BR9714860A - Composição, processo para remover contaminantes de um substrato, processo de revestimento, composto, e, perfluoralquil haloalquil éteres - Google Patents

Composição, processo para remover contaminantes de um substrato, processo de revestimento, composto, e, perfluoralquil haloalquil éteres

Info

Publication number
BR9714860A
BR9714860A BR9714860-1A BR9714860A BR9714860A BR 9714860 A BR9714860 A BR 9714860A BR 9714860 A BR9714860 A BR 9714860A BR 9714860 A BR9714860 A BR 9714860A
Authority
BR
Brazil
Prior art keywords
perfluoralkyl
compound
substrate
composition
removing contaminants
Prior art date
Application number
BR9714860-1A
Other languages
English (en)
Inventor
Frederick E Behr
Richard M Flynn
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of BR9714860A publication Critical patent/BR9714860A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04—Saturated ethers
    • C07C43/12—Saturated ethers containing halogen
    • C07C43/123—Saturated ethers containing halogen both carbon chains are substituted by halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04—Saturated ethers
    • C07C43/12—Saturated ethers containing halogen
    • C07C43/126—Saturated ethers containing halogen having more than one ether bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/18—Ethers having an ether-oxygen atom bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C43/192—Ethers having an ether-oxygen atom bound to a carbon atom of a ring other than a six-membered aromatic ring containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/04—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D207/10—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D211/38—Halogen atoms or nitro radicals
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/24—Organic compounds containing halogen
    • C11D3/245—Organic compounds containing halogen containing fluorine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Detergent Compositions (AREA)
  • Hydrogenated Pyridines (AREA)

Abstract

"COMPOSIçãO, PROCESSO PARA REMOVER CONTAMINANTES DE UM SUBSTRATO, PROCESSO DE REVESTIMENTO, COMPOSTO, E, PERFLUORALQUIL HALOALQUIL éTERES". São descritas composições compreendendo perfluoralquil haloalquil éter e opcionalmente um tensoativo; usos para os compostos perfluoralquil haloalquil éter e composições dos mesmos, compreendendo opcionalmente tensoativos e os perfluoralquil haloalquil éteres.
BR9714860-1A 1997-09-15 1997-12-19 Composição, processo para remover contaminantes de um substrato, processo de revestimento, composto, e, perfluoralquil haloalquil éteres BR9714860A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/931,105 US6552090B1 (en) 1997-09-15 1997-09-15 Perfluoroalkyl haloalkyl ethers and compositions and applications thereof
PCT/US1997/024243 WO1999014175A1 (en) 1997-09-15 1997-12-19 Perfluoroalkyl haloalkyl ethers and compositions and applications thereof

Publications (1)

Publication Number Publication Date
BR9714860A true BR9714860A (pt) 2000-07-25

Family

ID=25460234

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9714860-1A BR9714860A (pt) 1997-09-15 1997-12-19 Composição, processo para remover contaminantes de um substrato, processo de revestimento, composto, e, perfluoralquil haloalquil éteres

Country Status (6)

Country Link
US (5) US6552090B1 (pt)
EP (1) EP1015405A1 (pt)
JP (1) JP2003526596A (pt)
AU (1) AU5624498A (pt)
BR (1) BR9714860A (pt)
WO (1) WO1999014175A1 (pt)

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US6045588A (en) 1997-04-29 2000-04-04 Whirlpool Corporation Non-aqueous washing apparatus and method
US6552090B1 (en) * 1997-09-15 2003-04-22 3M Innovative Properties Company Perfluoroalkyl haloalkyl ethers and compositions and applications thereof
US6684090B2 (en) * 1999-01-07 2004-01-27 Masimo Corporation Pulse oximetry data confidence indicator
US20020140675A1 (en) * 1999-01-25 2002-10-03 Ali Ammar Al System and method for altering a display mode based on a gravity-responsive sensor
KR19990068325A (ko) * 1999-04-06 1999-09-06 김재진 편향자력선자석의제조방법및그자석을이용한자석모터
US6610250B1 (en) 1999-08-23 2003-08-26 3M Innovative Properties Company Apparatus using halogenated organic fluids for heat transfer in low temperature processes requiring sterilization and methods therefor
US6372700B1 (en) 2000-03-31 2002-04-16 3M Innovative Properties Company Fluorinated solvent compositions containing ozone
US6358893B1 (en) 2000-06-20 2002-03-19 Stoner, Inc. Aerosol composition containing silicone-based fluid and improved spray system
US6849194B2 (en) * 2000-11-17 2005-02-01 Pcbu Services, Inc. Methods for preparing ethers, ether compositions, fluoroether fire extinguishing systems, mixtures and methods
US6503569B2 (en) * 2000-12-04 2003-01-07 Mattel, Inc. Adhesive or paint coating for toy articles
US6890452B2 (en) * 2002-11-08 2005-05-10 3M Innovative Properties Company Fluorinated surfactants for aqueous acid etch solutions
FR2859731B1 (fr) * 2003-09-16 2008-03-07 Arkema Compositions a base d'hydrocarbures fluores et de butanol secondaire pour le defluxage de cartes electroniques
US7739891B2 (en) 2003-10-31 2010-06-22 Whirlpool Corporation Fabric laundering apparatus adapted for using a select rinse fluid
US7695524B2 (en) 2003-10-31 2010-04-13 Whirlpool Corporation Non-aqueous washing machine and methods
US7300468B2 (en) * 2003-10-31 2007-11-27 Whirlpool Patents Company Multifunctioning method utilizing a two phase non-aqueous extraction process
WO2005106105A1 (en) 2004-04-29 2005-11-10 Unilever N.V. Dry cleaning method
US7966684B2 (en) 2005-05-23 2011-06-28 Whirlpool Corporation Methods and apparatus to accelerate the drying of aqueous working fluids
WO2007013169A1 (ja) 2005-07-29 2007-02-01 Du Pont-Mitsui Fluorochemicals Co., Ltd. 放射性物質の除染用溶剤組成物及び除染材、並びに放射性物質の除染方法
FR2893626B1 (fr) * 2005-11-18 2008-01-04 Inst Francais Du Petrole Fluide de puits comprenant une phase liquide fluoree
JP4671035B2 (ja) * 2005-10-14 2011-04-13 信越化学工業株式会社 化学増幅型レジスト材料及びパターン形成方法
US9447007B2 (en) 2010-12-21 2016-09-20 Solvay Specialty Polymers Italy S.P.A. Process for producing fluorinated organic compounds
US9803452B2 (en) 2012-08-31 2017-10-31 Halliburton Energy Services, Inc. Fluorous additives for use in a fluorous-based treatment fluid
CN108713014A (zh) * 2016-03-11 2018-10-26 3M创新有限公司 含胺的无环氢氟醚及其使用方法
EP3900502A4 (en) * 2018-12-21 2022-11-02 Honeywell International Inc. HEAT TRANSFER PROCESSES, SYSTEMS AND FLUIDS
EP3959284B1 (en) 2019-04-24 2023-03-29 Evonik Operations GmbH Liquid dispersion with enhanced thermal conductivity containing inorganic particles
US20240117191A1 (en) 2019-12-19 2024-04-11 3M Innovative Properties Company Fluorinated Coumarins
JP2022138156A (ja) * 2021-03-09 2022-09-22 ダイキン工業株式会社 ハロエーテル及びその製造方法並びにビニルエーテル及びその製造方法

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JPH07173479A (ja) * 1993-11-05 1995-07-11 Japan Energy Corp 弗化炭化水素系冷媒圧縮機用潤滑油、同潤滑油を用いる弗化炭化水素系冷媒圧縮機潤滑方法及び弗化炭化水素系冷媒圧縮機用作動流体組成物
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US5839311A (en) 1996-09-17 1998-11-24 Minnesota Mining And Manufacturing Company Composition to aid in the forming of metal
US6043201A (en) * 1996-09-17 2000-03-28 Minnesota Mining And Manufacturing Company Composition for cutting and abrasive working of metal
US6552090B1 (en) * 1997-09-15 2003-04-22 3M Innovative Properties Company Perfluoroalkyl haloalkyl ethers and compositions and applications thereof
US6159917A (en) * 1998-12-16 2000-12-12 3M Innovative Properties Company Dry cleaning compositions containing hydrofluoroether
US6310018B1 (en) * 2000-03-31 2001-10-30 3M Innovative Properties Company Fluorinated solvent compositions containing hydrogen fluoride
US6372700B1 (en) * 2000-03-31 2002-04-16 3M Innovative Properties Company Fluorinated solvent compositions containing ozone

Also Published As

Publication number Publication date
US6149980A (en) 2000-11-21
WO1999014175A1 (en) 1999-03-25
JP2003526596A (ja) 2003-09-09
US20040086650A1 (en) 2004-05-06
AU5624498A (en) 1999-04-05
EP1015405A1 (en) 2000-07-05
US6653512B1 (en) 2003-11-25
US6743262B1 (en) 2004-06-01
US6953606B2 (en) 2005-10-11
US6552090B1 (en) 2003-04-22

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 6A,7A E 8A ANUIDADES.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 1836 DE 14/03/2006.