BRPI0920744A2 - método para produção de sio2 de alta pureza a partir de soluções de silicato. - Google Patents
método para produção de sio2 de alta pureza a partir de soluções de silicato.Info
- Publication number
- BRPI0920744A2 BRPI0920744A2 BRPI0920744A BRPI0920744A BRPI0920744A2 BR PI0920744 A2 BRPI0920744 A2 BR PI0920744A2 BR PI0920744 A BRPI0920744 A BR PI0920744A BR PI0920744 A BRPI0920744 A BR PI0920744A BR PI0920744 A2 BRPI0920744 A2 BR PI0920744A2
- Authority
- BR
- Brazil
- Prior art keywords
- production
- high purity
- silicate solutions
- purity sio2
- sio2
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
- C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008049597 | 2008-09-30 | ||
US11112508P | 2008-11-04 | 2008-11-04 | |
PCT/EP2009/062508 WO2010037705A1 (de) | 2008-09-30 | 2009-09-28 | Verfahren zur herstellung von hochreinem sio2 aus silikatlösungen |
Publications (1)
Publication Number | Publication Date |
---|---|
BRPI0920744A2 true BRPI0920744A2 (pt) | 2015-12-22 |
Family
ID=41404576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0920744A BRPI0920744A2 (pt) | 2008-09-30 | 2009-09-28 | método para produção de sio2 de alta pureza a partir de soluções de silicato. |
Country Status (12)
Country | Link |
---|---|
US (1) | US20110244238A1 (pt) |
EP (1) | EP2331463A1 (pt) |
JP (1) | JP2012504102A (pt) |
KR (1) | KR20110076904A (pt) |
CN (1) | CN102171144A (pt) |
AU (1) | AU2009299917A1 (pt) |
BR (1) | BRPI0920744A2 (pt) |
CA (1) | CA2738561A1 (pt) |
EA (1) | EA201100567A1 (pt) |
TW (1) | TW201029925A (pt) |
WO (1) | WO2010037705A1 (pt) |
ZA (1) | ZA201102325B (pt) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006024590A1 (de) | 2006-05-26 | 2007-11-29 | Degussa Gmbh | Hydrophile Kieselsäure für Dichtungsmassen |
DE102007052269A1 (de) * | 2007-11-02 | 2009-05-07 | Evonik Degussa Gmbh | Fällungskieselsäuren für lagerstabile RTV-1 Siliconkautschukformulierungen ohne Stabilisator |
DE102008040264A1 (de) * | 2008-07-09 | 2010-01-14 | Evonik Degussa Gmbh | Schweißaufnehmende Schuheinlegesohle mit verbesserter Schweißaufnahme |
JP5501117B2 (ja) * | 2010-06-28 | 2014-05-21 | 日揮触媒化成株式会社 | 透明被膜付基材および透明被膜形成用塗布液 |
DE102011017783A1 (de) | 2011-04-29 | 2012-10-31 | Evonik Degussa Gmbh | Verfahren zur Herstellung wässriger kolloidaler Silikasole hoher Reinheit aus Alkalimetallsilikatlösungen |
EP2678399B1 (de) | 2011-02-22 | 2016-07-13 | Evonik Degussa GmbH | Verfahren zur herstellung wässriger kolloidaler silikasole hoher reinheit aus alkalimetallsilikatlösungen |
DE102011004534A1 (de) | 2011-02-22 | 2012-08-23 | Evonik Degussa Gmbh | Verfahren zur Herstellung wässriger kolloidaler Silikasole hoher Reinheit aus Alkalimetallsilikatlösungen |
DE102011004532A1 (de) * | 2011-02-22 | 2012-08-23 | Evonik Degussa Gmbh | Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen |
DE102011004750A1 (de) | 2011-02-25 | 2012-08-30 | Evonik Degussa Gmbh | Vorrichtung und Verfahren zum Verarbeiten eines SiO2-haltigen Materials |
DE102011007708A1 (de) | 2011-04-19 | 2012-10-25 | Sgl Carbon Se | Tiegelanordnung |
CN102249249A (zh) * | 2011-06-22 | 2011-11-23 | 武汉大学 | 一种采用熔盐法提纯石英砂的方法 |
DE102012202587A1 (de) * | 2012-02-21 | 2013-08-22 | Evonik Degussa Gmbh | Verfahren zur Herstellung von hochreinem SiO2 |
DE102012218823A1 (de) * | 2012-10-16 | 2014-04-17 | Evonik Degussa Gmbh | Verfahren zur Herstellung von hochreinem Siliziumnitrid |
JP2014141400A (ja) * | 2012-12-28 | 2014-08-07 | Taiheiyo Cement Corp | シリカとカーボンの混合物の製造方法 |
CN103130194B (zh) * | 2013-03-25 | 2015-07-08 | 北京乾润开元环保科技有限公司 | 一种水冷式臭氧发生器地电极 |
JP6647575B2 (ja) * | 2016-09-13 | 2020-02-14 | 国立研究開発法人物質・材料研究機構 | 層状珪酸塩粉粒体及びその製造方法 |
US10690858B2 (en) | 2018-02-28 | 2020-06-23 | Corning Incorporated | Evanescent optical couplers employing polymer-clad fibers and tapered ion-exchanged optical waveguides |
CN108910899A (zh) * | 2018-08-03 | 2018-11-30 | 上海硅硅生物技术有限公司 | 一种简易的偏硅酸制备方法 |
US10585242B1 (en) | 2018-09-28 | 2020-03-10 | Corning Research & Development Corporation | Channel waveguides with bend compensation for low-loss optical transmission |
CN113955761B (zh) * | 2021-11-17 | 2022-05-24 | 金三江(肇庆)硅材料股份有限公司 | 一种防团聚增稠型二氧化硅及其制备方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61150366A (ja) * | 1984-12-25 | 1986-07-09 | Nec Corp | Mis型メモリ−セル |
JPS6212608A (ja) * | 1985-07-11 | 1987-01-21 | Nippon Chem Ind Co Ltd:The | 高純度シリカ及びその製造方法 |
JPS62270424A (ja) * | 1986-05-15 | 1987-11-24 | Nippon Sekiei Glass Kk | 超高純度石英ガラス粉末の製造法 |
JPH0796447B2 (ja) * | 1986-06-13 | 1995-10-18 | モ−ゼス レイク インダストリ−ズ インコ−ポレイテツド | 高純度シリカの製造方法 |
US4973462A (en) * | 1987-05-25 | 1990-11-27 | Kawatetsu Mining Company, Ltd. | Process for producing high purity silica |
JP2545282B2 (ja) * | 1989-04-17 | 1996-10-16 | 日東化学工業株式会社 | 球状シリカ粒子の製造方法 |
US5028407A (en) * | 1990-01-25 | 1991-07-02 | International Minerals & Chemical Corp. | Method of production of high purity fusible silica |
DE10211958A1 (de) * | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
US20060110307A1 (en) * | 2004-11-24 | 2006-05-25 | Mcgill Patrick D | High-cleaning silica materials made via product morphology control and dentifrice containing such |
-
2009
- 2009-09-28 US US13/121,751 patent/US20110244238A1/en not_active Abandoned
- 2009-09-28 AU AU2009299917A patent/AU2009299917A1/en not_active Abandoned
- 2009-09-28 JP JP2011529518A patent/JP2012504102A/ja active Pending
- 2009-09-28 TW TW098132733A patent/TW201029925A/zh unknown
- 2009-09-28 EA EA201100567A patent/EA201100567A1/ru unknown
- 2009-09-28 CN CN200980138724XA patent/CN102171144A/zh active Pending
- 2009-09-28 KR KR1020117007194A patent/KR20110076904A/ko not_active Application Discontinuation
- 2009-09-28 WO PCT/EP2009/062508 patent/WO2010037705A1/de active Application Filing
- 2009-09-28 EP EP09783467A patent/EP2331463A1/de not_active Withdrawn
- 2009-09-28 CA CA2738561A patent/CA2738561A1/en not_active Abandoned
- 2009-09-28 BR BRPI0920744A patent/BRPI0920744A2/pt not_active Application Discontinuation
-
2011
- 2011-03-29 ZA ZA2011/02325A patent/ZA201102325B/en unknown
Also Published As
Publication number | Publication date |
---|---|
ZA201102325B (en) | 2011-12-28 |
WO2010037705A1 (de) | 2010-04-08 |
EP2331463A1 (de) | 2011-06-15 |
KR20110076904A (ko) | 2011-07-06 |
AU2009299917A1 (en) | 2010-04-08 |
EA201100567A1 (ru) | 2011-10-31 |
JP2012504102A (ja) | 2012-02-16 |
TW201029925A (en) | 2010-08-16 |
CN102171144A (zh) | 2011-08-31 |
CA2738561A1 (en) | 2010-04-08 |
US20110244238A1 (en) | 2011-10-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
B11Y | Definitive dismissal acc. article 33 of ipl - extension of time limit for request of examination expired |