반도체장치의 제조방법
EP0698825A1 (fr) * 1994-07-29 1996-02-28 AT&T Corp. Résiste sensible à l'énergie et procédé pour fabriquer un objet en utilisant ce résiste
JPH08235645A (ja) * 1995-02-28 1996-09-13 Pioneer Video Corp 光記録媒体用現像方法及び光記録媒体用現像装置
US7666579B1 (en) * 2001-09-17 2010-02-23 Serenity Technologies, Inc. Method and apparatus for high density storage of analog data in a durable medium
JP2006344310A (ja) * 2005-06-09 2006-12-21 Sony Corp 現像方法および現像装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE620660A (fr) * 1961-07-28
GB1115813A (en) * 1965-06-01 1968-05-29 Agfa Gevaert Nv Method for recording and reproducing information by surface modification of a polymeric composition
GB1115245A (en) * 1965-06-01 1968-05-29 Agfa Gevaert Nv Method for recording and reproducing information by surface deformation of a polymeric composition
US3482973A (en) * 1965-10-01 1969-12-09 Xerox Corp Imaging system
US3707373A (en) * 1969-03-17 1972-12-26 Eastman Kodak Co Lithographic plate developers
US3639185A (en) * 1969-06-30 1972-02-01 Ibm Novel etchant and process for etching thin metal films
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US3674591A (en) * 1969-11-28 1972-07-04 Stromberg Datagraphix Inc Surface deformation imaging process
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
US3852771A (en) * 1973-02-12 1974-12-03 Rca Corp Electron beam recording process

Also Published As

Publication number Publication date
FR2284907A1 (fr) 1976-04-09
JPS5159634A (en) 1976-05-24
GB1513388A (en) 1978-06-07
NL7510828A (nl) 1976-03-18
US3961101A (en) 1976-06-01
DE2539691A1 (de) 1976-03-25

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