BR9600888A - Polimero processo para sua fabricação mistura fotossensivel e material de registro fotossensivel - Google Patents

Polimero processo para sua fabricação mistura fotossensivel e material de registro fotossensivel

Info

Publication number
BR9600888A
BR9600888A BR9600888A BR9600888A BR9600888A BR 9600888 A BR9600888 A BR 9600888A BR 9600888 A BR9600888 A BR 9600888A BR 9600888 A BR9600888 A BR 9600888A BR 9600888 A BR9600888 A BR 9600888A
Authority
BR
Brazil
Prior art keywords
photosensitive
recording material
manufacture
mixture
polymer process
Prior art date
Application number
BR9600888A
Other languages
English (en)
Inventor
Mathias Eichhorn
Andreas Elsaesser
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR9600888A publication Critical patent/BR9600888A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52—Amides or imides
    • C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C08F20/60—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
BR9600888A 1995-03-04 1996-03-04 Polimero processo para sua fabricação mistura fotossensivel e material de registro fotossensivel BR9600888A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19507618A DE19507618A1 (de) 1995-03-04 1995-03-04 Polymere und diese enthaltendes lichtempfindliches Gemisch

Publications (1)

Publication Number Publication Date
BR9600888A true BR9600888A (pt) 1997-12-30

Family

ID=7755651

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9600888A BR9600888A (pt) 1995-03-04 1996-03-04 Polimero processo para sua fabricação mistura fotossensivel e material de registro fotossensivel

Country Status (6)

Country Link
US (1) US5700621A (pt)
EP (1) EP0731113B1 (pt)
JP (1) JPH08259627A (pt)
KR (1) KR960034237A (pt)
BR (1) BR9600888A (pt)
DE (2) DE19507618A1 (pt)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3863422B2 (ja) * 2001-12-13 2006-12-27 コダックポリクロームグラフィックス株式会社 感光性組成物および感光性平版印刷版
US7678533B2 (en) 2005-06-30 2010-03-16 Agfa Graphics, N.V. Heat-sensitive lithographic printing plate precursor
US20070003869A1 (en) * 2005-06-30 2007-01-04 Agfa-Gevaert Heat-sensitive lithographic printing plate-precursor
US20070003875A1 (en) * 2005-06-30 2007-01-04 Agfa-Gevaert Method for preparing a lithographic printing plate precursor
JP4713262B2 (ja) * 2005-07-22 2011-06-29 昭和電工株式会社 感光性の樹脂組成物

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2529455A (en) * 1947-12-30 1950-11-07 Monsanto Chemicals Process for preparing unsaturated amides
NL281758A (pt) * 1961-08-03
US3515552A (en) * 1966-09-16 1970-06-02 Minnesota Mining & Mfg Light-sensitive imaging sheet and method of using
GB1375461A (pt) * 1972-05-05 1974-11-27
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS5228401A (en) * 1975-08-29 1977-03-03 Koken Boring Machine Co Hydraulic percussion device
JPS5241052A (en) * 1975-09-25 1977-03-30 Hiroshi Matsuda Umbrella
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
US4551409A (en) * 1983-11-07 1985-11-05 Shipley Company Inc. Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
DE3442756A1 (de) * 1984-11-23 1986-05-28 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen
CA1254432A (en) * 1984-12-28 1989-05-23 Conrad G. Houle High-temperature resistant, selectively developable positive-working resist
DE3528930A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Polymere verbindungen und diese enthaltendes strahlungsempfindliches gemisch
DE3528929A1 (de) * 1985-08-13 1987-02-26 Hoechst Ag Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern
JPH06105355B2 (ja) * 1986-12-15 1994-12-21 富士写真フイルム株式会社 感光性組成物
JPH0769605B2 (ja) * 1988-02-25 1995-07-31 富士写真フイルム株式会社 感光性組成物
JP2613789B2 (ja) * 1988-05-12 1997-05-28 富士写真フイルム株式会社 感光性平版印刷版
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JP2639722B2 (ja) * 1989-01-18 1997-08-13 富士写真フイルム株式会社 感光性組成物
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JPH05150453A (ja) * 1991-11-27 1993-06-18 Fuji Photo Film Co Ltd 感光性組成物

Also Published As

Publication number Publication date
DE19507618A1 (de) 1996-09-05
KR960034237A (ko) 1996-10-22
JPH08259627A (ja) 1996-10-08
DE59601121D1 (de) 1999-02-25
US5700621A (en) 1997-12-23
EP0731113A3 (de) 1997-01-22
EP0731113B1 (de) 1999-01-13
EP0731113A2 (de) 1996-09-11

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Legal Events

Date Code Title Description
FA10 Dismissal: dismissal - article 33 of industrial property law