BR8802296A - Material de registro sensivel a radiacao - Google Patents

Material de registro sensivel a radiacao

Info

Publication number
BR8802296A
BR8802296A BR8802296A BR8802296A BR8802296A BR 8802296 A BR8802296 A BR 8802296A BR 8802296 A BR8802296 A BR 8802296A BR 8802296 A BR8802296 A BR 8802296A BR 8802296 A BR8802296 A BR 8802296A
Authority
BR
Brazil
Prior art keywords
radiation
record material
sensitive record
sensitive
record
Prior art date
Application number
BR8802296A
Other languages
English (en)
Inventor
Andreas Elsaesser
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8802296A publication Critical patent/BR8802296A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
BR8802296A 1987-05-12 1988-03-11 Material de registro sensivel a radiacao BR8802296A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873715790 DE3715790A1 (de) 1987-05-12 1987-05-12 Strahlungsempfindliches aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
BR8802296A true BR8802296A (pt) 1988-12-13

Family

ID=6327346

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8802296A BR8802296A (pt) 1987-05-12 1988-03-11 Material de registro sensivel a radiacao

Country Status (5)

Country Link
EP (1) EP0290916B1 (pt)
JP (1) JPS63287950A (pt)
KR (1) KR880014419A (pt)
BR (1) BR8802296A (pt)
DE (2) DE3715790A1 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2578930B2 (ja) * 1988-08-18 1997-02-05 松下電器産業株式会社 パターン形成方法
DE3908068C2 (de) * 1989-03-13 1994-07-28 Nokia Deutschland Gmbh Verfahren zum Herstellen von Leiterbahnen auf einem Isolierträger
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
EP0476840B1 (en) * 1990-08-30 1997-06-18 AT&T Corp. Process for fabricating a device
CA2090039A1 (en) * 1990-09-18 1992-03-19 Willard Earl Conley Top coat and acid catalyzed resists
US5609993A (en) * 1991-04-17 1997-03-11 Nippon Paint Co., Ltd. Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor
JPH04317065A (ja) * 1991-04-17 1992-11-09 Nippon Paint Co Ltd 平版印刷版材および水性インク組成物
JP3281053B2 (ja) * 1991-12-09 2002-05-13 株式会社東芝 パターン形成方法
JP2956387B2 (ja) * 1992-05-25 1999-10-04 三菱電機株式会社 レジスト被覆膜材料、その形成方法とそれを用いたパターン形成方法および半導体装置
KR100380546B1 (ko) * 1994-02-24 2003-06-25 가부시끼가이샤 히다치 세이사꾸쇼 반도체집적회로장치의제조방법
US5506090A (en) * 1994-09-23 1996-04-09 Minnesota Mining And Manufacturing Company Process for making shoot and run printing plates
DE19834745A1 (de) 1998-08-01 2000-02-03 Agfa Gevaert Ag Strahlungsempfindliches Gemisch mit IR-absorbierenden, anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial
DE19834746A1 (de) 1998-08-01 2000-02-03 Agfa Gevaert Ag Strahlungsempfindliches Gemisch mit IR-absorbierenden, betainischen oder betainisch-anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial
KR100401116B1 (ko) * 1999-06-03 2003-10-10 주식회사 하이닉스반도체 아민오염방지 물질 및 이를 이용한 미세패턴 형성방법
DE19944073A1 (de) 1999-09-14 2001-03-15 Agfa Gevaert Ag Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2928636A1 (de) * 1979-07-16 1981-02-12 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
JPS5810734A (ja) * 1981-07-10 1983-01-21 Toyobo Co Ltd 固形状レリ−フ型作成用感光性樹脂積層体

Also Published As

Publication number Publication date
JPS63287950A (ja) 1988-11-25
KR880014419A (ko) 1988-12-23
DE3715790A1 (de) 1988-11-24
EP0290916A2 (de) 1988-11-17
EP0290916B1 (de) 1994-12-07
DE3852338D1 (de) 1995-01-19
EP0290916A3 (en) 1990-08-08

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Legal Events

Date Code Title Description
FB19 Grant procedure suspended (art. 19)
FA2 Application deemed withdrawn (art. 19(5))