BRPI0515456A - microesferas de sìlica, processo de fabricação de ligação e utilizações possìveis de microesferas de sìlica - Google Patents

microesferas de sìlica, processo de fabricação de ligação e utilizações possìveis de microesferas de sìlica

Info

Publication number
BRPI0515456A
BRPI0515456A BRPI0515456-1A BRPI0515456A BRPI0515456A BR PI0515456 A BRPI0515456 A BR PI0515456A BR PI0515456 A BRPI0515456 A BR PI0515456A BR PI0515456 A BRPI0515456 A BR PI0515456A
Authority
BR
Brazil
Prior art keywords
silica microspheres
possible uses
manufacturing process
silica
microspheres
Prior art date
Application number
BRPI0515456-1A
Other languages
English (en)
Inventor
Sylvain Rakotoarison
Original Assignee
Sylvain Rakotoarison
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sylvain Rakotoarison filed Critical Sylvain Rakotoarison
Publication of BRPI0515456A publication Critical patent/BRPI0515456A/pt
Publication of BRPI0515456B1 publication Critical patent/BRPI0515456B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/0005—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes
    • C01B3/001—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes characterised by the uptaking medium; Treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/0005—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes
    • C01B3/001—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes characterised by the uptaking medium; Treatment thereof
    • C01B3/0084—Solid storage mediums characterised by their shape, e.g. pellets, sintered shaped bodies, sheets, porous compacts, spongy metals, hollow particles, solids with cavities, layered solids
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/107—Forming hollow beads
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
    • C03C11/002—Hollow glass particles
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C04B41/5035—Silica
    • E—FIXED CONSTRUCTIONS
    • E04—BUILDING
    • E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00—Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/62—Insulation or other protection; Elements or use of specified material therefor
    • E04B1/74—Heat, sound or noise insulation, absorption, or reflection; Other building methods affording favourable thermal or acoustical conditions, e.g. accumulating of heat within walls
    • E04B1/76—Heat, sound or noise insulation, absorption, or reflection; Other building methods affording favourable thermal or acoustical conditions, e.g. accumulating of heat within walls specifically with respect to heat only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/32—Hydrogen storage
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Civil Engineering (AREA)
  • Electromagnetism (AREA)
  • Acoustics & Sound (AREA)
  • Silicon Compounds (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Hydrogen, Water And Hydrids (AREA)

Abstract

MICROESFERAS DE SìLICA, PROCESSO DE FABRICAçãO DE LIGAçãO E UTILIZAçõES POSSìVEIS DE MICROESFERAS DE SìLICA. A presente invenção refere-se a microesferas de sílica que apresentam um diâmetro externo 5 compreendido entre 50 e 125 <109>m, de preferência compreendido entre 60 e 90 <109>m, uma espessura de parede superior a 1 e 3 <109>m e uma densidade compreendida entre 0,3 e 0,7 g/cm¬ 3¬, processo de fabricação por injeção de precursores de microesfera de sílica (MS, PR1, PR1', PR2') no meio de um plasma indutivo (P), processos de ligação e utilizações possíveis de microesferas de sílica.
BRPI0515456A 2004-09-17 2005-09-19 microesferas de sílica, processo de fabricação de ligação e utilizações possíveis de microesferas de sílica BRPI0515456B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0409866A FR2875494B1 (fr) 2004-09-17 2004-09-17 Microspheres de silice, procede de fabrication, assemblages et utilisations possibles de ces microspheres de silice
PCT/FR2005/050759 WO2006030166A1 (fr) 2004-09-17 2005-09-19 Microspheres de silice, procede de fabrication, d'assemblage et utilisations possibles de microspheres de silice

Publications (2)

Publication Number Publication Date
BRPI0515456A true BRPI0515456A (pt) 2008-07-22
BRPI0515456B1 BRPI0515456B1 (pt) 2016-06-14

Family

ID=34951419

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0515456A BRPI0515456B1 (pt) 2004-09-17 2005-09-19 microesferas de sílica, processo de fabricação de ligação e utilizações possíveis de microesferas de sílica

Country Status (12)

Country Link
US (1) US7927670B2 (pt)
EP (1) EP1786738B1 (pt)
JP (1) JP5043667B2 (pt)
CN (1) CN101023038B (pt)
BR (1) BRPI0515456B1 (pt)
CA (1) CA2576414C (pt)
FR (1) FR2875494B1 (pt)
HK (1) HK1105945A1 (pt)
IL (1) IL181885A0 (pt)
NO (1) NO341714B1 (pt)
RU (1) RU2401811C2 (pt)
WO (1) WO2006030166A1 (pt)

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US8748785B2 (en) * 2007-01-18 2014-06-10 Amastan Llc Microwave plasma apparatus and method for materials processing
JP5457179B2 (ja) * 2007-06-26 2014-04-02 電気化学工業株式会社 中空粒子の製造方法
RU2465224C1 (ru) * 2011-06-06 2012-10-27 Государственное образовательное учреждение высшего профессионального образования "Белгородский государственный технологический университет им. В.Г. Шухова" (БГТУ им. В.Г. Шухова) Способ изготовления полых стеклосфер, сырьевая шихта для изготовления полых стеклосфер
RU2465223C1 (ru) * 2011-06-06 2012-10-27 Государственное образовательное учреждение высшего профессионального образования "Белгородский государственный технологический университет им. В.Г. Шухова" (БГТУ им. В.Г. Шухова) Способ изготовления полых стеклосфер, сырьевая шихта для изготовления полых стеклосфер
KR101488659B1 (ko) * 2012-03-06 2015-02-02 코닝정밀소재 주식회사 고주파 가열 장치
CN103588391B (zh) * 2012-08-15 2015-12-09 中国石油化工股份有限公司 一种空心玻璃微珠及其制备方法
RU2555994C1 (ru) * 2014-02-27 2015-07-10 Федеральное государственное бюджетное учреждение науки Институт теоретической и прикладной механики им. С.А. Христиановича Сибирского отделения Российской академии наук (ИТПМ СО РАН) Способ получения полых керамических микросфер с расчетными параметрами
RU2570065C1 (ru) * 2014-09-22 2015-12-10 Закрытое акционерное общество "СПЕЦХИММОНТАЖ" (ЗАО "СПЕЦХИММОНТАЖ") Способ получения микрошариков из кварца (варианты) и варианты их применения
DE102015201681A1 (de) * 2015-01-30 2016-08-04 Dennert Poraver Gmbh Verfahren und Anlage zur Herstellung von Mikrohohlkugeln aus Glas
CN105645848B (zh) * 2016-01-05 2018-02-09 同济大学 一种水环境下混凝土自溶化学抗硫酸盐腐蚀系统
CN107601828B (zh) * 2017-10-27 2020-12-22 唐山宏微新材料有限公司 一种空心玻璃微球及其制备方法
DE102019109005A1 (de) * 2019-04-05 2020-10-08 Lean Plastics Technologies GmbH Verfahren und Vorrichtung zur Herstellung von Kunststoffpartikeln
CN111943214B (zh) * 2020-08-18 2022-08-30 苏州英纳特纳米科技有限公司 非晶态纳米球形二氧化硅的制备方法
RU209213U1 (ru) * 2021-11-22 2022-02-07 Автономная некоммерческая организация высшего образования "Белгородский университет кооперации, экономики и права" Устройство для получения блочного пеностекла
US20240082804A1 (en) * 2022-08-16 2024-03-14 Plassein Technologies Ltd. Llc Methods For Producing Seed And Transformation Of Seeds Into Hollow Structures
CN116285651A (zh) * 2023-03-27 2023-06-23 山东三新新材料科技有限公司 一种耐磨型橡胶修补剂及其制备方法和应用

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US3923484A (en) * 1974-01-11 1975-12-02 Corning Glass Works Flame method of producing glass
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JPH04243911A (ja) * 1991-01-25 1992-09-01 Tokai Carbon Co Ltd シリカバルーンの製造方法
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Also Published As

Publication number Publication date
EP1786738B1 (fr) 2016-02-17
FR2875494B1 (fr) 2007-01-19
RU2007114281A (ru) 2008-10-27
CN101023038A (zh) 2007-08-22
JP5043667B2 (ja) 2012-10-10
FR2875494A1 (fr) 2006-03-24
CA2576414A1 (fr) 2006-03-23
EP1786738A1 (fr) 2007-05-23
HK1105945A1 (en) 2008-02-29
WO2006030166A1 (fr) 2006-03-23
US7927670B2 (en) 2011-04-19
US20070231500A1 (en) 2007-10-04
JP2008513330A (ja) 2008-05-01
NO341714B1 (no) 2018-01-08
IL181885A0 (en) 2007-07-04
CN101023038B (zh) 2011-04-20
RU2401811C2 (ru) 2010-10-20
CA2576414C (fr) 2013-01-29
BRPI0515456B1 (pt) 2016-06-14
NO20071868L (no) 2007-06-18

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Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 14/06/2016, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 15A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2598 DE 20-10-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.