BRPI0918447A2 - filmes contendo um gás oxigenado infundido e métodos para a sua preparação - Google Patents
filmes contendo um gás oxigenado infundido e métodos para a sua preparaçãoInfo
- Publication number
- BRPI0918447A2 BRPI0918447A2 BRPI0918447A BRPI0918447A BRPI0918447A2 BR PI0918447 A2 BRPI0918447 A2 BR PI0918447A2 BR PI0918447 A BRPI0918447 A BR PI0918447A BR PI0918447 A BRPI0918447 A BR PI0918447A BR PI0918447 A2 BRPI0918447 A2 BR PI0918447A2
- Authority
- BR
- Brazil
- Prior art keywords
- preparation
- methods
- oxygen gas
- films containing
- infused oxygen
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
- B32B27/365—Layered products comprising a layer of synthetic resin comprising polyesters comprising polycarbonates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B64—AIRCRAFT; AVIATION; COSMONAUTICS
- B64G—COSMONAUTICS; VEHICLES OR EQUIPMENT THEREFOR
- B64G1/00—Cosmonautic vehicles
- B64G1/22—Parts of, or equipment specially adapted for fitting in or to, cosmonautic vehicles
- B64G1/226—Special coatings for spacecraft
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G02B1/105—
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0045—Recording
- G11B7/00452—Recording involving bubble or bump forming
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B7/2437—Non-metallic elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System
- H01L21/2855—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic System by physical means, e.g. sputtering, evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2509/00—Household appliances
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2535/00—Medical equipment, e.g. bandage, prostheses, catheter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2605/00—Vehicles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/282—Carbides, silicides
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24318—Non-metallic elements
- G11B2007/24328—Carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Remote Sensing (AREA)
- Aviation & Aerospace Engineering (AREA)
- Optics & Photonics (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electrochemistry (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US19192508P | 2008-09-12 | 2008-09-12 | |
PCT/US2009/045355 WO2010030419A1 (en) | 2008-09-12 | 2009-05-27 | Films containing an infused oxygenated gas and methods for their preparation |
Publications (1)
Publication Number | Publication Date |
---|---|
BRPI0918447A2 true BRPI0918447A2 (pt) | 2018-08-28 |
Family
ID=42005410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0918447A BRPI0918447A2 (pt) | 2008-09-12 | 2009-05-27 | filmes contendo um gás oxigenado infundido e métodos para a sua preparação |
Country Status (9)
Country | Link |
---|---|
US (1) | US20100068529A1 (pt) |
EP (1) | EP2334841A4 (pt) |
JP (1) | JP2012502188A (pt) |
KR (1) | KR20110055729A (pt) |
CN (1) | CN102171381A (pt) |
AU (1) | AU2009292147A1 (pt) |
BR (1) | BRPI0918447A2 (pt) |
RU (1) | RU2011113686A (pt) |
WO (1) | WO2010030419A1 (pt) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2511229B1 (de) * | 2011-04-12 | 2017-03-08 | GFD Gesellschaft für Diamantprodukte mbH | Flankenverstärktes mikromechanisches Bauteil |
RU2557934C2 (ru) * | 2013-07-15 | 2015-07-27 | Федеральное государственное бюджетное учреждение науки Институт электрофизики Уральского отделения Российской академии наук (ИЭФ УрО РАН) | Способ получения на изделиях из твердых сплавов двухфазного нанокомпозитного покрытия, состоящего из нанокластеров карбида титана, распределенных в аморфной матрице |
Family Cites Families (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4430659A (en) * | 1981-02-13 | 1984-02-07 | Minnesota Mining And Manufacturing Company | Protuberant optical recording medium |
DE3364607D1 (en) * | 1982-03-15 | 1986-08-28 | Toshiba Kk | Optical type information recording medium |
DE3377173D1 (en) * | 1982-09-29 | 1988-07-28 | Toshiba Kk | Radiation-sensitive carrier body utilized as stamper structure |
US4499477A (en) * | 1983-03-14 | 1985-02-12 | Minnesota Mining And Manufacturing Company | Cover assembly for optical recording medium |
JPS6387283A (ja) * | 1986-09-30 | 1988-04-18 | Toshiba Corp | 光学的情報記録媒体 |
US4726008A (en) * | 1986-10-20 | 1988-02-16 | Eastman Kodak Company | Optical disk assembly |
US4833036A (en) * | 1988-03-21 | 1989-05-23 | Arco Chemical Technology, Inc. | Polyalkylene carbonate hot melt adhesive |
JPH02132874U (pt) * | 1989-04-12 | 1990-11-05 | ||
US5188875A (en) * | 1989-08-25 | 1993-02-23 | Mitsui Petrochemical Industries, Ltd. | Information recording medium and adhesive composition therefor |
JP2543230B2 (ja) * | 1990-06-20 | 1996-10-16 | 松下電器産業株式会社 | 光学情報記録媒体 |
US5268217A (en) * | 1990-09-27 | 1993-12-07 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
US5169676A (en) * | 1991-05-16 | 1992-12-08 | The United States Of America As Represented By The Secretary Of The Navy | Control of crystallite size in diamond film chemical vapor deposition |
US5294518A (en) * | 1992-05-01 | 1994-03-15 | International Business Machines Corporation | Amorphous write-read optical storage memory |
US5302493A (en) * | 1992-06-30 | 1994-04-12 | The Dow Chemical Company | Method for the preparation of optical recording media containing uniform partially oxidized metal layer |
EP0605891A3 (en) * | 1993-01-08 | 1996-08-07 | Eastman Kodak Co | Optical recording element using low absorption materials. |
US6210769B1 (en) * | 1993-11-08 | 2001-04-03 | Samuel Manu-Teeh, Inc. | Plastic strapping with modified surface characteristics |
JP3068416B2 (ja) * | 1994-08-26 | 2000-07-24 | 日本電気株式会社 | 情報記録媒体 |
WO1996017344A1 (fr) * | 1994-11-28 | 1996-06-06 | Asahi Kasei Kogyo Kabushiki Kaisha | Support d'enregistrement optique |
TW366367B (en) * | 1995-01-26 | 1999-08-11 | Ibm | Sputter deposition of hydrogenated amorphous carbon film |
US5993969A (en) * | 1997-01-30 | 1999-11-30 | Sandia Corporation | Carbon film electrodes for super capacitor applications |
US6066399A (en) * | 1997-03-19 | 2000-05-23 | Sanyo Electric Co., Ltd. | Hard carbon thin film and method of forming the same |
US6168682B1 (en) * | 1998-02-10 | 2001-01-02 | 3M Innovative Properties Company | Method of manufacturing an optical recording medium |
US6349076B1 (en) * | 1998-06-24 | 2002-02-19 | Seagate Technology Llc | Magneto-optical recording medium having a protective carbon layer |
US6338933B1 (en) * | 1998-06-25 | 2002-01-15 | Spectradisc Corporation | Methods and apparatus for rendering an optically encoded medium unreadable |
JP4174638B2 (ja) * | 1998-09-28 | 2008-11-05 | 株式会社ブリヂストン | スパッタ皮膜の屈折率コントロール方法 |
JP4030205B2 (ja) * | 1998-10-26 | 2008-01-09 | 日立マクセル株式会社 | 情報記録媒体及び情報記録装置 |
US6352753B2 (en) * | 1998-11-10 | 2002-03-05 | Toray Industries, Inc. | Optical recording medium |
US6454983B1 (en) * | 1998-12-18 | 2002-09-24 | Eastman Chemical Company | Single screw extrusion of polymers |
US7050385B2 (en) * | 2000-02-08 | 2006-05-23 | Tosoh Corporation | Optical recording medium |
US6677104B2 (en) * | 2000-02-10 | 2004-01-13 | Tdk Corporation | Optical information medium |
WO2001068790A2 (de) * | 2000-03-16 | 2001-09-20 | Mat Gmbh Dresden | Reibungsarme und verschleissmindernde schutzschichten und verfahren zu ihrer abscheidung |
JP2001344824A (ja) * | 2000-03-30 | 2001-12-14 | Tdk Corp | 光記録媒体の製造方法および光記録媒体 |
US6753042B1 (en) * | 2000-05-02 | 2004-06-22 | Itac Limited | Diamond-like carbon thin film coating process |
JP2002038268A (ja) * | 2000-05-19 | 2002-02-06 | Sanyo Electric Co Ltd | 炭素被膜及びその製造方法 |
US6630283B1 (en) * | 2000-09-07 | 2003-10-07 | 3M Innovative Properties Company | Photothermographic and photographic elements having a transparent support having antihalation properties and properties for reducing woodgrain |
WO2002023544A1 (fr) * | 2000-09-12 | 2002-03-21 | Tdk Corporation | Support d'enregistrement optique |
JP2003034081A (ja) * | 2000-09-14 | 2003-02-04 | Ricoh Co Ltd | 相変化型光情報記録媒体 |
EP1467352B1 (en) * | 2000-09-28 | 2008-01-09 | Ricoh Company, Ltd. | Phase change optical information recording medium and method for manufacturing same |
TW527592B (en) * | 2001-03-19 | 2003-04-11 | Matsushita Electric Ind Co Ltd | Optical information recording media, and the manufacturing method and record regeneration method of the same |
WO2003036632A1 (fr) * | 2001-10-19 | 2003-05-01 | Matsushita Electric Industrial Co., Ltd. | Support d'enregistrement d'informations optique et procede de fabrication de celui-ci |
DE60310282T2 (de) * | 2002-03-01 | 2007-05-10 | Dai Nippon Printing Co., Ltd. | Thermisch übertragbares Bildschutzblatt, Verfahren zur Schutzschicht-Bildung und durch das Verfahren hergestellte Aufnahme |
TWI260004B (en) * | 2002-03-04 | 2006-08-11 | Ritek Corp | Write-once high-density CD-recordable layer structure and manufacturing method |
CN1290106C (zh) * | 2002-03-07 | 2006-12-13 | 株式会社理光 | 光记录媒体及其制造方法 |
US7008681B2 (en) * | 2002-03-15 | 2006-03-07 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and manufacturing method and recording/reproducing method for the same |
JP2004013947A (ja) * | 2002-06-04 | 2004-01-15 | Victor Co Of Japan Ltd | 情報記録担体、再生装置、記録装置、記録再生装置、再生方法、記録方法及び記録再生方法 |
JP2005531444A (ja) * | 2002-07-04 | 2005-10-20 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 書換え可能な光データ記憶媒体及び斯かる媒体の使用 |
US6939808B2 (en) * | 2002-08-02 | 2005-09-06 | Applied Materials, Inc. | Undoped and fluorinated amorphous carbon film as pattern mask for metal etch |
JP2004071079A (ja) * | 2002-08-08 | 2004-03-04 | Hitachi Ltd | 情報記録媒体 |
WO2004023468A1 (ja) * | 2002-09-06 | 2004-03-18 | Mitsubishi Chemical Corporation | 光学的情報記録媒体 |
JP3931229B2 (ja) * | 2002-09-13 | 2007-06-13 | 独立行政法人物質・材料研究機構 | 酸化炭素薄膜および酸化窒化炭素薄膜とこれら酸化炭素系薄膜の製造方法 |
EP1548721B1 (en) * | 2002-10-02 | 2009-08-12 | Mitsubishi Kagaku Media Co., Ltd. | Optical recording medium |
US20040125739A1 (en) * | 2002-12-19 | 2004-07-01 | Fuji Photo Film Co., Ltd. | Optical information recording method and optical information recording medium |
US6797458B2 (en) * | 2002-12-20 | 2004-09-28 | Eastman Kodak Company | Photographic multi-layer film base comprising 1,4-cyclohexane dimethanol |
JP2004255698A (ja) * | 2003-02-26 | 2004-09-16 | Victor Co Of Japan Ltd | 光記録媒体 |
DE502004010042D1 (de) * | 2003-05-16 | 2009-10-22 | Cinv Ag | Verfahren zur beschichtung von substraten mit kohlenstoffbasiertem material |
WO2004101276A1 (ja) * | 2003-05-16 | 2004-11-25 | Toppan Printing Co., Ltd. | 透明ガスバリア積層フィルム、これを用いたエレクトロルミネッセンス発光素子、エレクトロルミネッセンス表示装置、及び電気泳動式表示パネル |
JP3940709B2 (ja) * | 2003-07-01 | 2007-07-04 | 株式会社東芝 | 相変化光記録媒体 |
TWI330531B (en) * | 2003-08-19 | 2010-09-21 | Neochemir Inc | A composition for preparing carbon dioxide external gel and the carbon dioxide external gel |
JP4515064B2 (ja) * | 2003-09-11 | 2010-07-28 | 学校法人鶴学園 | 炭素系薄膜用成膜装置,成膜装置,及び成膜方法 |
US7858290B2 (en) * | 2003-10-02 | 2010-12-28 | Panasonic Corporation | Information recording medium and method for manufacturing the same |
US7431973B2 (en) * | 2004-03-12 | 2008-10-07 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, and manufacturing method, recording method, and recording apparatus thereof |
JP4136980B2 (ja) * | 2004-03-19 | 2008-08-20 | 株式会社リコー | 多層相変化型情報記録媒体及びその記録再生方法 |
EP1748091A4 (en) * | 2004-04-19 | 2012-11-28 | Nat Inst Of Advanced Ind Scien | CARBON FILM |
DE102004042407A1 (de) * | 2004-09-02 | 2006-03-23 | Forschungszentrum Karlsruhe Gmbh | Schichtverbund mit kubischen Bornitrid |
JP2006286115A (ja) * | 2005-04-01 | 2006-10-19 | Fuji Photo Film Co Ltd | 磁気記録媒体およびその製造方法 |
CN1869108B (zh) * | 2005-05-26 | 2010-06-09 | 东丽株式会社 | 层合聚酯膜、使用了该层合聚酯膜的阻燃性聚酯膜、覆铜层合板以及电路基板 |
JP2007026632A (ja) * | 2005-06-14 | 2007-02-01 | Victor Co Of Japan Ltd | 光記録媒体及び光記録方法 |
WO2007046390A1 (ja) * | 2005-10-18 | 2007-04-26 | Kabushiki Kaisha Kobe Seiko Sho | 光情報記録媒体用記録層、光情報記録媒体、および光情報記録媒体用スパッタリングターゲット |
TWI363742B (en) * | 2005-10-28 | 2012-05-11 | Hon Hai Prec Ind Co Ltd | Diamond-like carbon film |
JP2007299472A (ja) * | 2006-04-28 | 2007-11-15 | Fujitsu Ltd | 光再生媒体および光再生媒体の製造方法 |
KR100812504B1 (ko) * | 2006-09-05 | 2008-03-11 | 성균관대학교산학협력단 | 전도성 고경도 탄소박막의 제조 방법 및 박막 전계 발광소자용 전극으로의 응용 |
-
2009
- 2009-05-27 CN CN2009801386529A patent/CN102171381A/zh active Pending
- 2009-05-27 KR KR1020117008343A patent/KR20110055729A/ko not_active Application Discontinuation
- 2009-05-27 WO PCT/US2009/045355 patent/WO2010030419A1/en active Application Filing
- 2009-05-27 RU RU2011113686/02A patent/RU2011113686A/ru not_active Application Discontinuation
- 2009-05-27 EP EP09813393.7A patent/EP2334841A4/en not_active Withdrawn
- 2009-05-27 JP JP2011526877A patent/JP2012502188A/ja active Pending
- 2009-05-27 US US12/473,250 patent/US20100068529A1/en not_active Abandoned
- 2009-05-27 BR BRPI0918447A patent/BRPI0918447A2/pt not_active IP Right Cessation
- 2009-05-27 AU AU2009292147A patent/AU2009292147A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP2334841A1 (en) | 2011-06-22 |
RU2011113686A (ru) | 2012-10-20 |
EP2334841A4 (en) | 2013-07-17 |
JP2012502188A (ja) | 2012-01-26 |
KR20110055729A (ko) | 2011-05-25 |
AU2009292147A1 (en) | 2010-03-18 |
WO2010030419A1 (en) | 2010-03-18 |
CN102171381A (zh) | 2011-08-31 |
US20100068529A1 (en) | 2010-03-18 |
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