BRPI0607672A2 - dlc hidrófilo em substrato com tratamento pirólise de efusão de barreira - Google Patents

dlc hidrófilo em substrato com tratamento pirólise de efusão de barreira

Info

Publication number
BRPI0607672A2
BRPI0607672A2 BRPI0607672-6A BRPI0607672A BRPI0607672A2 BR PI0607672 A2 BRPI0607672 A2 BR PI0607672A2 BR PI0607672 A BRPI0607672 A BR PI0607672A BR PI0607672 A2 BRPI0607672 A2 BR PI0607672A2
Authority
BR
Brazil
Prior art keywords
effusion
barrier
dlc
substrate
treatment
Prior art date
Application number
BRPI0607672-6A
Other languages
English (en)
Inventor
Joseph M Bienkiewicz
Roland Weidl
Uwe Gitter
Bernd E Gruenler
Original Assignee
Guardian Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guardian Industries filed Critical Guardian Industries
Publication of BRPI0607672A2 publication Critical patent/BRPI0607672A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

DLC HIDRóFILO EM SUBSTRATO COM TRATAMENTO PIROLISE DE EFUSãO DE BARREIRA. A presente invenção refere-se ao revestimento de um substrato com uma camada(s) ou revestimento(s) que inclui, por exemplo, carbono amorfo na forma de um carbono tipo diamante (DLC). O DLC é então submetido a tratamento de efusão de barreira (ou outro tipo de tratamento de plasma) para diminuir o ângulo de contato e do mesmo. Em determinadas modalidades exemplificativas, é usado um plasma atmosférico no tratamento de efusão de barreira, e a efusão de incandescência produz radicais de oxigênio que colidem com DLC e induzem a diminuição do ângulo de contato.
BRPI0607672-6A 2005-04-29 2006-04-04 dlc hidrófilo em substrato com tratamento pirólise de efusão de barreira BRPI0607672A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/117,724 US20060246218A1 (en) 2005-04-29 2005-04-29 Hydrophilic DLC on substrate with barrier discharge pyrolysis treatment
PCT/US2006/012590 WO2006118735A2 (en) 2005-04-29 2006-04-04 Method of making diamond-like carbon hydrophilic using barrier discharge pyrolysis

Publications (1)

Publication Number Publication Date
BRPI0607672A2 true BRPI0607672A2 (pt) 2009-09-22

Family

ID=37234766

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0607672-6A BRPI0607672A2 (pt) 2005-04-29 2006-04-04 dlc hidrófilo em substrato com tratamento pirólise de efusão de barreira

Country Status (7)

Country Link
US (1) US20060246218A1 (pt)
EP (1) EP1899496B1 (pt)
BR (1) BRPI0607672A2 (pt)
CA (1) CA2604124A1 (pt)
ES (1) ES2426009T3 (pt)
PL (1) PL1899496T3 (pt)
WO (1) WO2006118735A2 (pt)

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JP6770432B2 (ja) 2014-01-27 2020-10-14 コーニング インコーポレイテッド 薄いシートの担体との制御された結合のための物品および方法
SG11201608442TA (en) 2014-04-09 2016-11-29 Corning Inc Device modified substrate article and methods for making
WO2016187186A1 (en) 2015-05-19 2016-11-24 Corning Incorporated Articles and methods for bonding sheets with carriers
CN117534339A (zh) 2015-06-26 2024-02-09 康宁股份有限公司 包含板材和载体的方法和制品
TW202216444A (zh) 2016-08-30 2022-05-01 美商康寧公司 用於片材接合的矽氧烷電漿聚合物
TWI810161B (zh) 2016-08-31 2023-08-01 美商康寧公司 具以可控制式黏結的薄片之製品及製作其之方法
JP7431160B2 (ja) 2017-12-15 2024-02-14 コーニング インコーポレイテッド 基板を処理するための方法および結合されたシートを含む物品を製造するための方法

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Also Published As

Publication number Publication date
EP1899496A4 (en) 2008-09-17
EP1899496A2 (en) 2008-03-19
CA2604124A1 (en) 2006-11-09
WO2006118735A3 (en) 2007-10-11
EP1899496B1 (en) 2013-06-12
US20060246218A1 (en) 2006-11-02
WO2006118735A2 (en) 2006-11-09
ES2426009T3 (es) 2013-10-18
PL1899496T3 (pl) 2013-11-29

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B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

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B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

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