BR9605823A - Processo para a preparação de polímero modificado processos de produzir composição fotossensível e imagem fotográfica - Google Patents

Processo para a preparação de polímero modificado processos de produzir composição fotossensível e imagem fotográfica

Info

Publication number
BR9605823A
BR9605823A BR9605823A BR9605823A BR9605823A BR 9605823 A BR9605823 A BR 9605823A BR 9605823 A BR9605823 A BR 9605823A BR 9605823 A BR9605823 A BR 9605823A BR 9605823 A BR9605823 A BR 9605823A
Authority
BR
Brazil
Prior art keywords
photosensitive composition
photographic image
modified polymer
preparing modified
producing photosensitive
Prior art date
Application number
BR9605823A
Other languages
English (en)
Inventor
Gabor I Koletar
Mahfuzul Alam
Gerhard Sprintschnik
Major S Dhillon
Stanley F Wanat
Original Assignee
Bayer Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer Ag filed Critical Bayer Ag
Publication of BR9605823A publication Critical patent/BR9605823A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Epoxy Resins (AREA)
BR9605823A 1995-12-04 1996-12-03 Processo para a preparação de polímero modificado processos de produzir composição fotossensível e imagem fotográfica BR9605823A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US56676395A 1995-12-04 1995-12-04

Publications (1)

Publication Number Publication Date
BR9605823A true BR9605823A (pt) 1998-08-25

Family

ID=24264275

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9605823A BR9605823A (pt) 1995-12-04 1996-12-03 Processo para a preparação de polímero modificado processos de produzir composição fotossensível e imagem fotográfica

Country Status (5)

Country Link
US (1) US20030166750A1 (pt)
EP (1) EP0778292A3 (pt)
JP (1) JPH09249712A (pt)
BR (1) BR9605823A (pt)
CA (1) CA2191946A1 (pt)

Families Citing this family (18)

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DE19824546A1 (de) * 1998-06-03 1999-12-09 Basf Drucksysteme Gmbh Herstellung vernetzbarer wasserlöslicher oder wasserdispergierbarer Zusammensetzungen und daraus erhältlicher strahlungsempfindlicher Gemische
KR100448860B1 (ko) * 1998-08-26 2005-02-23 주식회사 하이닉스반도체 포토레지스트단량체,그의공중합체및이를포함하는포토레지스트조성물
DE60103408T2 (de) * 2000-08-10 2005-08-04 E.I. Du Pont De Nemours And Co., Wilmington Verfahren zur umsetzung von polyvinylbutyral(pvb)-abfall zu verarbeitbaren granulaten
US6517988B1 (en) * 2001-07-12 2003-02-11 Kodak Polychrome Graphics Llc Radiation-sensitive, positive working coating composition based on carboxylic copolymers
JP2007071902A (ja) * 2005-09-02 2007-03-22 Fujifilm Corp 感光性組成物及び該感光性組成物を用いたパターン形成方法
EP1798245A1 (de) * 2005-12-13 2007-06-20 Kuraray Europe GmbH Modifizierung von acetalisierten, Vinylalkoholgruppen enthaltenden Polymeren mit Carbonsäureanhydriden und anschließende photochemische Vernetzung
US20100143720A1 (en) * 2007-05-21 2010-06-10 Kuraray Co., Ltd. Crosslinkable polyvinyl acetal porous powder, method for producing the same, and use of the same
CN101801610B (zh) * 2007-09-24 2012-08-08 圣戈班磨料磨具有限公司 含活性填充剂的磨料产品
JP5715975B2 (ja) * 2012-02-29 2015-05-13 富士フイルム株式会社 平版印刷版原版および平版印刷版の製造方法
CN104870193B (zh) 2013-01-01 2017-12-22 爱克发印艺公司 (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
CA3017777A1 (en) 2016-03-16 2017-09-21 Agfa Nv Method for processing a lithographic printing plate
EP3778253A1 (en) 2019-08-13 2021-02-17 Agfa Nv Method for processing a lithographic printing plate
CN118006063B (zh) * 2024-03-07 2024-08-20 上海甚龙新材料技术有限公司 一种改性聚乙烯醇缩丁醛组合物及其制备方法和应用

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GB763288A (en) 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
US2760683A (en) 1955-05-16 1956-08-28 Owens Illinois Glass Co Pouring spout
BE549816A (pt) * 1955-07-29
NL287134A (pt) 1959-08-05
GB1138486A (en) * 1966-10-26 1969-01-01 Monsanto Chemicals Production of resins
JPS4825050B1 (pt) * 1968-11-07 1973-07-26
US3867147A (en) 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3679419A (en) 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US3849392A (en) 1969-05-20 1974-11-19 Kalle Ag Process for the production of polycondensation products of aromatic diazonium compounds
US4085079A (en) 1977-02-02 1978-04-18 Monsanto Company Formaldehyde solutions stabilized with interpolymers of vinyl acetate, vinyl acetal and vinyl alcohol
JPS55118030A (en) * 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
DE3036077A1 (de) 1980-09-25 1982-05-06 Hoechst Ag, 6000 Frankfurt Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial
JPS57185034A (en) 1981-01-20 1982-11-15 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition
DE3144905A1 (de) * 1981-11-12 1983-05-19 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials
DE3404366A1 (de) 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
US4670507A (en) 1985-08-02 1987-06-02 American Hoechst Corporation Resin
US4980264A (en) * 1985-12-17 1990-12-25 International Business Machines Corporation Photoresist compositions of controlled dissolution rate in alkaline developers
JP2549366B2 (ja) * 1986-10-03 1996-10-30 三菱化学株式会社 感光性平版印刷版
DE3644163A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3644162A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Polyvinylacetal, dieses enthaltendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3644160A1 (de) * 1986-12-23 1988-07-14 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US4912160A (en) * 1987-11-16 1990-03-27 The Sherwin-Williams Company Acid-functional polymers from hydroxy polymers and cyclic anhydrides
JP2544814B2 (ja) * 1989-08-30 1996-10-16 東洋インキ製造株式会社 発色性組成物
US5445919A (en) * 1993-06-14 1995-08-29 Fuji Photo Film Co., Ltd. Photopolymerizable composition
EP0670521A1 (en) * 1994-02-28 1995-09-06 Toray Industries, Inc. Photosensitive resin composition and process for producing the same

Also Published As

Publication number Publication date
JPH09249712A (ja) 1997-09-22
EP0778292A3 (en) 1998-11-04
US20030166750A1 (en) 2003-09-04
EP0778292A2 (en) 1997-06-11
CA2191946A1 (en) 1997-06-05

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Legal Events

Date Code Title Description
FB34 Technical and formal requirements: requirement - article 34 of industrial property law
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: CONFORME ARTIGO 10O DA RESOLUCAO 124/06, CABE SER ARQUIVADO REFERENTE AO NAO RECOLHIMENTO DA 4A A 15A ANUIDADES.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO NAO CUPRIMENTO DO DESAPCHO 8.6 NA RPI 2161 DE 05/06/2012