BR9704665A - Métodos e sistema de limpeza à base de absorção de oscilação de pressão - Google Patents

Métodos e sistema de limpeza à base de absorção de oscilação de pressão

Info

Publication number
BR9704665A
BR9704665A BR9704665A BR9704665A BR9704665A BR 9704665 A BR9704665 A BR 9704665A BR 9704665 A BR9704665 A BR 9704665A BR 9704665 A BR9704665 A BR 9704665A BR 9704665 A BR9704665 A BR 9704665A
Authority
BR
Brazil
Prior art keywords
pressure oscillation
cleaning methods
based cleaning
oscillation absorption
absorption
Prior art date
Application number
BR9704665A
Other languages
English (en)
Inventor
Richard A Sauer
Jean-Luc Hubert
Robert W Conners
Original Assignee
Air Liquide American
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide American filed Critical Air Liquide American
Publication of BR9704665A publication Critical patent/BR9704665A/pt

Links

Classifications

    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F43/00—Dry-cleaning apparatus or methods using volatile solvents

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Cleaning By Liquid Or Steam (AREA)
BR9704665A 1996-09-09 1997-09-09 Métodos e sistema de limpeza à base de absorção de oscilação de pressão BR9704665A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/709,656 US5881577A (en) 1996-09-09 1996-09-09 Pressure-swing absorption based cleaning methods and systems

Publications (1)

Publication Number Publication Date
BR9704665A true BR9704665A (pt) 1999-06-01

Family

ID=24850798

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9704665A BR9704665A (pt) 1996-09-09 1997-09-09 Métodos e sistema de limpeza à base de absorção de oscilação de pressão

Country Status (4)

Country Link
US (1) US5881577A (pt)
EP (1) EP0828020A3 (pt)
AR (1) AR009501A1 (pt)
BR (1) BR9704665A (pt)

Families Citing this family (77)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6799587B2 (en) * 1992-06-30 2004-10-05 Southwest Research Institute Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature
US6148644A (en) 1995-03-06 2000-11-21 Lever Brothers Company, Division Of Conopco, Inc. Dry cleaning system using densified carbon dioxide and a surfactant adjunct
US6500605B1 (en) 1997-05-27 2002-12-31 Tokyo Electron Limited Removal of photoresist and residue from substrate using supercritical carbon dioxide process
US6306564B1 (en) 1997-05-27 2001-10-23 Tokyo Electron Limited Removal of resist or residue from semiconductors using supercritical carbon dioxide
US6216302B1 (en) * 1997-11-26 2001-04-17 Mve, Inc. Carbon dioxide dry cleaning system
US6442980B2 (en) * 1997-11-26 2002-09-03 Chart Inc. Carbon dioxide dry cleaning system
US6098430A (en) * 1998-03-24 2000-08-08 Micell Technologies, Inc. Cleaning apparatus
US6076537A (en) * 1998-03-30 2000-06-20 Detrex Corporation Vacuum extraction cleaning system
US5977045A (en) * 1998-05-06 1999-11-02 Lever Brothers Company Dry cleaning system using densified carbon dioxide and a surfactant adjunct
ITMI981518A1 (it) 1998-07-02 2000-01-02 Fedegari Autoclavi Metodo ed apparecchiatura di lavaggio con fluidi in fase densa
US6277753B1 (en) 1998-09-28 2001-08-21 Supercritical Systems Inc. Removal of CMP residue from semiconductors using supercritical carbon dioxide process
SE9901002D0 (sv) * 1999-03-19 1999-03-19 Electrolux Ab Anordning för rengöring av textilföremål med en förtätad vätskeformig behandlingsgas
US7044143B2 (en) * 1999-05-14 2006-05-16 Micell Technologies, Inc. Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems
US6602349B2 (en) 1999-08-05 2003-08-05 S.C. Fluids, Inc. Supercritical fluid cleaning process for precision surfaces
US6397421B1 (en) 1999-09-24 2002-06-04 Micell Technologies Methods and apparatus for conserving vapor and collecting liquid carbon dioxide for carbon dioxide dry cleaning
US6314601B1 (en) 1999-09-24 2001-11-13 Mcclain James B. System for the control of a carbon dioxide cleaning apparatus
US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
KR100744888B1 (ko) * 1999-11-02 2007-08-01 동경 엘렉트론 주식회사 소재를 초임계 처리하기 위한 장치 및 방법
SE515491C2 (sv) * 1999-12-27 2001-08-13 Electrolux Ab Förfarande och anordning för rengörning av porösa material medelst koldioxid
US6248136B1 (en) 2000-02-03 2001-06-19 Micell Technologies, Inc. Methods for carbon dioxide dry cleaning with integrated distribution
DE10012526A1 (de) * 2000-03-15 2001-09-20 Linde Gas Ag Verfahren und Vorrichtung zum Reinigen mit verflüssigten Gasen
EP1277233A2 (en) * 2000-04-25 2003-01-22 Tokyo Electron Corporation Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
WO2002009147A2 (en) * 2000-07-26 2002-01-31 Tokyo Electron Limited High pressure processing chamber for semiconductor substrate
US6536059B2 (en) 2001-01-12 2003-03-25 Micell Technologies, Inc. Pumpless carbon dioxide dry cleaning system
IL158340A0 (en) * 2001-04-10 2004-05-12 Supercritical Systems Inc High pressure processing chamber for semiconductor substrate including flow enhancing features
US20040040660A1 (en) * 2001-10-03 2004-03-04 Biberger Maximilian Albert High pressure processing chamber for multiple semiconductor substrates
WO2003033428A1 (en) * 2001-10-17 2003-04-24 Praxair Technology, Inc. Recycle for supercritical carbon dioxide
TW497494U (en) * 2001-12-28 2002-08-01 Metal Ind Redearch & Amp Dev C Fluid driven stirring device for compressing gas cleaning system
JP2005517884A (ja) * 2002-02-15 2005-06-16 東京エレクトロン株式会社 圧力強化ダイヤフラム弁
US6924086B1 (en) * 2002-02-15 2005-08-02 Tokyo Electron Limited Developing photoresist with supercritical fluid and developer
US6764552B1 (en) 2002-04-18 2004-07-20 Novellus Systems, Inc. Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
US6960242B2 (en) 2002-10-02 2005-11-01 The Boc Group, Inc. CO2 recovery process for supercritical extraction
US6722642B1 (en) 2002-11-06 2004-04-20 Tokyo Electron Limited High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US6880560B2 (en) 2002-11-18 2005-04-19 Techsonic Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
US20040112409A1 (en) * 2002-12-16 2004-06-17 Supercritical Sysems, Inc. Fluoride in supercritical fluid for photoresist and residue removal
US20040154647A1 (en) * 2003-02-07 2004-08-12 Supercritical Systems, Inc. Method and apparatus of utilizing a coating for enhanced holding of a semiconductor substrate during high pressure processing
US7077917B2 (en) * 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
WO2004101181A2 (en) * 2003-05-13 2004-11-25 Ekc Technology, Inc. System and method for cleaning of workpieces using supercritical carbon dioxide
US20050034660A1 (en) * 2003-08-11 2005-02-17 Supercritical Systems, Inc. Alignment means for chamber closure to reduce wear on surfaces
JP2007504306A (ja) * 2003-09-02 2007-03-01 ナノン アクティーゼルスカブ ゴム含有廃材の処理方法
US7497099B2 (en) * 2003-10-06 2009-03-03 Star Cluster Co., Ltd. Ultrasonic washing method for clothes
ES2314465T5 (es) * 2003-11-19 2012-10-29 Natex Prozesstechnologie Gesmbh Un procedimiento y proceso para controlar los perfiles de temperatura, presión y densidad en procesos con fluidos densos y aparato asociado
US7250374B2 (en) * 2004-06-30 2007-07-31 Tokyo Electron Limited System and method for processing a substrate using supercritical carbon dioxide processing
US7307019B2 (en) * 2004-09-29 2007-12-11 Tokyo Electron Limited Method for supercritical carbon dioxide processing of fluoro-carbon films
US20060065288A1 (en) * 2004-09-30 2006-03-30 Darko Babic Supercritical fluid processing system having a coating on internal members and a method of using
US20060102590A1 (en) * 2004-11-12 2006-05-18 Tokyo Electron Limited Method for treating a substrate with a high pressure fluid using a preoxide-based process chemistry
US20060102204A1 (en) * 2004-11-12 2006-05-18 Tokyo Electron Limited Method for removing a residue from a substrate using supercritical carbon dioxide processing
US20060102591A1 (en) * 2004-11-12 2006-05-18 Tokyo Electron Limited Method and system for treating a substrate using a supercritical fluid
US20060102208A1 (en) * 2004-11-12 2006-05-18 Tokyo Electron Limited System for removing a residue from a substrate using supercritical carbon dioxide processing
US7491036B2 (en) * 2004-11-12 2009-02-17 Tokyo Electron Limited Method and system for cooling a pump
US20060102282A1 (en) * 2004-11-15 2006-05-18 Supercritical Systems, Inc. Method and apparatus for selectively filtering residue from a processing chamber
US20060130966A1 (en) * 2004-12-20 2006-06-22 Darko Babic Method and system for flowing a supercritical fluid in a high pressure processing system
US20060135047A1 (en) * 2004-12-22 2006-06-22 Alexei Sheydayi Method and apparatus for clamping a substrate in a high pressure processing system
US7140393B2 (en) * 2004-12-22 2006-11-28 Tokyo Electron Limited Non-contact shuttle valve for flow diversion in high pressure systems
US7434590B2 (en) * 2004-12-22 2008-10-14 Tokyo Electron Limited Method and apparatus for clamping a substrate in a high pressure processing system
US20060180572A1 (en) * 2005-02-15 2006-08-17 Tokyo Electron Limited Removal of post etch residue for a substrate with open metal surfaces
US7291565B2 (en) * 2005-02-15 2007-11-06 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US20060180174A1 (en) * 2005-02-15 2006-08-17 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using a peroxide-based process chemistry in conjunction with an initiator
US7435447B2 (en) * 2005-02-15 2008-10-14 Tokyo Electron Limited Method and system for determining flow conditions in a high pressure processing system
US20060237055A1 (en) * 2005-03-08 2006-10-26 Tex-Ray Industrial Co., Ltd. Pressurized facility for cleaning objects
US20060237056A1 (en) * 2005-03-08 2006-10-26 Tex-Ray Industrial Co., Ltd. Pressurized apparatus for cleaning objects
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US20060226117A1 (en) * 2005-03-29 2006-10-12 Bertram Ronald T Phase change based heating element system and method
US20060255012A1 (en) * 2005-05-10 2006-11-16 Gunilla Jacobson Removal of particles from substrate surfaces using supercritical processing
US7789971B2 (en) * 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US20060260657A1 (en) * 2005-05-18 2006-11-23 Jibb Richard J System and apparatus for supplying carbon dioxide to a semiconductor application
US7524383B2 (en) * 2005-05-25 2009-04-28 Tokyo Electron Limited Method and system for passivating a processing chamber
US20070012337A1 (en) * 2005-07-15 2007-01-18 Tokyo Electron Limited In-line metrology for supercritical fluid processing
ITBO20060760A1 (it) * 2006-11-09 2008-05-10 F M B Finanziaria Macchine Bolognese Spa Macchina per il lavaggio a secco di articoli.
JP2016503338A (ja) * 2012-11-01 2016-02-04 スペクトラ システムズ コーポレーション 紙幣およびセキュリティ保護された文書の超臨界流体洗浄
US9676009B2 (en) 2012-11-01 2017-06-13 Specrra Systems Corporation Supercritical fluid cleaning of banknotes and secure documents
US8932409B2 (en) * 2012-11-01 2015-01-13 Spectra Systems Corporation Supercritical fluid cleaning of banknotes and secure documents
WO2015157284A1 (en) * 2014-04-07 2015-10-15 Spectra Systems Corporation Supercritical fluid cleaning of banknotes and secure documents
KR102358561B1 (ko) * 2017-06-08 2022-02-04 삼성전자주식회사 기판 처리 장치 및 집적회로 소자 제조 장치
KR102594903B1 (ko) * 2021-01-25 2023-10-27 엘지전자 주식회사 의류처리장치 및 그 제어방법
KR102562191B1 (ko) * 2021-01-25 2023-08-01 엘지전자 주식회사 의류처리장치
CN112974412A (zh) * 2021-02-23 2021-06-18 中国核动力研究设计院 放射性污染超临界二氧化碳化学去污方法及其去污装置

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2985003A (en) * 1957-01-11 1961-05-23 Gen Motors Corp Sonic washer
US3086538A (en) * 1959-05-20 1963-04-23 Ransohoff Company Cleaning device
US3712085A (en) * 1971-03-11 1973-01-23 Advanced Patent Technology Inc Ultra-sonic dry-cleaning machine
US4012194A (en) * 1971-10-04 1977-03-15 Maffei Raymond L Extraction and cleaning processes
US4199482A (en) * 1977-03-31 1980-04-22 Colgate-Palmolive Company Laundry pre-spotter composition and method of using same
US4336024A (en) * 1980-02-22 1982-06-22 Airwick Industries, Inc. Process for cleaning clothes at home
US4630625A (en) * 1981-01-22 1986-12-23 Quadrex Hps, Inc. Tool decontamination apparatus
JPS60242881A (ja) * 1984-05-17 1985-12-02 金沢　政男 超音波洗濯機
WO1987003021A1 (en) * 1985-11-14 1987-05-21 Deutsches Textilforschungszentrum Nord-West E.V. Fibre, filament, yarn and/or surface formations containing any of these and/or debris material and process for producing any of these
DE3806608A1 (de) * 1987-03-18 1988-09-29 Deutsches Textilforschzentrum Verfahren zur geschwindigkeits- und/oder laengenmessung von endlosen textilen warenbahnen sowie vorrichtung zur durchfuehrung des verfahrens
US4936922A (en) * 1987-05-21 1990-06-26 Roger L. Cherry High-purity cleaning system, method, and apparatus
US4824487A (en) * 1987-07-10 1989-04-25 Hewlett-Packard Company Cleaning of polyurethane foam reservoir
US5035921A (en) * 1988-01-19 1991-07-30 The Babcock & Wilcox Company Processing of carbon/carbon composites using supercritical fluid technology
US5013366A (en) * 1988-12-07 1991-05-07 Hughes Aircraft Company Cleaning process using phase shifting of dense phase gases
DE4004111C2 (de) * 1989-02-15 1999-08-19 Deutsches Textilforschzentrum Verfahren zur Vorbehandlung von textilen Flächengebilden oder Garnen
DE3904514C2 (de) * 1989-02-15 1999-03-11 Oeffentliche Pruefstelle Und T Verfahren zum Reinigen bzw. Waschen von Bekleidungsteilen o. dgl.
US5068040A (en) * 1989-04-03 1991-11-26 Hughes Aircraft Company Dense phase gas photochemical process for substrate treatment
US5158100A (en) * 1989-05-06 1992-10-27 Dainippon Screen Mfg. Co., Ltd. Wafer cleaning method and apparatus therefor
US5080831A (en) * 1989-06-29 1992-01-14 Buckeye International, Inc. Aqueous cleaner/degreaser compositions
US5032148A (en) * 1989-11-07 1991-07-16 Membrane Technology & Research, Inc. Membrane fractionation process
US5213619A (en) * 1989-11-30 1993-05-25 Jackson David P Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids
US5196134A (en) * 1989-12-20 1993-03-23 Hughes Aircraft Company Peroxide composition for removing organic contaminants and method of using same
US5269850A (en) * 1989-12-20 1993-12-14 Hughes Aircraft Company Method of removing organic flux using peroxide composition
DE69102311T2 (de) * 1990-03-07 1994-09-29 Hitachi Ltd Vorrichtung und Verfahren zur Oberflächenreinigung.
US5080822A (en) * 1990-04-10 1992-01-14 Buckeye International, Inc. Aqueous degreaser compositions containing an organic solvent and a solubilizing coupler
JPH0427935A (ja) * 1990-05-23 1992-01-30 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
US5306350A (en) * 1990-12-21 1994-04-26 Union Carbide Chemicals & Plastics Technology Corporation Methods for cleaning apparatus using compressed fluids
AT395951B (de) * 1991-02-19 1993-04-26 Union Ind Compr Gase Gmbh Reinigung von werkstuecken mit organischen rueckstaenden
DE59204395D1 (de) * 1991-05-17 1996-01-04 Ciba Geigy Ag Verfahren zum Färben von hydrophobem Textilmaterial mit Dispersionsfarbstoffen aus überkritischem CO2.
US5279615A (en) * 1991-06-14 1994-01-18 The Clorox Company Method and composition using densified carbon dioxide and cleaning adjunct to clean fabrics
US5431843A (en) * 1991-09-04 1995-07-11 The Clorox Company Cleaning through perhydrolysis conducted in dense fluid medium
KR930019861A (ko) * 1991-12-12 1993-10-19 완다 케이. 덴슨-로우 조밀상 기체를 이용한 코팅 방법
US5313965A (en) * 1992-06-01 1994-05-24 Hughes Aircraft Company Continuous operation supercritical fluid treatment process and system
US5370742A (en) * 1992-07-13 1994-12-06 The Clorox Company Liquid/supercritical cleaning with decreased polymer damage
US5267455A (en) * 1992-07-13 1993-12-07 The Clorox Company Liquid/supercritical carbon dioxide dry cleaning system
US5368171A (en) * 1992-07-20 1994-11-29 Jackson; David P. Dense fluid microwave centrifuge
US5344493A (en) * 1992-07-20 1994-09-06 Jackson David P Cleaning process using microwave energy and centrifugation in combination with dense fluids
US5316591A (en) * 1992-08-10 1994-05-31 Hughes Aircraft Company Cleaning by cavitation in liquefied gas
US5514220A (en) * 1992-12-09 1996-05-07 Wetmore; Paula M. Pressure pulse cleaning
CA2120537A1 (en) * 1993-04-12 1994-10-13 Thomas B. Stanford, Jr. Megasonic cleaning system using compressed, condensed gases
US5374337A (en) * 1993-08-20 1994-12-20 Technichem Engineering, Ltd. Halohydrocarbon recovery process
US5482211A (en) * 1994-04-21 1996-01-09 Hughes Aircraft Company Supercritical fluid cleaning apparatus without pressure vessel
US5467492A (en) * 1994-04-29 1995-11-21 Hughes Aircraft Company Dry-cleaning of garments using liquid carbon dioxide under agitation as cleaning medium
WO1996023606A1 (en) * 1995-02-01 1996-08-08 Jackson David P Dense fluid centrifugal separation process and apparatus

Also Published As

Publication number Publication date
EP0828020A3 (en) 1999-01-13
AR009501A1 (es) 2000-04-26
EP0828020A2 (en) 1998-03-11
US5881577A (en) 1999-03-16

Similar Documents

Publication Publication Date Title
BR9704665A (pt) Métodos e sistema de limpeza à base de absorção de oscilação de pressão
ITTO950140A0 (it) Procedimento e sistema di aferesi
DE69737926D1 (de) Reinigungsvorrichtung
DE69834616D1 (de) Tastsinnempfindlicher detektor und signalisierungseinheit
IT1277860B1 (it) Dispositivo simmetrizzatore e procedimento per la sua progettazione.
DE69828963D1 (de) Wirstoffabgabe und gentherapiesystem
AR020367A1 (es) Sistema distribuidor-recolector de fluidos y procedimiento correspondiente
DE59709542D1 (de) Reinigungsvorrichtung
DE69502841D1 (de) Reinigungsvorrichtung
DE69710713D1 (de) Vibrationsdetektion
DE69720333D1 (de) Transaktionsapparat
DE69527720D1 (de) Gelenkstützvorrichtung
DK0968750T3 (da) Gas-væskekontaktapparat
IT1277320B1 (it) Elemento girevole per fissaggio e dispositivo di fissaggio.
DE69830149D1 (de) Reinigungsverfahren und reinigungsgerät
DE69837638D1 (de) Schweissverfahren und -vorrichtung
DE69724837D1 (de) Reinigungs- und wiederanwendungssystem
DE59806577D1 (de) Reinigungsvorrichtung
DE69722279D1 (de) Reinigungsvorrichtung
BR9509755A (pt) Dispositivo de mancal
DK0836854T3 (da) Banesteriliseringsindretning
DE69817983D1 (de) Reinigungsvorrichtung
IT1288461B1 (it) Procedimento e dispositivo per la pulitura di tessuti.
BR9702237A (pt) Aparelho de resposta de mensagens
ITMI992421A0 (it) Procedimento e dispositivo per la pulizia di un dispositivo incollator e

Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]