BRPI0717655A2 - Bases fotolatentes para sistema à base de isocianatos bloqueados - Google Patents
Bases fotolatentes para sistema à base de isocianatos bloqueadosInfo
- Publication number
- BRPI0717655A2 BRPI0717655A2 BRPI0717655-4A2A BRPI0717655A BRPI0717655A2 BR PI0717655 A2 BRPI0717655 A2 BR PI0717655A2 BR PI0717655 A BRPI0717655 A BR PI0717655A BR PI0717655 A2 BRPI0717655 A2 BR PI0717655A2
- Authority
- BR
- Brazil
- Prior art keywords
- footolated
- bases
- based system
- isocyanate based
- locked
- Prior art date
Links
- 239000012948 isocyanate Substances 0.000 title 1
- 150000002513 isocyanates Chemical class 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/80—Masked polyisocyanates
- C08G18/8061—Masked polyisocyanates masked with compounds having only one group containing active hydrogen
- C08G18/8093—Compounds containing active methylene groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/16—Catalysts
- C08G18/18—Catalysts containing secondary or tertiary amines or salts thereof
- C08G18/20—Heterocyclic amines; Salts thereof
- C08G18/2045—Heterocyclic amines; Salts thereof containing condensed heterocyclic rings
- C08G18/2063—Heterocyclic amines; Salts thereof containing condensed heterocyclic rings having two nitrogen atoms in the condensed ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/78—Nitrogen
- C08G18/79—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
- C08G18/791—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups
- C08G18/792—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups formed by oligomerisation of aliphatic and/or cycloaliphatic isocyanates or isothiocyanates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/21—Urea; Derivatives thereof, e.g. biuret
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/002—Priming paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/03—Powdery paints
- C09D5/033—Powdery paints characterised by the additives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
- C09D5/4419—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications with polymers obtained otherwise than by polymerisation reactions only involving carbon-to-carbon unsaturated bonds
- C09D5/4465—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J175/00—Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
- C09J175/04—Polyurethanes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
- H01L21/08—Preparation of the foundation plate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Molecular Biology (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyurethanes Or Polyureas (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06121469 | 2006-09-29 | ||
PCT/EP2007/059865 WO2008037635A1 (en) | 2006-09-29 | 2007-09-19 | Photolatent bases for systems based on blocked isocyanates |
Publications (2)
Publication Number | Publication Date |
---|---|
BRPI0717655A2 true BRPI0717655A2 (pt) | 2014-04-29 |
BRPI0717655B1 BRPI0717655B1 (pt) | 2018-12-18 |
Family
ID=37946367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0717655A BRPI0717655B1 (pt) | 2006-09-29 | 2007-09-19 | bases fotolatentes para sistema à base de isocianatos bloqueados |
Country Status (8)
Country | Link |
---|---|
US (1) | US20090298962A1 (pt) |
EP (1) | EP2066721B1 (pt) |
JP (1) | JP5345537B2 (pt) |
KR (1) | KR101492423B1 (pt) |
CN (1) | CN101522745B (pt) |
BR (1) | BRPI0717655B1 (pt) |
RU (1) | RU2009115962A (pt) |
WO (1) | WO2008037635A1 (pt) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MX2009010309A (es) | 2007-04-03 | 2009-10-16 | Basf Se | Bases nitrogenadas fotoactivables. |
DE112008001404T5 (de) * | 2007-06-14 | 2010-04-22 | Sekisui Chemical Co., Ltd. | Photohärtbare Haftklebstoffzusammensetzung |
EP2238178B1 (en) * | 2008-01-28 | 2014-09-10 | Basf Se | Photolatent amidine bases for redox curing of radically curable formulations |
WO2009122664A1 (ja) * | 2008-03-31 | 2009-10-08 | サンアプロ株式会社 | 光塩基発生剤 |
US9102785B2 (en) * | 2008-04-11 | 2015-08-11 | Ppg Industries Ohio, Inc. | Curable compositions based on polyuretidiones, polythiols and photoactivable bases and generation of isocyanates from uretidiones |
JP5274598B2 (ja) * | 2011-02-22 | 2013-08-28 | 富士フイルム株式会社 | レーザー彫刻用組成物、レリーフ印刷版原版、レリーフ印刷版の製版方法、及び、レリーフ印刷版 |
EP2511352A1 (de) * | 2011-04-13 | 2012-10-17 | Bayer Materialscience AG | Siebdruckverfahren mit zu einem Polyurethanpolymer reagierender Drucktinte |
TW201335295A (zh) * | 2011-11-30 | 2013-09-01 | 西克帕控股公司 | 經標記之塗層組成物及其認證之方法 |
WO2014062843A1 (en) * | 2012-10-16 | 2014-04-24 | Brewer Science Inc. | Silicone polymers with high refractive indices and extended pot life |
JP6228599B2 (ja) * | 2013-05-24 | 2017-11-08 | 株式会社ブリヂストン | 接着剤、接着シート及び積層体 |
JP6059356B2 (ja) * | 2013-10-04 | 2017-01-11 | 日本曹達株式会社 | 耐光性を有し、機械強度に優れるアクリル変性pb硬化性組成物 |
KR20170023977A (ko) | 2014-06-23 | 2017-03-06 | 카본, 인크. | 3차원 물체의 제조에 사용하기 위한, 다중 경화 메커니즘을 갖는 폴리우레탄 수지 |
US10131113B2 (en) | 2015-05-13 | 2018-11-20 | Honeywell International Inc. | Multilayered carbon-carbon composite |
US9944526B2 (en) | 2015-05-13 | 2018-04-17 | Honeywell International Inc. | Carbon fiber preforms |
US10302163B2 (en) | 2015-05-13 | 2019-05-28 | Honeywell International Inc. | Carbon-carbon composite component with antioxidant coating |
US10035305B2 (en) | 2015-06-30 | 2018-07-31 | Honeywell International Inc. | Method of making carbon fiber preforms |
US10022890B2 (en) | 2015-09-15 | 2018-07-17 | Honeywell International Inc. | In situ carbonization of a resin to form a carbon-carbon composite |
US10300631B2 (en) | 2015-11-30 | 2019-05-28 | Honeywell International Inc. | Carbon fiber preforms |
CN105567007B (zh) * | 2016-02-22 | 2019-04-05 | 昆山海斯电子有限公司 | 液态光致阻焊油墨及其制备方法与应用 |
EP3363840A1 (en) * | 2017-02-17 | 2018-08-22 | Henkel AG & Co. KGaA | Two-component polyurethane composition comprising a latent catalyst |
WO2018160691A1 (en) * | 2017-02-28 | 2018-09-07 | Basf Se | Curable sealant composition |
WO2018160667A1 (en) * | 2017-02-28 | 2018-09-07 | Basf Se | Curable sealant composition |
JP6820429B2 (ja) | 2017-08-29 | 2021-01-27 | 富士フイルム株式会社 | インク組成物及びその製造方法、並びに画像形成方法 |
KR20210003869A (ko) * | 2018-04-26 | 2021-01-12 | 헨켈 아게 운트 코. 카게아아 | 경화성 조성물에서 잠재성 촉매로서 사용하기 위한 4급 질소 화합물 |
JP7375459B2 (ja) * | 2019-10-23 | 2023-11-08 | 京セラドキュメントソリューションズ株式会社 | インクジェット記録用前処理液、インクジェット記録装置及び画像形成方法 |
EP4058500A1 (en) * | 2019-11-15 | 2022-09-21 | BASF Coatings GmbH | A blocked polyisocyanate crosslinking agent, its preparation method and a coating composition comprising the same |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4677179A (en) * | 1986-04-09 | 1987-06-30 | W. R. Grace | Storage stable, heat curable, coating composition |
US5718817A (en) * | 1993-07-28 | 1998-02-17 | Elf Atochem North America, Inc. | Catalyst for low temperature cure of blocked isocyanates |
CA2283446C (en) * | 1997-03-18 | 2008-05-06 | Ciba Specialty Chemicals Holding Inc. | Photoactivatable nitrogen-containing bases based on .alpha.-amino alkenes |
TW436491B (en) * | 1997-08-22 | 2001-05-28 | Ciba Sc Holding Ag | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions |
KR100728462B1 (ko) * | 2000-05-26 | 2007-06-13 | 아크조 노벨 엔.브이. | 광활성가능한 코팅조성물 |
CN100467511C (zh) * | 2001-07-03 | 2009-03-11 | 拜尔公司 | 作为封端剂用的环酮 |
KR100938769B1 (ko) * | 2001-10-17 | 2010-01-27 | 시바 홀딩 인크 | 광활성화 가능한 질소 염기 |
US7176254B2 (en) * | 2002-06-17 | 2007-02-13 | Bayer Aktiengesellschaft | Sizing composition |
RU2005106876A (ru) * | 2002-08-13 | 2005-08-10 | Акцо Нобель Коатингс Интернэшнл Б.В. (Nl) | Многослойная система покрытия, включающая тиол- функциональные соединения |
KR101059703B1 (ko) * | 2002-10-28 | 2011-08-29 | 시바 홀딩 인크 | 광개시제의 저장 안정성 증진방법 |
WO2006008251A2 (en) * | 2004-07-21 | 2006-01-26 | Ciba Specialty Chemicals Holding Inc. | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
DE102004043537A1 (de) * | 2004-09-09 | 2006-03-16 | Bayer Materialscience Ag | Herstellung von neuen strahlenhärtenden Bindemitteln |
UA87704C2 (uk) * | 2004-09-17 | 2009-08-10 | Акцо Нобель Коатінгс Інтернешнл Б.В. | Композиція покриття на основі отвердження тіол-nco та її застосування |
US9095878B2 (en) * | 2006-08-02 | 2015-08-04 | Ford Motor Company | Coating compositions and methods of applying the same |
JP5227966B2 (ja) * | 2006-11-21 | 2013-07-03 | チバ ホールディング インコーポレーテッド | 機密保護製品の製造装置及び方法 |
MX2009010309A (es) * | 2007-04-03 | 2009-10-16 | Basf Se | Bases nitrogenadas fotoactivables. |
-
2007
- 2007-09-19 CN CN2007800362458A patent/CN101522745B/zh active Active
- 2007-09-19 WO PCT/EP2007/059865 patent/WO2008037635A1/en active Application Filing
- 2007-09-19 KR KR1020097008764A patent/KR101492423B1/ko active IP Right Grant
- 2007-09-19 JP JP2009529662A patent/JP5345537B2/ja active Active
- 2007-09-19 BR BRPI0717655A patent/BRPI0717655B1/pt not_active IP Right Cessation
- 2007-09-19 US US12/442,173 patent/US20090298962A1/en not_active Abandoned
- 2007-09-19 EP EP07820312.2A patent/EP2066721B1/en active Active
- 2007-09-19 RU RU2009115962/04A patent/RU2009115962A/ru not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
BRPI0717655B1 (pt) | 2018-12-18 |
EP2066721B1 (en) | 2017-12-27 |
CN101522745B (zh) | 2013-06-19 |
CN101522745A (zh) | 2009-09-02 |
JP5345537B2 (ja) | 2013-11-20 |
KR20090077936A (ko) | 2009-07-16 |
JP2010505013A (ja) | 2010-02-18 |
US20090298962A1 (en) | 2009-12-03 |
KR101492423B1 (ko) | 2015-02-11 |
EP2066721A1 (en) | 2009-06-10 |
RU2009115962A (ru) | 2010-11-10 |
WO2008037635A1 (en) | 2008-04-03 |
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Legal Events
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