BR8704684A - Composicao foto-polimerizavel e processo para sua formacao;particulas;e processo para a formacao de uma mascara de solda em um substrato - Google Patents

Composicao foto-polimerizavel e processo para sua formacao;particulas;e processo para a formacao de uma mascara de solda em um substrato

Info

Publication number
BR8704684A
BR8704684A BR8704684A BR8704684A BR8704684A BR 8704684 A BR8704684 A BR 8704684A BR 8704684 A BR8704684 A BR 8704684A BR 8704684 A BR8704684 A BR 8704684A BR 8704684 A BR8704684 A BR 8704684A
Authority
BR
Brazil
Prior art keywords
photo
particles
formation
substrate
forming
Prior art date
Application number
BR8704684A
Other languages
English (en)
Inventor
Berhan Tecle
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of BR8704684A publication Critical patent/BR8704684A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Adhesives Or Adhesive Processes (AREA)
BR8704684A 1986-09-10 1987-09-09 Composicao foto-polimerizavel e processo para sua formacao;particulas;e processo para a formacao de uma mascara de solda em um substrato BR8704684A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US90554286A 1986-09-10 1986-09-10

Publications (1)

Publication Number Publication Date
BR8704684A true BR8704684A (pt) 1988-04-26

Family

ID=25421016

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8704684A BR8704684A (pt) 1986-09-10 1987-09-09 Composicao foto-polimerizavel e processo para sua formacao;particulas;e processo para a formacao de uma mascara de solda em um substrato

Country Status (6)

Country Link
EP (1) EP0259812A3 (pt)
JP (1) JPS6370244A (pt)
KR (1) KR910003979B1 (pt)
CN (1) CN1012961B (pt)
BR (1) BR8704684A (pt)
CA (1) CA1295761C (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5302494A (en) * 1985-06-10 1994-04-12 The Foxboro Company Multilayer circuit board having microporous layers and process for making same
JPH0288615A (ja) * 1988-09-27 1990-03-28 Mitsubishi Rayon Co Ltd 難燃性液状感光性樹脂組成物
US5217847A (en) * 1989-10-25 1993-06-08 Hercules Incorporated Liquid solder mask composition
CA2025198A1 (en) * 1989-10-25 1991-04-26 Daniel F. Varnell Liquid solder mask composition
KR920700898A (ko) * 1989-10-30 1992-08-10 원본미기재 미공성층을 가진 다층 회로 기판 및 그 제조방법
JP4050370B2 (ja) * 1998-01-07 2008-02-20 株式会社Ｋｒｉ 無機質含有感光性樹脂組成物および無機パターン形成方法
JP4573152B2 (ja) * 2001-03-29 2010-11-04 株式会社タムラ製作所 プリント配線板製造用感光性樹脂組成物
US6994948B2 (en) * 2001-10-12 2006-02-07 E.I. Du Pont De Nemours And Company, Inc. Aqueous developable photoimageable thick film compositions
JP2012073601A (ja) * 2010-08-31 2012-04-12 Fujifilm Corp 感光性組成物、並びに、感光性フィルム、永久パターン、永久パターン形成方法、及びプリント基板
CN103487995B (zh) * 2011-08-17 2018-01-09 积水化学工业株式会社 液晶显示元件用密封剂以及液晶显示元件
US10221302B2 (en) * 2016-12-13 2019-03-05 E I Du Pont De Nemours And Company Solid polymeric highly durable surfacing
US10927238B2 (en) * 2016-12-13 2021-02-23 Dupont Safety & Construction, Inc. Solid polymeric highly durable surfacing

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3265242D1 (en) * 1981-09-17 1985-09-12 Ciba Geigy Ag Light-sensitive coating agent and its use in protection purposes

Also Published As

Publication number Publication date
KR880004346A (ko) 1988-06-03
JPS6370244A (ja) 1988-03-30
KR910003979B1 (ko) 1991-06-17
EP0259812A2 (en) 1988-03-16
EP0259812A3 (en) 1990-01-31
CN1012961B (zh) 1991-06-26
CN87106227A (zh) 1988-03-30
CA1295761C (en) 1992-02-11

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